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1. 发明授权

US08673660B2 Method of producing liquid ejection head 有权
标题翻译：液体喷射头的制造方法
公开(公告)号：US08673660B2
公开(公告)日：2014-03-18
申请号：US13348177
申请日：2012-01-11
申请人： Taichi Yonemoto
发明人： Taichi Yonemoto
IPC分类号： H01L21/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/1645 , B41J2/1646
摘要： Provided is a method of producing a liquid ejection head substrate, the method including, in sequence; grinding a second surface of a silicon substrate, which is an opposite surface of a first surface on which a function element is formed, polishing the ground second surface, etching the polished second surface by reactive ion etching using ion incident energy, forming an etching mask on the second surface after the reactive ion etching, and forming a liquid supply port by subjecting the silicon substrate to wet etching using the etching mask.
摘要翻译：提供一种制造液体喷射头基板的方法，该方法包括：研磨作为其上形成有功能元件的第一表面的相对表面的硅衬底的第二表面，抛光地面第二表面，通过使用离子入射能的反应离子蚀刻蚀刻抛光的第二表面，形成蚀刻掩模在反应离子蚀刻之后的第二表面上，并且通过使用蚀刻掩模对硅基板进行湿蚀刻来形成液体供给口。

2. 发明授权

US08435805B2 Method of manufacturing a substrate for liquid ejection head 有权
标题翻译：液体喷射头用基板的制造方法
公开(公告)号：US08435805B2
公开(公告)日：2013-05-07
申请号：US13215492
申请日：2011-08-23
申请人： Taichi Yonemoto , Hiroyuki Abo , Keisuke Kishimoto
发明人： Taichi Yonemoto , Hiroyuki Abo , Keisuke Kishimoto
IPC分类号： H01L21/00
CPC分类号： B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1642 , B41J2/1645 , B41J2/1646
摘要： Provided is a method of manufacturing a substrate for liquid ejection head, including: forming a groove portion by etching on one surface side of a silicon substrate, the groove portion being formed so as to surround a portion at which a liquid supply port is to be formed on an inner side of the groove portion; forming a protective layer on the one surface side of the silicon substrate, the protective layer being formed inside the groove portion and on an outer side of the groove portion; and forming the liquid supply port by subjecting the silicon substrate to crystal anisotropic etching treatment with use of the protective layer as a mask.
摘要翻译：本发明提供一种液体喷射头用基材的制造方法，其特征在于，包括：通过在硅基板的一个表面侧进行蚀刻来形成槽部，所述槽部形成为包围供给口的部分形成在所述槽部的内侧; 在所述硅基板的一个表面侧上形成保护层，所述保护层形成在所述槽部内部和所述槽部的外侧; 以及通过使用保护层作为掩模对硅衬底进行结晶各向异性蚀刻处理来形成液体供给口。

3. 发明申请

US20120088317A1 PROCESSING METHOD OF SILICON SUBSTRATE AND PROCESS FOR PRODUCING LIQUID EJECTION HEAD 审中-公开
标题翻译：硅基板的加工方法和生产液体喷射头的方法
公开(公告)号：US20120088317A1
公开(公告)日：2012-04-12
申请号：US13226113
申请日：2011-09-06
申请人： Keisuke Kishimoto , Shuji Koyama , Hiroyuki Abo , Taichi Yonemoto
发明人： Keisuke Kishimoto , Shuji Koyama , Hiroyuki Abo , Taichi Yonemoto
IPC分类号： H01L21/308
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B41J2/1639
摘要： A processing method of a silicon substrate, including forming on a back surface of a silicon substrate an etching mask layer having an opening portion, measuring a thickness of the silicon substrate, irradiating the opening portion in the etching mask layer with laser from the back surface of the silicon substrate to form in the silicon substrate a modified layer with a thickness that is varied according to the measured thickness of the silicon substrate, carrying out anisotropic etching with regard to the silicon substrate having the modified layer formed therein to form in the back surface a depressed portion which does not pass through the silicon substrate and which has a bottom surface in the silicon substrate, and carrying out dry etching in the depressed portion to form a through-hole passing from the bottom surface of the depressed portion to a front surface of the silicon substrate.
摘要翻译：一种硅衬底的处理方法，包括在硅衬底的背表面上形成具有开口部分的蚀刻掩模层，测量硅衬底的厚度，用激光从背面照射蚀刻掩模层中的开口部分的硅衬底，以在硅衬底中形成具有根据测量的硅衬底的厚度而变化的厚度的改性层，相对于其中形成有改性层的硅衬底进行各向异性蚀刻以在背面形成表面没有通过硅衬底并且在硅衬底中具有底表面的凹陷部分，并且在凹陷部分中进行干蚀刻以形成从凹陷部分的底表面到前面的通孔硅衬底的表面。

