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1. 发明授权

US5894400A Method and apparatus for clamping a substrate 失效
标题翻译：用于夹持衬底的方法和装置
公开(公告)号：US5894400A
公开(公告)日：1999-04-13
申请号：US865330
申请日：1997-05-29
申请人： Andrew J. Graven , Melvin Schmidt , Kenneth A. McCuen , Yunju Ra
发明人： Andrew J. Graven , Melvin Schmidt , Kenneth A. McCuen , Yunju Ra
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H02N13/00 , H01L21/6831 , Y10T279/23
摘要： A method and apparatus for securely clamping a substrate to an electrostatic chuck during processing of a substrate. The method generally includes the steps of forming an initial electrostatic clamping force between the electrostatic chuck and the substrate, modifying the initial electrostatic clamping force when an rf voltage is applied to the electrostatic chuck during processing, and restoring the initial electrostatic clamping force with an offset voltage applied to the electrostatic chuck. The present invention also includes an electrostatic chuck having at least one electrode and a dielectric on the surface of the electrode for supporting a substrate. A voltage source is coupled to the electrode for electrostatically clamping the substrate to the surface of the electrostatic chuck with an initial electrostatic force. An rf source is coupled to the electrode for applying rf voltage to the electrostatic chuck and causing a change in the initial electrostatic force. A control system is coupled to the rf source and voltage source for producing an offset voltage in response to the change in the initial electrostatic force thereby restoring the initial electrostatic force.
摘要翻译：一种用于在衬底处理期间将衬底牢固地夹持到静电吸盘的方法和装置。该方法通常包括在静电卡盘和基板之间形成初始静电夹持力的步骤，当在加工期间向静电卡盘施加rf电压时修改初始静电夹持力，并且以偏移量恢复初始静电夹紧力施加到静电卡盘的电压。本发明还包括在电极表面上具有至少一个电极和电介质的静电卡盘，用于支撑基板。电压源耦合到电极，用于以初始静电力将基板静电夹持到静电卡盘的表面。 rf源耦合到电极，用于将静电电压施加到静电卡盘并引起初始静电力的变化。控制系统耦合到射频源和电压源，以响应于初始静电力的变化产生偏移电压，从而恢复初始静电力。

2. 发明授权

US06447635B1 Plasma processing system and system using wide area planar antenna 有权
标题翻译：等离子体处理系统和系统采用广域平面天线
公开(公告)号：US06447635B1
公开(公告)日：2002-09-10
申请号：US09379663
申请日：1999-08-24
申请人： Yunju Ra
发明人： Yunju Ra
IPC分类号： C23F102
CPC分类号： H01J37/321
摘要： An antenna adapted to apply a uniform electromagnetic field to a volume of gas and including an input terminal for receiving electrical energy into the antenna and an array of radiating elements connected to the input terminal thereof. In the illustrative embodiment, the antenna has four radiating elements. Each radiating element is a conductor wound in a rectangular spiral shape. Each radiating element is connected to the input terminal on one end and an output terminal on a second end thereof. The input terminal is equidistant from first, second, third and fourth output terminals connected to the first, second, third and fourth radiating elements, respectively. The inventive antenna affords a novel method for plasma processing a device including the steps of: mounting the device within a chamber; providing a gas the chamber; and applying an electromagnetic field to the gas via an array of antenna elements disposed relative to the gas to generate a uniform distribution of the plasma.
摘要翻译：一种天线，适于对一定体积的气体施加均匀的电磁场，并且包括用于将电能接收到天线中的输入端子和连接到其输入端子的辐射元件的阵列。在说明性实施例中，天线具有四个辐射元件。每个辐射元件是缠绕成矩形螺旋形状的导体。每个辐射元件在一端连接到输入端，在其第二端连接到输出端。输入端子分别与连接到第一，第二，第三和第四辐射元件的第一，第二，第三和第四输出端子等距。本发明的天线提供了一种用于等离子体处理装置的新方法，包括以下步骤：将装置安装在室内; 提供气体室; 以及经由相对于气体设置的天线元件的阵列向气体施加电磁场，以产生等离子体的均匀分布。

