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    • 4. 发明授权
    • Laser-bump sensor method and apparatus
    • 激光碰撞传感器的方法和装置
    • US5978091A
    • 1999-11-02
    • US105695
    • 1998-06-26
    • Peter C. JannMarco A. KrumbuegelReginald LeeMing M. Yang
    • Peter C. JannMarco A. KrumbuegelReginald LeeMing M. Yang
    • G01B11/02G11B5/82G11B5/84G11B33/10G01B11/24G01B11/30G01N21/00G01N21/88
    • G01B11/02G11B5/82G11B5/8404G11B5/8408G11B33/10
    • An apparatus for measuring the height and diameter of laser-zone texture bumps on a rigid magnetic disk substrate is disclosed. The apparatus has a disk holder for supporting and rotating the substrate, and an optical beam-source assembly for directing a focused laser beam on the substrate, and for shifting the position of the beam's illumination spot on the substrate in a tracking (radial) direction. An optical detection assembly in the apparatus measures the deflection of the laser beam due to specular reflection of the beam by laser-zone texture bumps, as a function of time, in both scanning (circumferential) and tracking directions. A computational device in the apparatus functions to (i) calculate scanning and tracking deflection values which characterize beam deflections in the scanning and tracking directions, respectively, for a texture bump passing through the illumination spot produced by the beam on the substrate, (ii) select for bump-height analysis, those texture bumps whose scanning deflection values are above a selected threshold value and whose tracking deflection values are below a selected threshold value, indicative of a condition in which the selected textured bumps are each in focus and centered within said illumination spot, and (iii) determine the texture bump heights and diameters of the selected bumps from the beam deflections in the scanning direction. Also disclosed is a method by which the apparatus measures the light power which is scattered by the of laser-zone texture bumps on a rigid magnetic disk substrate.
    • 公开了一种用于测量刚性磁盘基板上的激光区纹理凸块的高度和直径的装置。 该装置具有用于支撑和旋转衬底的盘保持器,以及用于将聚焦的激光束引导到衬底上的光束组件,以及用于沿跟踪(径向)方向移动光束照射点在衬底上的位置 。 该装置中的光学检测组件通过激光区域纹理凸起作为时间的函数,在扫描(周向)和跟踪方向两者中,由于光束的镜面反射而测量激光束的偏转。 该装置中的计算装置用于(i)分别计算扫描和跟踪偏转值,该偏移值表示扫描和跟踪方向上的光束偏转,其中纹理凸块通过由衬底上的光束产生的照明点,(ii) 选择凸起高度分析,其扫描偏转值高于所选择的阈值并且其跟踪偏转值低于所选择的阈值的那些纹理凸块,其指示所选择的纹理凸块各自处于焦点并且位于所述中心位置的状态 照明点,以及(iii)从扫描方向上的光束偏转确定所选择的凸起的纹理凸起高度和直径。 还公开了一种方法,其通过该装置测量由刚性磁盘基板上的激光区域纹理凸块散射的光功率。
    • 8. 发明授权
    • Particle detector for rough surfaces
    • 用于粗糙表面的颗粒检测器
    • US5189481A
    • 1993-02-23
    • US736517
    • 1991-07-26
    • Peter C. JannKenneth P. GrossArmand P. Neukermans
    • Peter C. JannKenneth P. GrossArmand P. Neukermans
    • G01N21/94G01N21/95
    • G01N21/9501G01N21/94G01N21/9503
    • A surface inspection apparatus having multiple inspection stations to inspect a wafer for a number of characteristics. The wafer is placed on a chuck connected to a rack-and-pinion or equivalent system so that the wafer simultaneously rotates and translates under the fixed position of the inspection stations. A single light source may be used by all stations in turn. One station may be a particle detector with collection optics receiving a small select portion of the light scattered from the wafer surface. A second station may be a roughness detector with a collection system to direct a large portion of scattered light to a detector. A position sensitive detector may be used to determine the slope of the wafer surface at an inspection point when the wafer is not clamped to the chuck, giving a measure of surface deformation. These or other stations are positioned about either of two inspection points at which the beam from the light source may be directed. The inspection points are spaced one wafer radius apart to minimize the required wafer motion for a complete surface scan.