4. 发明申请

US20100323526A1 METHOD OF PROCESSING SILICON SUBSTRATE AND METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD 有权
标题翻译：硅基板的加工方法及液体排放头的制造方法
公开(公告)号：US20100323526A1
公开(公告)日：2010-12-23
申请号：US12784144
申请日：2010-05-20
申请人： Keisuke Kishimoto , Taichi Yonemoto
发明人： Keisuke Kishimoto , Taichi Yonemoto
IPC分类号： H01L21/306
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631
摘要： A method of processing a substrate including the following steps: providing a silicon substrate that has an etching mask layer with an opening portion at a first surface thereof and has plane orientation of {100} with the surface of the silicon being exposed from the opening portion; preparing a recessed portion that faces from the first surface to a second surface, which is an opposite surface of the first surface, in the opening portion of the silicon substrate; and forming a penetration port that passes through the first surface and the second surface of the silicon substrate by executing crystalline anisotropic etching in the silicon substrate using an etching liquid in which an etching rate for etching a (100) surface of silicon is higher than an etching rate for etching a (110) surface of silicon, from the recessed portion of the silicon substrate toward the second surface.
摘要翻译：一种处理衬底的方法，包括以下步骤：提供具有蚀刻掩模层的硅衬底，该蚀刻掩模层在其第一表面具有开口部分，并且具有{100}的平面取向，其中硅的表面从开口部分露出 ; 准备在所述硅基板的开口部分中从所述第一表面到所述第一表面的相反表面的第二表面的凹部; 以及通过使用其中蚀刻硅的（100）表面的蚀刻速率高于所述硅衬底的蚀刻液体，通过在所述硅衬底中执行结晶各向异性蚀刻来形成穿过所述硅衬底的所述第一表面和所述第二表面的穿透端口用于从硅衬底的凹陷部分朝向第二表面蚀刻硅的（110）表面的蚀刻速率。

5. 发明申请

US20100147793A1 METHOD FOR PRODUCING LIQUID DISCHARGE HEAD 有权
标题翻译：生产液体排放头的方法
公开(公告)号：US20100147793A1
公开(公告)日：2010-06-17
申请号：US12635083
申请日：2009-12-10
申请人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
发明人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
IPC分类号： G11B5/127
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , Y10T29/49401
摘要： The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer.
摘要翻译：本发明提供了一种液体排出头的制造方法，该液体排出头包括硅基板，该第一表面在第一表面上具有能量产生元件和从第一表面穿过该基板的供给口，基片的第一表面。该方法包括以下步骤：在要形成供墨口的第一表面上的一部分制备具有牺牲层的硅衬底和在第二表面上具有多个开口的蚀刻掩模层，牺牲层的与相邻的两个开口之间的部分相对应的位置处的部分比对应于开口的位置处的牺牲层的一部分的体积小; 从多个开口蚀刻硅衬底并蚀刻牺牲层。

6. 发明授权

US08329047B2 Method for producing liquid discharge head 有权
标题翻译：液体排出头的制造方法
公开(公告)号：US08329047B2
公开(公告)日：2012-12-11
申请号：US12635083
申请日：2009-12-10
申请人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
发明人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
IPC分类号： G01D15/00
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , Y10T29/49401
摘要： The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer.
摘要翻译：本发明提供了一种液体排出头的制造方法，该液体排出头包括硅基板，该第一表面在第一表面上具有能量产生元件和从第一表面穿过该基板的供给口，基片的第一表面。该方法包括以下步骤：在要形成供墨口的第一表面上的一部分制备具有牺牲层的硅衬底和在第二表面上具有多个开口的蚀刻掩模层，牺牲层的与相邻的两个开口之间的部分相对应的位置处的部分比对应于开口的位置处的牺牲层的一部分的体积小; 从多个开口蚀刻硅衬底并蚀刻牺牲层。