3. 发明授权

US06445536B1 Dielectric stencil-defined write head for MR, GMR, and spin valve high density recording heads 失效
标题翻译：用于MR，GMR和自旋阀高密度记录头的介质模板定义写头
公开(公告)号：US06445536B1
公开(公告)日：2002-09-03
申请号：US09140903
申请日：1998-08-27
申请人： Steven C. Rudy , Hugh C. Hiner , Lien-Chang Wang , Yong Shen , Ut Tran , Yunju Ra , Durga Ravipati
发明人： Steven C. Rudy , Hugh C. Hiner , Lien-Chang Wang , Yong Shen , Ut Tran , Yunju Ra , Durga Ravipati
IPC分类号： G11B533
CPC分类号： G11B5/3163 , G11B5/3109 , G11B5/3116 , G11B5/313 , G11B5/3967
摘要： A thin film head apparatus and method for forming such a thin film head. In one approach, the present invention recites forming a cavity in a dielectric layer. Next, a layer of high magnetic field saturation (HBsat) material is sputter-deposited over the dielectric layer such that the HBsat material is deposited into the cavity formed in the dielectric layer. The cavity in the dielectric layer functions as a mold or “stencil” for the HBsat material. The HBsat material deposited into the cavity is used to form the first core of a thin film head. After the formation of the first core of the thin film head, a gap layer of material is deposited above the dielectric layer and above the first core. Next, a layer of HBsat material is sputter-deposited above the gap layer of material and above the first core of the thin film head. The layer of HBsat material disposed above the gap layer of material and above the first core is used to form the second core of the thin film head. Hence, this invention forms first and second cores of a thin film head using sputter deposition processes. As a result, selected HBsat materials which were not well suited to conventional thin film head formation methods can now be used to form the cores of thin film head structures.
摘要翻译：一种用于形成这种薄膜头的薄膜头装置和方法。在一种方法中，本发明阐述了在电介质层中形成空腔。接下来，将一层高磁场饱和（HBsat）材料溅射沉积在电介质层上，使得HBsat材料沉积到形成在电介质层中的空腔中。电介质层中的空腔用作HBsat材料的模具或“模板”。沉积到腔中的HBsat材料用于形成薄膜头的第一芯。在形成薄膜头的第一芯之后，材料的间隙层沉积在介电层上方并在第一芯上方。接下来，将一层HBsat材料溅射沉积在材料的间隙层的上方并位于薄膜头的第一芯上方。设置在材料的间隙层之上和第一芯之上的HBsat材料层用于形成薄膜头的第二芯。因此，本发明使用溅射沉积工艺形成薄膜头的第一和第二芯。结果，现在可以使用非常适合于常规薄膜头形成方法的所选HBsat材料来形成薄膜头结构的芯。

4. 发明授权

US07871490B2 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution 有权
标题翻译：具有并联天线阵列的电感耦合等离子体发生系统具有均匀分布的功率输入和接地节点，并改善了现场分布
公开(公告)号：US07871490B2
公开(公告)日：2011-01-18
申请号：US11338085
申请日：2006-01-24
申请人： Harqkyun Kim , Yunju Ra
发明人： Harqkyun Kim , Yunju Ra
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： C23C16/507 , H01J37/321
摘要： An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil. While the antenna elements are disposed around a chamber, the feeder coils are disposed above the chamber to improved the distribution of electromagnetic energy within the chamber.
摘要翻译：一种天线适用于对一定体积的气体施加均匀的电磁场，并且包括与均匀分布的输入端子并联连接的辐射元件，用于将电磁能接收到天线中并输出接地端子。在说明性实施例中，天线具有并联连接的三个辐射元件。每个辐射元件是缠绕成具有相同直径的圆形形状的导体。每个辐射元件在一端连接到输入端子，另一端连接到输出端子。第二元件的输入端从第一元件逆时针旋转120度，第三元件的输入端从第二元件逆时针旋转120度。每个辐射元件的接地端子以与输入端子相同的方式定位。每个元件由馈线线圈馈送。当天线元件设置在腔室周围时，馈电线圈设置在腔室上方，以改善腔室内电磁能的分布。

