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1. 发明授权

US09400421B2 Mask blank substrate, mask blank, reflective mask blank, transfer mask, reflective mask, and methods of manufacturing the same 有权
标题翻译：掩模空白基板，掩模板，反光掩模板，转印掩模，反射掩模及其制造方法
公开(公告)号：US09400421B2
公开(公告)日：2016-07-26
申请号：US14118479
申请日：2012-05-15
申请人： Tatsuya Sasaki , Takahito Nishimura
发明人： Tatsuya Sasaki , Takahito Nishimura
IPC分类号： G03F1/24 , B32B3/02 , G03F1/38 , G03F1/60 , G03F1/22
CPC分类号： G03F1/24 , B32B3/02 , G03F1/22 , G03F1/38 , G03F1/42 , G03F1/60 , Y10T428/24488
摘要： A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than 90° and the distance from the boundary between the main surface and the substrate mark to the outer periphery of the mask blank substrate is less than 1.5 mm.
摘要翻译：掩模空白基板设置有包括倾斜部分的基板标记。基板标记相对于主表面的倾斜角度大于45°且小于90°，并且从主表面和基板标记之间的边界到掩模基板的外周的距离小于1.5 mm。

2. 发明授权

US09399993B2 Vane compressor having a vane supporter that suppresses leakage of refrigerant 有权
标题翻译：叶片式压缩机，具有抑制制冷剂泄漏的叶片支架
公开(公告)号：US09399993B2
公开(公告)日：2016-07-26
申请号：US14350998
申请日：2012-01-11
申请人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
发明人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
IPC分类号： F03C2/00 , F03C4/00 , F04C2/00 , F04C18/344 , F04C18/352 , F01C21/08 , F04C18/32 , F04C29/02 , F04C23/00
CPC分类号： F04C18/3441 , F01C21/0836 , F04C18/321 , F04C18/352 , F04C23/008 , F04C29/025 , F04C2240/603 , F04C2240/809
摘要： To allow a bush to stably rotate about a bush center, an end of a vane portion that is close to an inner circumferential surface center is always positioned on the inner side with respect to the bush center. Thereby, in a vane compressor a vane is stably supported, wear at a tip of the vane is suppressed, loss due to sliding on bearings is reduced by supporting a rotating shaft portion with a small diameter, and accuracy in outside diameter and center of rotation of a rotor portion is increased.
摘要翻译：为了允许衬套围绕衬套中心稳定地旋转，叶片部分的靠近内周面中心的端部总是位于相对于衬套中心的内侧。因此，在叶片式压缩机中，叶片稳定地被支撑，能够抑制叶片的尖端的磨损，通过支撑小直径的旋转轴部以及外径和旋转中心的精度来减小由于轴承上的滑动造成的损失的转子部分增加。

3. 发明授权

US09127675B2 Vane compressor with vane aligners 有权
标题翻译：叶片式压缩机
公开(公告)号：US09127675B2
公开(公告)日：2015-09-08
申请号：US13701057
申请日：2011-08-02
申请人： Shin Sekiya , Hideaki Maeyama , Shinichi Takahashi , Hirotsugu Hayashi , Tetsuhide Yokoyama , Tatsuya Sasaki , Hideto Nakao
发明人： Shin Sekiya , Hideaki Maeyama , Shinichi Takahashi , Masahiro Hayashi , Tetsuhide Yokoyama , Tatsuya Sasaki , Hideto Nakao
IPC分类号： F04C18/00 , F04C18/32 , F04C23/00 , F04C18/352 , F04C18/344 , F04C27/00 , F01C21/08
CPC分类号： F04C18/00 , F01C21/0809 , F01C21/0836 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C23/008 , F04C27/001
摘要： A vane compressor including plural vanes that perform a compression operation such that the normal to a circular arc formed by each vane tip portion and the normal to the inner peripheral surface of a cylinder are constantly approximately coincident with each other. Each of the plural vanes is held constantly in the normal direction of the inner peripheral surface of the cylinder or is held constantly along a direction having a fixed inclination with respect to the normal direction of the inner peripheral surface of the cylinder so that the compression operation is performed in the state the normal to the circular arc formed by the tip portion of each of the plural vanes and the normal to the inner peripheral surface of the cylinder are constantly approximately coincident with each other. The plural vanes are rotatably and movably supported with respect to a rotor portion.
摘要翻译：一种叶片式压缩机，其包括执行压缩操作的多个叶片，使得由每个叶片尖端部分形成的圆弧的法线与圆柱体的内周面的法线垂直于彼此大致一致。多个叶片中的每一个保持恒定在圆筒的内周面的法线方向上，或者沿着相对于圆筒的内周面的法线方向具有固定倾斜的方向保持恒定，使得压缩操作在与多个叶片中的每一个叶片的顶端形成的圆弧垂直的状态下，并且圆筒的内周面的法线彼此大致一致。多个叶片相对于转子部分可旋转并可移动地支撑。

