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    • 1. 发明授权
    • Enclosure for acoustic insulation of an apparatus contained within said enclosure
    • 用于包围在所述外壳内的设备的隔音的外壳
    • US09453335B2
    • 2016-09-27
    • US13439539
    • 2012-04-04
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • H04R1/02E04B1/82
    • E04B1/8218E04B1/8209
    • The invention relates to an enclosure with a substantial rectangular configuration, adapted to contain an apparatus sensitive to acoustic vibrations, the enclosure comprising walls and acoustic damping material located within the wall, wherein the acoustic damping material comprises at least one absorbing body of acoustic energy absorbing material located adjacent to a rib of the enclosure. The acoustic vibrations most disturbing the processes in the apparatus within the enclosure are caused by standing acoustic waves within the enclosure with frequencies in the range between 50 Hz and 1000 Hz. These acoustic waves are efficiently damped by the provision of a block of acoustic absorbing material adjacent to one of the ribs of the enclosure, to such an extent that the need for thick walls of the enclosure is substantially obviated, leading to a less voluminous enclosure.
    • 本发明涉及具有基本矩形构造的外壳,其适于容纳对声振动敏感的装置,所述外壳包括位于所述壁内的壁和声阻尼材料,其中所述声阻尼材料包括至少一个吸收能量吸收体 位于与外壳的肋相邻的材料。 外壳内的设备中最为干扰过程的声音振动是由外壳内的驻波声频引起的,频率范围在50Hz到1000Hz之间。 这些声波通过提供与外壳的一个肋相邻的吸声材料块被有效地阻尼,使得对外壳的厚壁的需要基本上被消除,导致较少体积的外壳。
    • 2. 发明申请
    • ENCLOSURE FOR ACOUSTIC INSULATION OF AN APPARATUS CONTAINED WITHIN SAID ENCLOSURE
    • 装在外壳内的装置的声学绝缘外壳
    • US20120195452A1
    • 2012-08-02
    • US13439539
    • 2012-04-04
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • H04R1/02
    • E04B1/8218E04B1/8209
    • The invention relates to an enclosure with a substantial rectangular configuration, adapted to contain an apparatus sensitive to acoustic vibrations, the enclosure comprising walls and acoustic damping material located within the wall, wherein the acoustic damping material comprises at least one absorbing body of acoustic energy absorbing material located adjacent to a rib of the enclosure.The acoustic vibrations most disturbing the processes in the apparatus within the enclosure are caused by standing acoustic waves within the enclosure with frequencies in the range between 50 Hz and 1000 Hz. These acoustic waves are efficiently damped by the provision of a block of acoustic absorbing material adjacent to one of the ribs of the enclosure, to such an extent that the need for thick walls of the enclosure is substantially obviated, leading to a less voluminous enclosure.
    • 本发明涉及具有基本矩形构造的外壳,其适于容纳对声振动敏感的装置,所述外壳包括位于所述壁内的壁和声阻尼材料,其中所述声阻尼材料包括至少一个吸收能量吸收体 位于与外壳的肋相邻的材料。 外壳内的设备中最为干扰过程的声音振动是由外壳内的驻波声频引起的,频率范围在50Hz到1000Hz之间。 这些声波通过提供与外壳的一个肋相邻的吸声材料块被有效地阻尼,使得对外壳的厚壁的需要基本上被消除,导致较少体积的外壳。
    • 3. 发明申请
    • Enclosure for acoustic insulation of an apparatus contained within said enclosure
    • 用于包围在所述外壳内的设备的隔音的外壳
    • US20070189567A1
    • 2007-08-16
    • US11701020
    • 2007-01-31
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • H04R1/02H04R1/20
    • E04B1/8218E04B1/8209
    • The invention relates to an enclosure with a substantial rectangular configuration, adapted to contain an apparatus sensitive to acoustic vibrations, the enclosure comprising walls and acoustic damping material located within the wall, wherein the acoustic damping material comprises at least one absorbing body of acoustic energy absorbing material located adjacent to a rib of the enclosure.The acoustic vibrations most disturbing the processes in the apparatus within the enclosure are caused by standing acoustic waves within the enclosure with frequencies in the range between 50 Hz and 1000 Hz. These acoustic waves are efficiently damped by the provision of a block of acoustic absorbing material adjacent to one of the ribs of the enclosure, to such an extent that the need for thick walls of the enclosure is substantially obviated, leading to a less voluminous enclosure.