    • 具有多个检查站的表面检查装置,用于检查晶片的多种特性。 将晶片放置在连接到齿条齿轮或等效系统的卡盘上,使得晶片在检查台的固定位置同时旋转和平移。 所有车站可以依次使用单个光源。 一个站可以是具有收集光学器件的粒子检测器,其接收从晶片表面散射的光的小的选择部分。 第二站可以是具有收集系统的粗糙度检测器,以将大部分散射光引导到检测器。 可以使用位置敏感检测器来确定当晶片未夹紧到卡盘时的检查点处的晶片表面的斜率,给出表面变形的量度。 这些或其他站位于来自光源的光束可以被引导的两个检查点中的任一个处。 检查点间隔一个晶片半径,以最小化所需的晶片运动以进行完整的表面扫描。
    • 9. 发明授权
    • Particle detection on a patterned or bare wafer surface
    • 在图案或裸晶圆表面上进行粒子检测
    • US5076692A
    • 1991-12-31
    • US531132
    • 1990-05-31
    • Armand P. NeukermansPeter C. JannRalph WolfDavid WolzeStanley Stokowski
    • Armand P. NeukermansPeter C. JannRalph WolfDavid WolzeStanley Stokowski
    • H01L21/66G01N21/94H01L21/027
    • G01N21/94G01N21/4788
    • A method and apparatus for predicting the number of contaminant particles in circuit area of a patterned semiconductor wafer having a number of reflective circuit areas. The method includes forming on a wafer in specified areas, a grating test pattern, such as a line grating. The grating patterns are formed at the same time and in the same manner that repetitive circuit patterns are formed on the wafer. The wafer is then scanned by a light beam. Since the diffraction pattern caused by the grating test patterns is known, it is possible to detect when the light beam is scanning one of the known grating patterns. The diffraction pattern may be inspected for fabrication derived variations. In response to detecting a known grating pattern, a detection mechanism is activated. Since the diffraction pattern is known it may be spatially separated. In this way only light scattered by particles or defects in the pattern are collected and detected. From the scattered light that is collected and detected, a particle count may be determined for the grating pattern area. From this particle count an accurate prediction of the number of particles in the circuit patterns may be made. The apparatus may also inspect bare areas. In this manner real time inspection may be performed on patterned wafers.
    • 一种用于预测具有多个反射电路区域的图案化半导体晶片的电路区域中的污染物颗粒数量的方法和装置。 该方法包括在特定区域的晶片上形成光栅测试图案,例如线光栅。 光栅图案是以与在晶片上形成重复电路图案相同的方式形成的。 然后通过光束扫描晶片。 由于由光栅测试图案引起的衍射图案是已知的,因此可以检测光束何时扫描已知光栅图案之一。 可以检查衍射图案以进行制造衍生的变化。 响应于检测到已知的光栅图案,检测机构被激活。 由于衍射图案是已知的,它可以在空间上分离。 以这种方式,仅收集并检测由图案中的颗粒或缺陷散射的光。 从收集和检测的散射光中,可以确定光栅图案区域的粒子数。 从该粒子计数可以进行电路图案中的粒子数量的准确预测。 该设备还可以检查裸露的区域。 以这种方式,可以对图案化的晶片进行实时检查。
    • 10. 发明授权
    • Surface inspection by double pass laser doppler vibrometry
    • 双面激光多普勒振动波表面检查
    • US07554670B2
    • 2009-06-30
    • US11654929
    • 2007-01-17
    • Peter C. JannWafaa Abdalla
    • Peter C. JannWafaa Abdalla
    • G01B9/02
    • G01B11/306G01N21/45G01N21/95
    • A double pass apparatus for detecting defects on a disk surface includes a light source that generates a light beam and a beamsplitter that splits the light beam into a first light beam portion and a second light beam portion. A modulator is provided that modulates the second light beam portion into a frequency shifted modulated light beam for illuminating the surface of the disk. The frequency shifted modulated light beam is twice reflected from the surface of the disk, thus doubling the frequency shift of the reflected light beam. A polarizing beamsplitter combines the first light beam portion with the reflected light beam portion providing an interference signal.
    • 用于检测盘表面上的缺陷的双通道装置包括产生光束的光源和将光束分成第一光束部分和第二光束部分的分束器。 提供一种调制器,其将第二光束部分调制成用于照亮盘的表面的频移调制光束。 频移调制光束从盘的表面反射两次,从而使反射光束的频移倍增。 偏振分束器将第一光束部分与提供干涉信号的反射光束部分相结合。