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    • 1. 发明授权
    • Method for producting a filter
    • 生产过滤器的方法
    • US06328876B1
    • 2001-12-11
    • US09463896
    • 2000-01-28
    • Wilfried HofmannTschangiz Scheybani
    • Wilfried HofmannTschangiz Scheybani
    • C25F312
    • C25F3/12B01J8/002B01J8/1872B01J2219/182
    • A method for producing a filter includes the steps of providing a blank of etchable semiconductor material having a first side and a second side and affixing a holding element to the blank. The holding element is chemically resistant to an etching solution. A current source is connected to the blank and at least one of the first and second sides of the blank is illuminated with light. The holding element and the blank are immersed in the etching solution until the first side of the blank is wetted so that the first side is etched electrochemically. The holding element is affixed to the blank such that contact areas between the holding element and the blank remain free of the etching solution.
    • 一种制造滤光器的方法包括以下步骤:提供具有第一侧和第二面的可蚀刻半导体材料的坯料,并将保持元件固定到坯料上。 保持元件对蚀刻溶液具有化学耐受性。 电流源连接到坯件,坯料的第一和第二侧中的至少一个被光照射。 将保持元件和坯料浸入蚀刻溶液中直到坯料的第一侧被润湿,使得第一侧被电化学蚀刻。 保持元件固定到坯件上,使得保持元件和坯料之间的接触区域保持不含蚀刻溶液。