    • 本发明涉及具有基本矩形构造的外壳,其适于容纳对声振动敏感的装置,所述外壳包括位于所述壁内的壁和声阻尼材料,其中所述声阻尼材料包括至少一个吸收能量吸收体 位于与外壳的肋相邻的材料。 外壳内的设备中最为干扰过程的声音振动是由外壳内的驻波声频引起的,频率范围在50Hz到1000Hz之间。 这些声波通过提供与外壳的一个肋相邻的吸声材料块被有效地阻尼,使得对外壳的厚壁的需要基本上被消除,导致较少体积的外壳。
    • 4. 发明授权
    • Enclosure for acoustic insulation of an apparatus contained within said enclosure
    • 用于包围在所述外壳内的设备的隔音的外壳
    • US08170255B2
    • 2012-05-01
    • US11701020
    • 2007-01-31
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • Albert VisscherJoseph Hubert Marie Guillaume Schroen
    • H04R25/00
    • E04B1/8218E04B1/8209
    • An enclosure with a substantial rectangular configuration, adapted to contain an apparatus sensitive to acoustic vibrations, the enclosure comprising walls and acoustic damping material located within the wall, wherein the acoustic damping material comprises at least one absorbing body of acoustic energy absorbing material located adjacent to a rib of the enclosure.The acoustic vibrations most disturbing the processes in the apparatus within the enclosure are caused by standing acoustic waves within the enclosure with frequencies in the range between 50 Hz and 1000 Hz. These acoustic waves are efficiently damped by the provision of a block of acoustic absorbing material adjacent to one of the ribs of the enclosure, to such an extent that the need for thick walls of the enclosure is substantially obviated, leading to a less voluminous enclosure.
    • 具有基本矩形构造的外壳,其适于容纳对声振动敏感的装置,所述外壳包括位于所述壁内的壁和声阻尼材料,其中所述声阻尼材料包括至少一个吸收能量吸收材料的吸收体, 外壳的肋骨。 外壳内的设备中最为干扰过程的声音振动是由外壳内的驻波声频引起的,频率范围在50Hz到1000Hz之间。 这些声波通过提供与外壳的一个肋相邻的吸声材料块被有效地阻尼,使得对外壳的厚壁的需要基本上被消除,导致较少体积的外壳。
    • 6. 发明授权
    • Depilation apparatus with thrust cogs
    • 脱毛装置带推力齿轮
    • US5197969A
    • 1993-03-30
    • US754880
    • 1991-09-04
    • Albert VisscherMarinus P. Koster
    • Albert VisscherMarinus P. Koster
    • A45D26/00
    • A45D26/0028
    • A depilation apparatus having a number of disc-shaped pinching plates (19) provided on a drive shaft (7) and a number of thrust cogs (41) provided on an auxiliary shaft (21), by means of which cogs the pinching plates are each tiltable about a first and a second tilting axis (81, 91) from a catching position into a pinching position in which the relevant pinching plate (19) exerts a pinching force on an adjacent pinching plate (19) tilted into the pinching position. Each pair of pinching plates positioned next to one another (19a, 19b), (19b, 19c), (19c, 19a) has a unique thrust cog (41a, 41b, 41c), so that each pinching plate (19) is in cooperation with each of its two adjacent pinching plates (19) and the hair catching range of the pinching plates (19) extends over the entire depilation opening (3). The thrust cogs (41a, 41b, 41c) are provided on the auxiliary shaft (21) at mutual angles of 120.degree., so that an even operation of the depilation apparatus in time is achieved and an undersirable contact between the pinching plates (19) at a side of the drive shaft (7) remote from the depilation opening (3) is prevented. The pinching plates (19) each have a central, star-shaped opening (65, 67, 69, 71) by means of which the relevant pinching plate (19) is mounted in recesses (59, 61, 63) of three comb-shaped support ridges (51, 53, 55) of the drive shaft (7), which ridges extend parallel to a central portion (57) of the drive shaft (7) at mutual angles of 120.degree.. A favorable moment arm ratio for the pinching force and a stable support of the pinching plates (19) in the pinching position are achieved by this.