4. 发明申请

US20140294642A1 VANE COMPRESSOR 有权
标题翻译： VANE压缩机
公开(公告)号：US20140294642A1
公开(公告)日：2014-10-02
申请号：US14350937
申请日：2012-01-11
申请人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
发明人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
IPC分类号： F04C18/08
CPC分类号： F04C18/08 , F01C21/0809 , F01C21/0836 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C23/008 , F04C29/025 , F04C2240/603 , F04C2240/809
摘要： A gap between a vane tip and a cylinder inner circumferential surface is denoted by δ. If rv is set as in an Expression (1), a first vane rotates with the vane tip thereof being out of contact with the cylinder inner circumferential surface. In the vane compressor, wear at the tip of a vane is suppressed, loss due to sliding on bearings is reduced by supporting a rotating shaft portion with a small diameter, and accuracy in an outside diameter and center of rotation of a rotor portion is increased.
摘要翻译：叶片尖端和气缸内周面之间的间隙由δ表示。如果如式（1）那样设定rv，则第一叶片随其叶片端部与气缸内周面不接触而旋转。在叶片式压缩机中，抑制叶片尖端的磨损，通过支撑小直径的旋转轴部来减小由于轴承上的滑动造成的损失，并且转子部的外径和旋转中心的精度提高。

5. 发明授权

US08602760B2 Vane compressor 有权
标题翻译：叶片压缩机
公开(公告)号：US08602760B2
公开(公告)日：2013-12-10
申请号：US13084929
申请日：2011-04-12
申请人： Hideaki Maeyama , Shinichi Takahashi , Shin Sekiya , Tetsuhide Yokoyama , Hideto Nakao , Tatsuya Sasaki , Hirotsugu Hayashi
发明人： Hideaki Maeyama , Shinichi Takahashi , Masahiro Hayashi , Shin Sekiya , Tetsuhide Yokoyama , Hideto Nakao , Tatsuya Sasaki
IPC分类号： F03C2/00 , F03C4/00 , F04C2/00
CPC分类号： F01C21/0836 , F01C21/0809 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C27/001
摘要： A vane compressor according to the present invention, including a cylinder which is approximately cylindrical and whose both ends located in an axial direction are open, a cylinder head and a frame which close both the ends of the cylinder, a rotor shaft which includes a rotor part being cylindrical and rotating in the cylinder and a shaft part transmitting torque to the rotor part, and a vane which is installed in the rotor part and whose tip portion has the R-shape facing outward, performs the compression operation in the state where the normal to the R-shape of the tip portion of the vane and the normal to the inner surface of the cylinder are always approximately coincident with each other.
摘要翻译：根据本发明的叶片式压缩机，包括近似圆柱形并且其两端位于轴向的开口的气缸，气缸盖和闭合气缸的两端的框架，转子轴包括转子在圆筒中旋转的部分和向转子部传递扭矩的轴部分，以及安装在转子部分中并且其尖端具有面向外的R形状的叶片，在这样的状态下进行压缩操作：垂直于叶片的尖端部分的R形和气缸的内表面的法线总是大致相互重合。

