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1. 发明申请

US20050146709A1 Plasma processing method and plasma processing apparatus 有权
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20050146709A1
公开(公告)日：2005-07-07
申请号：US11055612
申请日：2005-02-11
申请人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
发明人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
IPC分类号： G01J3/28 , G01J3/30 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32935
摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.
摘要翻译：在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据。

2. 发明授权

US07101458B2 Plasma processing method and apparatus 有权
标题翻译：等离子体处理方法和装置
公开(公告)号：US07101458B2
公开(公告)日：2006-09-05
申请号：US10727604
申请日：2003-12-05
申请人： Hin Oh , Yuichi Mimura
发明人： Hin Oh , Yuichi Mimura
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01J37/32935 , G01N21/73 , H01J37/32972
摘要： In a plasma processing method and apparatus for monitoring an operating status of a plasma processing apparatus and/or a processing status of an object being processed, emission spectra emitted from a plasma is obtained as optical data when the plasma process is performed on the object. Quantitative data of each emission source is obtained from the obtained optical data by using reference data in a database storing therein emission spectra of a plurality of emission source as the reference data. The operating status of the plasma processing apparatus and/or the processing status of the object being processed is estimated based on changes in the quantitative data of each emission source.
摘要翻译：在等离子体处理装置的等离子体处理方法和装置和/或待处理物体的处理状态的等离子体处理方法和装置中，当对物体进行等离子体处理时，获得从等离子体发射的发射光谱作为光学数据。通过使用存储有多个发射源的发射光谱的数据库中的参考数据作为参考数据，从获得的光学数据获得每个发射源的定量数据。基于每个发射源的定量数据的变化来估计等离子体处理装置的操作状态和/或被处理物体的处理状态。

3. 发明授权

US06985215B2 Plasma processing method and plasma processing apparatus 有权
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US06985215B2
公开(公告)日：2006-01-10
申请号：US11055612
申请日：2005-02-11
申请人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
发明人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
IPC分类号： H01L21/3065 , G01J3/28 , G01J3/30
CPC分类号： H01J37/32935
摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.
摘要翻译：在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据。

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