    • 一种脱毛装置,具有设置在驱动轴(7)上的多个盘形夹持板(19)和设置在辅助轴(21)上的多个推力齿(41),夹紧板 每个可倾斜的第一和第二倾斜轴线(81,91)从捕获位置到夹持位置,在夹紧位置中相关的夹持板(19)对倾斜到夹持位置的相邻夹持板(19)施加夹紧力。 彼此相邻的每对夹持板(19a,19b),(19b,19c),(19c,19a)具有独特的推力齿轮(41a,41b,41c),使得每个夹紧板(19)处于 与其两个相邻的夹持板(19)中的每一个的夹持和夹持板(19)的发条范围在整个脱毛开口(3)上延伸。 推力齿轮(41a,41b,41c)以120°的相互角度设置在辅助轴(21)上,从而实现脱毛装置的均匀操作,并且夹紧板(19)之间的不合意接触, 在远离脱毛开口(3)的驱动轴(7)的一侧被防止。 夹持板(19)各自具有中心的星形开口(65,67,69,71),借助于该夹紧板将相关的夹持板(19)安装在三个梳状的凹槽(59,​​61,63)中, 所述驱动轴(7)的支撑脊(51,53,55),所述支撑脊平行于所述驱动轴(7)的中心部分(57)延伸,相互的角度为120°。 通过这种方式实现夹持力的有利力矩比和夹持板(19)在捏合位置的稳定支撑。
    • 8. 发明授权
    • Magnetic-tape apparatus with pivotably mounted magnetic head
    • 具有可枢转安装的磁头的磁带设备
    • US5450262A
    • 1995-09-12
    • US213482
    • 1994-03-14
    • Marinus P. KosterAlbert VisscherRobert C. H. BoereboomCasparus W. KruijerJaap Oudes
    • Marinus P. KosterAlbert VisscherRobert C. H. BoereboomCasparus W. KruijerJaap Oudes
    • G11B5/29G11B5/48G11B5/49G11B15/60G11B15/62
    • G11B15/602G11B15/62G11B5/4893
    • A magnetic-tape apparatus has a magnetic-head unit with a magnetic head having a head face for guiding a magnetic tape. The magnetic head has transducing gaps for writing and/or reading information onto/from the magnetic tape. The magnetic-head unit further comprises two height limiters having tape-guide surfaces for guiding an edge of the magnetic tape. A tangent line, which is tangent to both tape-guide surfaces, extends perpendicularly to an imaginary line in the head face and passing through the transducing gaps. If an edge of the magnetic tape is in contact with the two height limiters, the position of the magnetic tape relative to the magnetic head is always the same, so that no azimuth errors can arise. In order to bring this edge of the magnetic tape into contact with the height limiters, the magnetic-head unit is mounted so as to be pivotable about an axis perpendicular to a tangent plane to the head face at the location of the transducing gaps. This axis extends through the center of gravity of the magnetic-head unit.