6. 发明申请

US20120009078A1 VANE COMPRESSOR 有权
标题翻译： VANE压缩机
公开(公告)号：US20120009078A1
公开(公告)日：2012-01-12
申请号：US13084929
申请日：2011-04-12
申请人： Hideaki Maeyama , Shinichi Takahashi , Masahiro Hayashi , Shin Sekiya , Tetsuhide Yokoyama , Hideto Nakao , Tatsuya Sasaki , Hirotsugu Hayashi
发明人： Hideaki Maeyama , Shinichi Takahashi , Masahiro Hayashi , Shin Sekiya , Tetsuhide Yokoyama , Hideto Nakao , Tatsuya Sasaki , Hirotsugu Hayashi
IPC分类号： F01C19/04
CPC分类号： F01C21/0836 , F01C21/0809 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C27/001
摘要： A vane compressor according to the present invention, including a cylinder which is approximately cylindrical and whose both ends located in an axial direction are open, a cylinder head and a frame which close both the ends of the cylinder, a rotor shaft which includes a rotor part being cylindrical and rotating in the cylinder and a shaft part transmitting torque to the rotor part, and a vane which is installed in the rotor part and whose tip portion has the R-shape facing outward, performs the compression operation in the state where the normal to the R-shape of the tip portion of the vane and the normal to the inner surface of the cylinder are always approximately coincident with each other.
摘要翻译：根据本发明的叶片式压缩机，包括近似圆柱形并且其两端位于轴向的开口的气缸，气缸盖和闭合气缸的两端的框架，转子轴包括转子在圆筒中旋转的部分和向转子部传递扭矩的轴部分，以及安装在转子部分中并且其尖端具有面向外的R形状的叶片，在这样的状态下进行压缩操作：垂直于叶片的尖端部分的R形和圆筒内表面的法线总是大致相互重合。

7. 发明授权

US08025759B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08025759B2
公开(公告)日：2011-09-27
申请号：US10559815
申请日：2004-07-01
申请人： Tatsuya Sasaki , Naoshi Yamada , Yoshifumi Katsumata , Noburu Shimizu , Seiryo Tsuno , Takashi Mitsuya
发明人： Tatsuya Sasaki , Naoshi Yamada , Yoshifumi Katsumata , Noburu Shimizu , Seiryo Tsuno , Takashi Mitsuya
IPC分类号： H01L21/304 , B24B37/04
CPC分类号： B24B49/03 , B24B37/042 , H01L21/3212
摘要： A polishing apparatus has a polishing section (302) configured to polish a substrate and a measurement section (307) configured to measure a thickness of a film formed on the substrate. The polishing apparatus also has an interface (310) configured to input a desired thickness of a film formed on a substrate to be polished and a storage device (308a) configured to store polishing rate data on at least one past substrate therein. The polishing apparatus includes an arithmetic unit (308b) operable to calculate a polishing rate and an optimal polishing time based on the polishing rate data and the desired thickness by using a weighted average method which weights the polishing rate data on a lately polished substrate.
摘要翻译：抛光装置具有：抛光部（302），被配置为对基板进行抛光;以及测量部（307），被配置为测量形成在基板上的膜的厚度。抛光装置还具有被配置为输入形成在待抛光的基板上的膜的期望厚度的接口（310）和被配置为在其中至少一个过去的基板上存储抛光速率数据的存储装置（308a）。抛光装置包括运算单元（308b），其通过使用加权平均法来计算抛光速率和基于抛光速率数据和期望厚度的最佳抛光时间，该加权平均法将抛光速率数据加权到最近抛光的基底上。