7. 发明申请

US20120267342A1 METHOD OF PRODUCING SUBSTRATE FOR LIQUID EJECTION HEAD 有权
标题翻译：生产用于液体喷射头的基材的方法
公开(公告)号：US20120267342A1
公开(公告)日：2012-10-25
申请号：US13433806
申请日：2012-03-29
申请人： Kenta Furusawa , Shuj i Koyama , Hiroyuki Abo , Taichi Yonemoto
发明人： Kenta Furusawa , Shuj i Koyama , Hiroyuki Abo , Taichi Yonemoto
IPC分类号： B44C1/22
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： A substrate for a liquid ejection head, including: forming a sacrifice layer on a first surface of a silicon substrate in a region in which a liquid supply port is to open, the sacrifice layer containing aluminum which is selectively etched with respect to the silicon substrate; forming an etching mask on a second surface which is a rear surface of the first surface of the silicon substrate, the etching mask having an opening corresponding to the sacrifice layer; a first etching step of etching the silicon substrate by using the etching mask as a mask and by using a first etchant containing 8 mass % or more and less than 15 mass % of tetramethylammonium hydroxide; and after the first etching step, a second etching step of removing the sacrifice layer by using a second etchant containing 15 mass % or more and 25 mass % or less of tetramethylammonium hydroxide.
摘要翻译：一种液体喷射头用基材，其特征在于，包括：在液体供给口打开的区域的硅基板的第一面上形成牺牲层，所述牺牲层含有相对于所述硅基板有选择地蚀刻的铝 ; 在作为硅衬底的第一表面的后表面的第二表面上形成蚀刻掩模，所述蚀刻掩模具有对应于所述牺牲层的开口; 通过使用蚀刻掩模作为掩模蚀刻硅衬底并使用含有8质量％以上且小于15质量％的四甲基氢氧化铵的第一蚀刻剂的第一蚀刻步骤; 并且在第一蚀刻步骤之后，通过使用含有15质量％以上且25质量％以下的四甲基氢氧化铵的第二蚀刻剂除去牺牲层的第二蚀刻工序。

8. 发明授权

US08128204B2 Liquid ejection head and method for manufacturing liquid ejection head 有权
标题翻译：液体喷射头和液体喷射头的制造方法
公开(公告)号：US08128204B2
公开(公告)日：2012-03-06
申请号：US13009709
申请日：2011-01-19
申请人： Noriyasu Ozaki , Junichi Kobayashi , Shuji Koyama , Tadanobu Nagami , Yoshinori Tagawa , Kenji Fujii , Hiroyuki Murayama , Masaki Ohsumi , Jun Yamamuro , Yoshinobu Urayama , Hiroyuki Abo , Takeshi Terada , Masahisa Watanabe , Taichi Yonemoto
发明人： Noriyasu Ozaki , Junichi Kobayashi , Shuji Koyama , Tadanobu Nagami , Yoshinori Tagawa , Kenji Fujii , Hiroyuki Murayama , Masaki Ohsumi , Jun Yamamuro , Yoshinobu Urayama , Hiroyuki Abo , Takeshi Terada , Masahisa Watanabe , Taichi Yonemoto
IPC分类号： B41J2/05 , B41J2/04 , G11B5/127 , B21D53/76
CPC分类号： B41J2/14129 , B41J2202/11 , Y10T29/49401
摘要： A liquid ejection head and a method of forming the same. The liquid ejection head includes a substrate, an ejection port, a liquid channel, and a supply port. The substrate has, above one side thereof, an energy generating element configured to generate energy used to eject liquid. The ejection port, from which a liquid is ejected, is located at a position corresponding to the energy generating element. The liquid channel communicates with the ejection port and penetrates the substrate from the one side to another side of the substrate. The supply port communicates with the liquid channel. The substrate has a projecting layer extending inward of an inner peripheral portion of an opening in the supply port in the one side, and the projecting layer and the energy generating element are formed of the same material.
摘要翻译：液体喷射头及其形成方法。液体喷射头包括基板，喷射口，液体通道和供给口。衬底在其一侧上具有被配置为产生用于喷射液体的能量的能量产生元件。排出液体的喷射口位于与能量产生元件相对应的位置。液体通道与喷射口连通并从衬底的一侧到另一侧穿透衬底。供应口与液体通道连通。基板具有从一侧的供给口的开口的内周部向内延伸的突出层，突出层和能量产生元件由相同的材料形成。

