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    • 1. 发明授权
    • Method of manufacturing thermal assisted magnetic write head
    • 制造热辅助写磁头的方法
    • US08578593B2
    • 2013-11-12
    • US12902755
    • 2010-10-12
    • Kosuke TanakaShinji HaraTsutomu ChouYasutoshi Fujita
    • Kosuke TanakaShinji HaraTsutomu ChouYasutoshi Fujita
    • G11B5/187G11B7/08
    • G11B5/314G11B5/6088G11B2005/001G11B2005/0021
    • A method of manufacturing a thermally-assisted magnetic write head is provided. The method includes steps of: forming a laminate structure including the waveguide; the plasmon generator, and the magnetic pole in order; performing a first polishing process to planarize an end surface of the laminate structure; performing a first etching process to remove impurity attached on the end surface of the laminate structure, and to allow the plasmon generator to be recessed from the waveguide and the magnetic pole, thereby forming a recessed region on the end surface of the laminate structure; forming a protection layer on the end surface of the laminate structure such that at least the recessed region is filled; and performing a second polishing process on the end surface of the laminate structure formed with the protection layer until the plasmon generator is exposed, thereby completing the air bearing surface.
    • 提供一种制造热辅助写磁头的方法。 该方法包括以下步骤:形成包括波导的层压结构; 等离子体发生器和磁极; 执行第一抛光工艺以使层压结构的端面平坦化; 执行第一蚀刻工艺以去除附着在层压结构的端面上的杂质,并允许等离子体激元发生器从波导和磁极凹陷,从而在层压结构的端面上形成凹陷区域; 在所述层压结构的端面上形成保护层,使得至少所述凹陷区域被填充; 并在形成有保护层的叠层结构的端面进行第二抛光处理,直到等离子体激元发生器露出为止,从而完成空气支承面。
    • 2. 发明申请
    • METHOD OF MANUFACTURING THERMAL ASSISTED MAGNETIC WRITE HEAD
    • 制造热辅助磁头的方法
    • US20120084969A1
    • 2012-04-12
    • US12902755
    • 2010-10-12
    • Kosuke TANAKAShinji HARATsutomu CHOUYasutoshi FUJITA
    • Kosuke TANAKAShinji HARATsutomu CHOUYasutoshi FUJITA
    • G11B5/127
    • G11B5/314G11B5/6088G11B2005/001G11B2005/0021
    • A method of manufacturing a thermally-assisted magnetic write head is provided. The method includes steps of: forming a laminate structure including the waveguide; the plasmon generator, and the magnetic pole in order; performing a first polishing process to planarize an end surface of the laminate structure; performing a first etching process to remove impurity attached on the end surface of the laminate structure, and to allow the plasmon generator to be recessed from the waveguide and the magnetic pole, thereby forming a recessed region on the end surface of the laminate structure; forming a protection layer on the end surface of the laminate structure such that at least the recessed region is filled; and performing a second polishing process on the end surface of the laminate structure formed with the protection layer until the plasmon generator is exposed, thereby completing the air bearing surface.
    • 提供一种制造热辅助写磁头的方法。 该方法包括以下步骤:形成包括波导的层压结构; 等离子体发生器和磁极; 执行第一抛光工艺以使层压结构的端面平坦化; 执行第一蚀刻工艺以去除附着在层压结构的端面上的杂质,并允许等离子体激元发生器从波导和磁极凹陷,从而在层压结构的端面上形成凹陷区域; 在所述层压结构的端面上形成保护层,使得至少所述凹陷区域被填充; 并在形成有保护层的叠层结构的端面进行第二抛光处理,直到等离子体激元发生器露出为止,从而完成空气支承面。