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1. 发明授权

US11333985B2 Position sensor 有权
公开(公告)号：US11333985B2
公开(公告)日：2022-05-17
申请号：US17254601
申请日：2019-06-05
申请人： ASML Netherlands B.V.
发明人： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
IPC分类号： G03F9/00
摘要： The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.

2. 发明授权

US10372045B2 Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator 有权
公开(公告)号：US10372045B2
公开(公告)日：2019-08-06
申请号：US14428287
申请日：2013-08-26
申请人： ASML Netherlands B.V.
发明人： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
IPC分类号： G03F7/20 , H01F7/08 , H01F7/16 , H02P25/08 , H02P6/16 , H02P25/06 , H02K41/025 , H02P25/034 , G03F7/22 , H02K11/00 , H02K41/03
摘要： A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.

3. 发明授权

US10061213B2 Sensor, object positioning system, lithographic apparatus and device manufacturing method 有权
公开(公告)号：US10061213B2
公开(公告)日：2018-08-28
申请号：US15505885
申请日：2015-07-20
申请人： ASML NETHERLANDS B.V.
发明人： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
IPC分类号： G03F7/20 , G01L1/16 , G01P15/09
CPC分类号： G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085 , H01L41/1132
摘要： A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

4. 发明授权

US09952513B2 Undulator 有权
公开(公告)号：US09952513B2
公开(公告)日：2018-04-24
申请号：US15129360
申请日：2015-03-30
申请人： ASML Netherlands B.V.
发明人： Andrey Alexandrovich Nikipelov , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Erik Roelof Loopstra , Michael Jozef Mathijs Renkens , Adrian Toma , Han-Kwang Nienhuys
IPC分类号： G03F7/20 , H01S3/09 , H05H7/04 , H01F6/04 , H01F7/02
CPC分类号： G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
摘要： An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.

5. 发明申请

US20150234297A1 Method of Calibrating a Reluctance Actuator Assembly, Reluctance Actuator and Lithographic Apparatus Comprising Such Reluctance Actuator 审中-公开
标题翻译：磁阻驱动器组件，磁阻驱动器和平版印刷设备校准方法
公开(公告)号：US20150234297A1
公开(公告)日：2015-08-20
申请号：US14428287
申请日：2013-08-26
申请人： ASML Netherlands B.V.
发明人： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
IPC分类号： G03F7/20 , G03F7/22 , H02P25/06 , H02P25/08 , H02K41/03 , H02K11/00
CPC分类号： G03F7/70725 , G03F7/22 , G03F7/70758 , H01F7/081 , H01F7/1646 , H02K11/20 , H02K41/025 , H02K41/03 , H02K41/033 , H02P6/16 , H02P25/034 , H02P25/06 , H02P25/08 , H02P25/092
摘要： A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
摘要翻译：一种磁阻致动器组件，包括磁阻致动器，用于测量磁阻致动器的间隙中的磁通量的磁通传感器，以及基于磁通量设定点和磁通量测量的磁通量来驱动磁阻致动器的致动器线圈的磁通放大器通量传感器一种方法，包括向所述通量放大器提供磁通设定点，所述通量设定点包括在激励频率处的时间常数分量和正弦变化分量，以响应于所述通量设定点测量由所述磁阻致动器产生的力，以及校准所述磁阻致动器从测量力组装。

6. 发明授权

US10381796B2 Free electron laser 有权
公开(公告)号：US10381796B2
公开(公告)日：2019-08-13
申请号：US16060792
申请日：2016-11-29
申请人： ASML Netherlands B.V.
发明人： Petrus Wilhelmus Smorenburg , Johannes Antonius Gerardus Akkermans
IPC分类号： H01S3/09 , G03F7/20 , H05H7/04 , H05H9/04 , H05H9/00
摘要： A free electron laser FEL comprises an undulator 24 generating coherent EUV radiation receiving an upstream electron beam EB2 and emitting a downstream electron beam EB4 and at least an electron source 21a, 21b operable to produce an upstream electron beam EB1, EB2 comprising bunches of electrons. A beam path is configured to direct the upstream electron beam through: a linear accelerator system (LINAC) comprising at least a first and a second linear accelerators 22a, 22b, a bunch compressor 28b, and said undulator 24. The downstream electron beam EB3, EB4 that leaves the undulator 24 recirculates through the second linear accelerator 22b in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the second linear accelerator 22b and then recirculates through the first linear accelerator 22a in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the first linear accelerator 22a; and to direct the downstream beam to a beam dump 100. At least a first energy spreader 50a, 50b, 50c imparts a reversible change to the energy distribution of bunches of electrons and is located at a position in the beam path before the bunch compressor 28b and so that it is only passed through by the upstream electron beam EB1. A second energy spreader 50d reverses the change to the energy distribution of bunches of electrons imparted by the at least one first energy spreader 50a, 50b, 50c, the second energy spreader 50d being located at a position in the beam path before the undulator 24 and so that it is only passed through by the upstream electron beam EB2.

7. 发明申请

US20170264071A1 Electron Injector and Free Electron Laser 审中-公开
公开(公告)号：US20170264071A1
公开(公告)日：2017-09-14
申请号：US15600149
申请日：2017-05-19
申请人： ASML Netherlands B.V.
发明人： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
IPC分类号： H01S3/09 , H01J1/34 , H05H7/08
CPC分类号： H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
摘要： A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

8. 发明授权

US11181835B2 Metrology sensor, lithographic apparatus and method for manufacturing devices 有权
公开(公告)号：US11181835B2
公开(公告)日：2021-11-23
申请号：US16613551
申请日：2018-04-13
申请人： ASML Netherlands B.V. , ASML Holding N.V.
发明人： Sebastianus Adrianus Goorden , Johannes Antonius Gerardus Akkermans , Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
摘要： Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.

9. 发明授权

US10437154B2 Lithographic method 有权
公开(公告)号：US10437154B2
公开(公告)日：2019-10-08
申请号：US15789702
申请日：2017-10-20
申请人： ASML NETHERLANDS B.V.
发明人： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Erik Roelof Loopstra , Wouter Joep Engelen , Johannes Antonius Gerardus Akkermans
IPC分类号： G03B27/42 , H01J31/48 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

10. 发明授权

US09728931B2 Electron injector and free electron laser 有权
公开(公告)号：US09728931B2
公开(公告)日：2017-08-08
申请号：US15035674
申请日：2014-11-27
申请人： ASML Netherlands B.V.
发明人： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op'T Root
IPC分类号： H01S3/09 , H01J1/34 , H05H7/08
CPC分类号： H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
摘要： An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.

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