9. 发明申请

US20090007428A1 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD 有权
标题翻译：制造液体放电头的方法
公开(公告)号：US20090007428A1
公开(公告)日：2009-01-08
申请号：US12145428
申请日：2008-06-24
申请人： Taichi Yonemoto , Junichi Kobayashi , Yoshinori Tagawa , Hideo Tamura , Hiroyuki Murayama , Kenji Fujii , Keiji Watanabe
发明人： Taichi Yonemoto , Junichi Kobayashi , Yoshinori Tagawa , Hideo Tamura , Hiroyuki Murayama , Kenji Fujii , Keiji Watanabe
IPC分类号： B21D53/76
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1645 , B41J2002/14475 , Y10T29/42 , Y10T29/49401
摘要： A method of manufacturing a liquid discharge head including a plurality of passages on a substrate, the passages communicating with a plurality of discharge ports configured to discharge liquid. The method includes the step of forming first to fourth patterns, the first pattern having a shape of one passage of the passages, the second pattern having a shape of other passage of the passages, the third pattern being formed near the first pattern, the fourth pattern being formed near the second pattern, the first to fourth patterns being formed on the substrate. The method also includes coating the substrate with a cover layer covering the first to fourth patterns, removing the first pattern to form the one passage, and removing the second pattern to form the other passage.
摘要翻译：一种制造在基板上具有多个通道的排液头的方法，所述通道与多个配置成排出液体的排出口连通。该方法包括形成第一至第四图案的步骤，第一图案具有通道的一个通道的形状，第二图案具有通道的另一通道的形状，第三图案形成在第一图案附近，第四图案图案形成在第二图案附近，第一至第四图案形成在基板上。该方法还包括用覆盖第一至第四图案的覆盖层涂覆基板，移除第一图案以形成一个通道，以及移除第二图案以形成另一通道。

10. 发明申请

US20080317971A1 METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD 有权
标题翻译：制造液体放电头的方法
公开(公告)号：US20080317971A1
公开(公告)日：2008-12-25
申请号：US12142541
申请日：2008-06-19
申请人： Mitsunori Toshishige , Yoshinori Tagawa , Hideo Tamura , Taichi Yonemoto
发明人： Mitsunori Toshishige , Yoshinori Tagawa , Hideo Tamura , Taichi Yonemoto
IPC分类号： C08J7/18
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1645
摘要： A method for manufacturing a liquid discharge head including a flow path forming member to form a flow path communicating with a discharge port for discharging liquids includes forming an organic material layer on a substrate, applying a soluble resin on the organic material layer to form a resin layer, patterning the resin layer to form a pattern with a shape of the flow path, forming a cover layer as the flow path forming member on the pattern, forming the discharge port to expose a part of the pattern from the cover layer, eluting the pattern from the discharge port to form the flow path, irradiating a substance sticking to a surface of the flow path forming member on which the discharge port is formed with ultraviolet light, wherein the substance contains at least the organic material, and removing the sticking substance.
摘要翻译：一种液体排出头的制造方法，包括流路形成部件，以形成与排出液体的排出口连通的流路，包括在基板上形成有机材料层，在有机材料层上涂布可溶性树脂，形成树脂层，图案化树脂层以形成具有流动路径形状的图案，在图案上形成作为流路形成构件的覆盖层，形成排出口以从覆盖层露出图案的一部分，从排出口形成图案以形成流路，用紫外线照射粘附到形成有排出口的流路形成部件的表面的物质，其中该物质至少含有有机材料，并除去粘着物质。

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