专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130256259A1 MEMS NANOSTRUCTURES AND METHODS OF FORMING THE SAME 有权
标题翻译： MEMS纳米结构及其形成方法
公开(公告)号：US20130256259A1
公开(公告)日：2013-10-03
申请号：US13465928
申请日：2012-05-07
申请人： Yi-Hsien CHANG , Chun-Ren CHENG , Yi-Shao LIU , Allen Timothy CHANG , Ching-Ray CHEN , Yeh-Tseng LI , Wen-Hsiang LIN
发明人： Yi-Hsien CHANG , Chun-Ren CHENG , Yi-Shao LIU , Allen Timothy CHANG , Ching-Ray CHEN , Yeh-Tseng LI , Wen-Hsiang LIN
IPC分类号： B44C1/22 , B05D3/04 , B05D5/06
CPC分类号： B81C1/00349 , B81B2201/042 , B81C1/00111 , B81C1/00206 , B81C1/00214 , B82Y20/00 , G01N27/44791
摘要： A method of forming of MEMS nanostructures includes a portion of a substrate is recessed to form a plurality of mesas in the substrate. Each of the plurality of mesas has a top surface and a sidewall surface. A light reflecting layer is deposited over the substrate thereby covering the top surface and the sidewall surface of each mesa. A protection layer is formed over the light reflecting layer. An ARC layer is formed over the protection layer. An opening in a photo resist layer is formed over the ARC layer over each mesa. A portion of the ARC layer, the protection layer and the light reflecting layer are removed through the opening to expose the top surface of each mesa. The photo resist layer and the ARC layer over the top surface of each mesa are removed.
摘要翻译： MEMS纳米结构的形成方法包括：衬底的一部分被凹入以在衬底中形成多个台面。多个台面中的每一个具有顶表面和侧壁表面。光反射层沉积在衬底上，从而覆盖每个台面的顶表面和侧壁表面。在光反射层上形成保护层。在保护层上形成ARC层。在每个台面上的ARC层上形成光致抗蚀剂层的开口。通过开口去除ARC层，保护层和光反射层的一部分以暴露每个台面的顶表面。去除每个台面的顶表面上的光致抗蚀剂层和ARC层。

2. 发明授权

US6055107A Diffractive lens and preparation method thereof 失效
$Diffractive lens and preparation method thereof$
标题翻译：衍射透镜及其制备方法
公开(公告)号：US6055107A
公开(公告)日：2000-04-25
申请号：US909089
申请日：1997-08-12
申请人： Yeh-Tseng Li , Chen-Kuei Chung , Jin-Shown Shie
发明人： Yeh-Tseng Li , Chen-Kuei Chung , Jin-Shown Shie
IPC分类号： G02B5/18 , G03F7/00 , G02B27/44 , G03C5/00 , G03F9/00
CPC分类号： G02B5/1857 , G03F7/001
摘要： Method for the preparation of diffractive lens with one single etching step and using one single etching mask. While the widths and intervals of the masked areas of the photo masks are decided under a geometric relation, an etching mask can be prepared on the substrate of the lens where the widths and the intervals of the masked areas can be determined. As the included angle between the etching mask and the plan of the material of the lens is in a certain ratio to the etching efficiency of the etchant to the substrate of the lens, a one step etching process can be developed whereby multilevel diffractive lens with required number, widths and heights of the levels can be obtained. This invention also provides an oxidation-isotropic etching process on the diffractive lens so prepared.
摘要翻译：用单一蚀刻步骤制备衍射透镜并使用一个单一蚀刻掩模的方法。虽然光掩模的掩蔽区域的宽度和间隔是以几何关系决定的，但是可以在可以确定掩蔽区域的宽度和间隔的透镜的基底上制备蚀刻掩模。由于蚀刻掩模与透镜材料的平面之间的夹角与蚀刻剂对透镜基板的蚀刻效率成一定比例，因此可以开发一步蚀刻工艺，从而可以开发具有所需的多层衍射透镜数量，宽度和高度可以得到。本发明还提供了如此制备的衍射透镜上的氧化 - 各向同性蚀刻工艺。

3. 发明授权

US08883021B2 MEMS nanostructures and methods of forming the same 有权
标题翻译： MEMS纳米结构及其形成方法
公开(公告)号：US08883021B2
公开(公告)日：2014-11-11
申请号：US13465928
申请日：2012-05-07
申请人： Yi-Hsien Chang , Chun-Ren Cheng , Yi-Shao Liu , Allen Timothy Chang , Ching-Ray Chen , Yeh-Tseng Li , Wen-Hsiang Lin
发明人： Yi-Hsien Chang , Chun-Ren Cheng , Yi-Shao Liu , Allen Timothy Chang , Ching-Ray Chen , Yeh-Tseng Li , Wen-Hsiang Lin
IPC分类号： B23P15/00 , C03C25/00 , C23F1/00 , H01B13/00
CPC分类号： B81C1/00349 , B81B2201/042 , B81C1/00111 , B81C1/00206 , B81C1/00214 , B82Y20/00 , G01N27/44791
摘要： A method of forming of MEMS nanostructures includes a portion of a substrate is recessed to form a plurality of mesas in the substrate. Each of the plurality of mesas has a top surface and a sidewall surface. A light reflecting layer is deposited over the substrate thereby covering the top surface and the sidewall surface of each mesa. A protection layer is formed over the light reflecting layer. An ARC layer is formed over the protection layer. An opening in a photo resist layer is formed over the ARC layer over each mesa. A portion of the ARC layer, the protection layer and the light reflecting layer are removed through the opening to expose the top surface of each mesa. The photo resist layer and the ARC layer over the top surface of each mesa are removed.
摘要翻译： MEMS纳米结构的形成方法包括：衬底的一部分被凹入以在衬底中形成多个台面。多个台面中的每一个具有顶表面和侧壁表面。光反射层沉积在衬底上，从而覆盖每个台面的顶表面和侧壁表面。在光反射层上形成保护层。在保护层上形成ARC层。在每个台面上的ARC层上形成光致抗蚀剂层的开口。通过开口去除ARC层，保护层和光反射层的一部分以暴露每个台面的顶表面。去除每个台面的顶表面上的光致抗蚀剂层和ARC层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式