8. 发明申请

US20110171568A1 MASK BLANK SUBSTRATE 有权
标题翻译：掩蔽空白基板
公开(公告)号：US20110171568A1
公开(公告)日：2011-07-14
申请号：US13120263
申请日：2009-10-25
申请人： Tatsuya Sasaki , Takahiro Miyazaki
发明人： Tatsuya Sasaki , Takahiro Miyazaki
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/50 , B24B1/005 , B24B37/042 , C03C19/00 , G03F1/14 , G03F1/60 , G03F7/20
摘要： Provided is a mask blank substrate that can reduce the change in flatness of a main surface thereof before and after chucking to make very small the position offset caused by a photomask and that can significantly reduce the difference in tendency of substrate deformation before and after chucking between photomasks. In a mask blank substrate having two main surfaces and four end faces, a central point is set on the main surface, a first axis of symmetry that passes through the central point and that is parallel to one of the end faces and a second axis of symmetry that passes through the central point and that is perpendicular to the first axis of symmetry are respectively set, measurement points are set in the form of a grid with respect to the first axis of symmetry and the second axis of symmetry so as to measure heights of the main surface from a reference plane at the measurement points, respectively, differences each between measured height values at those measurement points located at positions that are axisymmetric with respect to the first axis of symmetry are calculated, and those differences corresponding to at least 95% of the total number of the calculated differences between the measured height values are within a predetermined value.
摘要翻译：提供了一种掩模基板，其可以减少夹具之前和之后的主表面的平坦度变化，从而使由光掩模引起的位置偏移非常小，并且可以显着地减少夹具之前和之后的基板变形趋势之间的差异光掩模在具有两个主表面和四个端面的掩模坯料基板中，中心点设置在主表面上，第一对称轴线穿过中心点并平行于一个端面，第二轴线分别设置穿过中心点并且垂直于第一对称轴线的对称性，测量点相对于第一对称轴和第二对称轴设置为网格的形式，以便测量高度在测量点处从参考平面分别计算在位于相对于第一对称轴对称的位置的那些测量点处的测量高度值之间的差异，并且这些差异对应于至少95 计算出的测量高度值之差的总数的百分比在预定值内。

9. 发明授权

US06827633B2 Polishing method 有权
标题翻译：抛光方法
公开(公告)号：US06827633B2
公开(公告)日：2004-12-07
申请号：US10330189
申请日：2002-12-30
申请人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
发明人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B7/228 , B24B53/095 , H01L21/31053
摘要： A wafer is pressed against a fixed abrasive and brought into sliding contact with the fixed abrasive. Thus, the wafer is polished. A surface of the fixed abrasive is dressed so as to generate free abrasive particles thereon. A liquid or a gas, composed of a mixture of liquid or inert gas and pure water or chemical liquid, is ejected onto the surface of the fixed abrasive during or after the dressing process.
摘要翻译：将晶片压靠固定的磨料并与固定的磨料滑动接触。因此，晶片被抛光。修整固定磨料的表面以在其上产生游离的磨料颗粒。由液体或惰性气体与纯水或化学液体的混合物组成的液体或气体在修整过程中或之后被喷射到固定磨料的表面上。

10. 发明授权

US06244825B1 Pump-protecting device, pump-protecting method and pumping apparatus 失效
标题翻译：泵保护装置，泵保护方法和泵送装置
公开(公告)号：US06244825B1
公开(公告)日：2001-06-12
申请号：US09408354
申请日：1999-09-29
申请人： Tatsuya Sasaki , Naoki Yuzuhara , Akihiko Imai
发明人： Tatsuya Sasaki , Naoki Yuzuhara , Akihiko Imai
IPC分类号： F04B4906
CPC分类号： F04B49/20 , F04B2203/0208 , F04D19/04 , F04D27/0261
摘要： An apparatus and a method are provided for protecting a vacuum pump from being overloaded while maintaining the vacuum condition. A pump-protecting device comprises a power detector for detecting power consumption of a motor for driving a vacuum pump as a load received by the motor, and a control means for decreasing the speed of revolution of the motor when the value of power consumption detected by the power detector is equal to or greater than a predetermined value.
摘要翻译：提供了一种用于在保持真空状态的同时保护真空泵免于过载的装置和方法。泵保护装置包括功率检测器，用于检测用于驱动作为电动机接收的负载的真空泵的电动机的功率消耗;以及控制装置，用于当电动机的转速值功率检测器等于或大于预定值。

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