5. 发明申请

US20060124059A1 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution 有权
标题翻译：具有并联天线阵列的电感耦合等离子体发生系统具有均匀分布的功率输入和接地节点，并改善了现场分布
公开(公告)号：US20060124059A1
公开(公告)日：2006-06-15
申请号：US11338085
申请日：2006-01-24
申请人： Harqkyun Kim , Yunju Ra
发明人： Harqkyun Kim , Yunju Ra
IPC分类号： C23C16/00 , C23F1/00 , B44C1/22 , H05H1/24
CPC分类号： C23C16/507 , H01J37/321
摘要： An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil. While the antenna elements are disposed around a chamber, the feeder coils are disposed above the chamber to improved the distribution of electromagnetic energy within the chamber.
摘要翻译：一种天线适用于对一定体积的气体施加均匀的电磁场，并且包括与均匀分布的输入端子并联连接的辐射元件，用于将电磁能接收到天线中并输出接地端子。在说明性实施例中，天线具有并联连接的三个辐射元件。每个辐射元件是缠绕成具有相同直径的圆形形状的导体。每个辐射元件在一端连接到输入端子，另一端连接到输出端子。第二元件的输入端从第一元件逆时针旋转120度，第三元件的输入端从第二元件逆时针旋转120度。每个辐射元件的接地端子以与输入端子相同的方式定位。每个元件由馈线线圈馈送。当天线元件设置在腔室周围时，馈电线圈设置在腔室上方，以改善腔室内电磁能的分布。

6. 发明授权

US06310577B1 Plasma processing system with a new inductive antenna and hybrid coupling of electronagnetic power 失效
标题翻译：等离子体处理系统采用新型感应天线和电磁耦合耦合
公开(公告)号：US06310577B1
公开(公告)日：2001-10-30
申请号：US09382013
申请日：1999-08-24
申请人： Yunju Ra
发明人： Yunju Ra
IPC分类号： H01Q126
CPC分类号： H05H1/46 , H01J37/321
摘要： An antenna adapted to apply a uniform electromagnetic field with high energy density to a volume of gas. The antenna includes an input node for receiving electrical energy and a first coil for radiating electromagnetic energy into the gas. The first coil is connected to the input node on one end thereof and is grounded on the opposite side to cause flux to flow in a first direction. A second coil is included for radiating electromagnetic energy into the gas. The second coil is also connected to the input node on one end thereof and grounded on the opposite side to flow in the first direction. Multiple number of coils can be added to form an antenna. In an illustrative application, the antenna is used in a plasma processing system comprising a vacuum chamber, a gas disposed within the vacuum chamber, and a dielectric disposed around the vacuum chamber. The inventive antenna is mounted around the dielectric tube and radiates electromagnetic energy into the gas. In a specific embodiment, the invention further includes a magnet disposed about the chamber in proximity to the antenna. When RF power is supplied to the antenna via an impedance matching network, the antenna radiates a uniform, dense electromagnetic wave into the gas creating plasma. The invention includes an electrically isolated electrode located on top of the source. When (RF) power is supplied to the electrode via on impedance matching network, the electrode creates an electrostatic force that pushes electrons back into plasma there by resulting in high plasma density.
摘要翻译：一种天线适用于将高能量密度的均匀电磁场施加到一定体积的气体。天线包括用于接收电能的输入节点和用于将电磁能辐射到气体中的第一线圈。第一线圈在其一端连接到输入节点，并在相对侧接地，以使通量沿第一方向流动。包括用于将电磁能辐射到气体中的第二线圈。第二线圈也在其一端连接到输入节点并在相对侧接地以在第一方向上流动。可以添加多个线圈以形成天线。在说明性应用中，天线用于包括真空室，设置在真空室内的气体和设置在真空室周围的电介质的等离子体处理系统中。本发明的天线安装在电介质管周围，并将电磁能辐射到气体中。在一个具体实施例中，本发明还包括围绕该天线设置在该室附近的磁体。当通过阻抗匹配网络将RF功率提供给天线时，天线将均匀的致密电磁波辐射到产生气体的等离子体中。本发明包括位于源极顶部的电隔离电极。当通过阻抗匹配网络向电极提供（RF）功率时，电极产生静电力，通过产生高等离子体密度将电子推回到等离子体中。

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