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    • 3. 发明授权
    • Electromagnetic apparatus
    • 电磁装置
    • US5578979A
    • 1996-11-26
    • US1388
    • 1993-01-06
    • David M. AdamsJerome K. Hastings
    • David M. AdamsJerome K. Hastings
    • H01F7/12H01H50/46H01F7/10
    • H01H50/46H01F7/1205
    • An improved electromagnetic apparatus includes a core and an armature which is movable relative to the core. A shading ring is connected with the core to provide magnetic flux which is out of phase with magnetic flux from the core. The shading ring includes a base formed a first metal and a layer of a second metal clad to the base. The first metal forming the base work hardens and has a greater resistance to fatigue failure induced by vibration than the second metal of the layer which is clad to the base. However, the second metal forming the clad layer has a greater electrical conductivity than the first metal of the base. The base may be formed of aluminum and the layer of metal clad to the base may be formed of copper. The layer of copper may be clad to the base by an extrusion process.
    • 改进的电磁装置包括可相对于芯移动的芯和电枢。 阴影环与芯连接以提供与来自芯的磁通异相的磁通。 遮光环包括形成第一金属的基底和覆盖到基底的第二金属层。 形成基体工件的第一金属硬化,并且比包覆到基底的层的第二金属具有比由振动引起的疲劳破坏更大的阻力。 然而,形成覆层的第二金属具有比基底的第一金属更大的导电性。 基底可以由铝形成,并且包覆到基底的金属层可以由铜形成。 铜层可以通过挤出工艺包覆到基体中。
    • 10. 发明授权
    • Methods for making patterns in radiation sensitive polymers
    • 在辐射敏感聚合物中制作图案的方法
    • US06528238B1
    • 2003-03-04
    • US09667622
    • 2000-09-22
    • David SeniukPaul J. PaddonDavid M. Adams
    • David SeniukPaul J. PaddonDavid M. Adams
    • G03F700
    • G03F7/70466G03F7/2022
    • Groove patterns on substrates coated with photoresist are made using the technique of photolithography by exposing photoresist via a reticle. In the instant invention, the pattern is provided on the reticle with a period larger than the final period to be printed on the photoresist. The complete pattern is obtained by subjecting the photoresist to two or more exposures and aligning the substrate relative to the reticle between exposures. In a further embodiment the slits on the reticle defining the line width of the grooves are larger than required and photoresist is subjected to multiple partial exposure. Both embodiments significantly reduce diffraction caused by the reticle and improve the resolution of the technique.
    • 使用光刻技术通过经由掩模版曝光光致抗蚀剂来制造涂有光致抗蚀剂的基材上的凹槽图案。 在本发明中,在掩模版上设置图案,其长度大于要印刷在光致抗蚀剂上的最后周期。 完整的图案通过使光致抗蚀剂经受两次或更多次的曝光并且在曝光之间使衬底相对于掩模版对准而获得。 在另一个实施例中,限定凹槽的线宽度的标线片上的狭缝大于所需的狭缝,并且光致抗蚀剂经受多次部分曝光。 两个实施方案都显着地减少了由掩模版引起的衍射并提高了该技术的分辨率。