    • 磁带装置具有磁头单元,磁头单元具有用于引导磁带的磁头面的磁头。 磁头具有用于向/从磁带写入和/或读取信息的换能间隙。 磁头单元还包括两个高度限制器,其具有用于引导磁带边缘的带引导表面。 与两个带引导表面相切的切线垂直于头部表面中的假想线延伸并且穿过换能间隙。 如果磁带的边缘与两个高度限制器接触,则磁带相对于磁头的位置总是相同的,从而不会产生方位误差。 为了使磁带的这个边缘与高度限制器接触,磁头单元安装成在换能间隙的位置处绕垂直于切平面的轴线枢转到头部面。 该轴线延伸穿过磁头单元的重心。
    • 9. 发明授权
    • Particle-optical device for irradiating an object
    • 用于照射物体的粒子光学装置
    • US07091497B2
    • 2006-08-15
    • US10795759
    • 2004-03-08
    • Albert Visscher
    • Albert Visscher
    • G21K5/10
    • H01J37/20
    • The invention provides a particle-optical device for irradiating an object with a beam of particles. The device comprises a housing in which are located positioning means 1 for positioning the object within the housing. The positioning means comprise a reference body 2 supported against a supporting portion of the housing and a kinematic system—which can be manipulated—with an object carrier 9 for manipulating the object held in the object carrier in at least one degree of freedom with respect to the reference body 2, the device further comprising control means and at least one combination 23,30 of a piezo-electric position actuator 25 and a piezo-electric force sensor 35, which actuator and sensor are positioned in series, whereby the control means—in dependence upon at least one input signal from at least one sensor—generates a control signal for at least that actuator associated with said sensor, characterized in that the series-positioned actuators and sensors of said at least one combination are positioned between the housing and the reference body, the support of the reference body against the supporting portion of the housing occurring via said at least one combination.
    • 本发明提供一种用粒子光束照射物体的粒子光学装置。 该装置包括壳体,其中定位用于将物体定位在壳体内的定位装置1。 定位装置包括支撑在壳体的支撑部分上的参考体2和可以被操纵的运动系统,该运动系统具有对象载体9,用于相对于至少一个自由度来操纵保持在物体载体中的物体 参考体2,该装置还包括控制装置和压电位置致动器25和压电力传感器35的至少一个组合23,30,该致动器和传感器被定位成串联,由此控制装置 - 根据来自至少一个传感器的至少一个输入信号,产生用于至少与所述传感器相关联的致动器的控制信号,其特征在于,所述至少一个组合的所述串联定位的致动器和传感器定位在所述壳体和 所述参考体,所述参考体抵靠所述至少一个组合发生的所述壳体的支撑部分的支撑。
    • 10. 发明授权
    • Object carrier for a particle-optical apparatus
    • 粒子光学仪器的物体载体
    • US06593581B2
    • 2003-07-15
    • US09767570
    • 2001-01-23
    • Albert Visscher
    • Albert Visscher
    • G21K510
    • H01L21/6875H01J37/20H01J2237/0216
    • Objects such as semiconductor wafers to be studied in a scanning electron microscope (SEM) are subject to vibrations which are intensified by vibration resonance of the (thin) wafer, so that the resolution of the SEM is severely degraded. In prior art it is known to support the wafer by means of elastic support members. However, such support members do not counteract the detrimental vibrations. According to the invention there are provided elastic support elements 28 that can accommodate to the inevitable shape errors of the wafer 18 and hence remain in contact with the wafer surface 32. Moreover, the support elements are embodied in such a manner that frictional contact exists between the moving part 38 of the support element and the body 34 of the object carrier 20. The support elements thus provide support which is elastic for macroscopic support but hard for the vibrational movements in the nanometer range, thus inhibiting such vibrational movements.
    • 在扫描电子显微镜(SEM)中研究的诸如半导体晶片的物体受到由(薄)晶片的振动共振而增强的振动,使得SEM的分辨率严重劣化。 在现有技术中,已知通过弹性支撑构件支撑晶片。 然而,这种支撑构件不能抵消有害振动。 根据本发明,提供了可以适应晶片18的不可避免的形状误差并且因此保持与晶片表面32接触的弹性支撑元件28.此外,支撑元件以这样的方式实现:摩擦接触存在于 支撑元件的移动部分38和物体载体20的主体34.因此,支撑元件提供对宏观支撑弹性的支撑,但对于纳米范围内的振动运动是困难的,从而抑制这种振动运动。