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    • 4. 发明授权
    • Light-sensitive heat-sensitive recording material
    • 感光热敏记录材料
    • US5376495A
    • 1994-12-27
    • US799800
    • 1991-11-29
    • Shintaro WashizuJun YamaguchiKazuyuki KoikeKeiichiro OzawaTetsuro Fuchizawa
    • Shintaro WashizuJun YamaguchiKazuyuki KoikeKeiichiro OzawaTetsuro Fuchizawa
    • G03F7/00G03C1/72
    • G03F7/002
    • A light-sensitive heat-sensitive recording material is disclosed, which contains microcapsules resulting from a solution containing at least one component capable of undergoing color development or achromatization as a core material of the microcapsules and a volatile solvent which has a water solubility of 10% by volume or less and has a low boiling point such that it volatilizes during a process for preparing said light-sensitive heat-sensitive recording material leaving substantially no trace of the solvent in the resulting recording material. As the microcapsules, ones having a mean particle size of 2 .mu.m or less are preferred, and ones prepared using a modified gelatin as a protective colloid are also preferred. Further, as the support of the light-sensitive heat-sensitive recording material, a polyester support filled with a white pigment can preferably be used.
    • 公开了一种感光热敏记录材料,其包含由含有至少一种能够进行着色显影或作为微胶囊的核心材料的消色剂的溶液产生的微胶囊和水溶性为10%的挥发性溶剂, 体积以下,具有低沸点,使得在制备所述感光热敏记录材料的过程中挥发,在所得记录材料中基本上不留下痕量的溶剂。 作为微胶囊,优选平均粒径为2μm以下的微胶囊,并且优选使用改性明胶作为保护胶体而制备的微胶囊。 此外,作为感光热敏记录材料的载体,优选使用填充有白色颜料的聚酯载体。
    • 7. 发明授权
    • Image display unit and method of manufacturing the same
    • 图像显示单元及其制造方法
    • US07227540B2
    • 2007-06-05
    • US10421945
    • 2003-04-24
    • Jin MurayamaKoichi KimuraShintaro WashizuFumitoshi Toyokawa
    • Jin MurayamaKoichi KimuraShintaro WashizuFumitoshi Toyokawa
    • G09G5/00
    • G09F9/372
    • An MEM unit according to the invention comprises an Si (silicon) substrate 1 having such a thickness as to transmit a visible light therethrough, an insulating layer 2 formed in contact with the upper surface of the Si substrate 1, a lower electrode layer 3 formed in contact with the upper surface of the insulating layer 2, a sacrificial layer gap 4 of a space formed in the partial region of the upper surface of the lower electrode layer 3, a movable film 5 formed on the upper surface of the lower electrode layer 3 to cover the sacrificial layer gap 4, an upper electrode 6 formed in contact with the upper part of the movable film 5, a contact hole 7 penetrating to reach the surface of the lower electrode layer 3 from the surface of the movable film 5, and a lower electrode 8 formed from the surroundings of the upper part of the contact hole 7 to the surface of the lower electrode layer 3 through the contact hole 7.
    • 根据本发明的MEM单元包括具有透射可见光的厚度的Si(硅)衬底1,与Si衬底1的上表面接触形成的绝缘层2,形成的下电极层3 与绝缘层2的上表面接触形成在下电极层3的上表面的部分区域中的空间的牺牲层间隙4,形成在下电极层的上表面上的可动膜5 如图3所示,覆盖牺牲层间隙4,与可动膜5的上部接触形成的上部电极6,从可动膜5的表面贯通到下部电极层3的表面的接触孔7, 以及从接触孔7的上部周围通过接触孔7到下电极层3的表面形成的下电极8。