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1. 发明授权

US08557044B2 Shadow mask, method of manufacturing the same and method of forming thin film using the same 有权
标题翻译：荫罩，其制造方法以及使用其形成薄膜的方法
公开(公告)号：US08557044B2
公开(公告)日：2013-10-15
申请号：US11730120
申请日：2007-03-29
申请人： Seok-whan Chung , Seok-jin Kang , Hyun-koo Jeong
发明人： Seok-whan Chung , Seok-jin Kang , Hyun-koo Jeong
IPC分类号： C23C16/50 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： B81C1/00396 , B81C2201/0198
摘要： A shadow mask, a method of manufacturing the shadow mask, and a method of forming a thin film using the shadow mask are provided. The shadow mask includes an upper layer and a lower layer. The upper layer includes a first opening. The lower layer is formed on a lower surface of the upper layer around the first opening and includes an opening having the same size as the first opening. When the thin film is formed using the shadow mask, the lower layer of the shadow mask is close to the edge of a cavity of a substrate, and a position on which the thin film may be formed as defined by the lower layer of the shadow mask. Therefore, the thickness of the thin film can be uniform.
摘要翻译：提供荫罩，荫罩的制造方法以及使用荫罩形成薄膜的方法。荫罩包括上层和下层。上层包括第一开口。下层形成在第一开口周围的上层的下表面上，并且包括具有与第一开口相同尺寸的开口。当使用荫罩形成薄膜时，荫罩的下层靠近基板的空腔的边缘，并且可以由薄膜的下层限定薄膜的位置面具。因此，薄膜的厚度可以是均匀的。

2. 发明授权

US08549715B2 Piezoelectric microspeaker and method of fabricating the same 有权
标题翻译：压电式微型扬声器及其制造方法
公开(公告)号：US08549715B2
公开(公告)日：2013-10-08
申请号：US12428502
申请日：2009-04-23
申请人： Dong-kyun Kim , Seok-whan Chung , Byung-gil Jeong
发明人： Dong-kyun Kim , Seok-whan Chung , Byung-gil Jeong
IPC分类号： H01L41/22 , H04R17/00 , B21D53/76 , B23P17/00
CPC分类号： H01L41/314 , H01L41/332 , H04R17/005 , H04R31/00 , H04R2201/003
摘要： A piezoelectric microspeaker fabricated by a method including: forming a lower drive unit by forming a first drive electrode by depositing and etching a first thin conductive layer on a substrate, forming a first piezoelectric plate by depositing and etching a first piezoelectric layer on the first drive electrode, and forming a first common electrode by depositing and etching a second conductive layer on the first piezoelectric plate; after forming the lower drive unit, forming a diaphragm by depositing a non-conductive layer on the first common electrode; and forming an upper drive unit by forming a second common electrode by depositing and etching a third conductive layer on the diaphragm, forming a second piezoelectric plate by depositing and etching a second piezoelectric layer on the second common electrode, and forming a second drive electrode by depositing and etching a fourth conductive layer on the second piezoelectric plate.
摘要翻译：一种通过以下方法制造的压电微型扬声器：包括：通过在基板上沉积和蚀刻第一薄导电层形成第一驱动电极而形成下驱动单元，通过在第一驱动器上沉积和蚀刻第一压电层形成第一压电板并且通过在第一压电板上沉积和蚀刻第二导电层形成第一公共电极; 在形成下驱动单元之后，通过在第一公共电极上沉积非导电层形成隔膜; 以及通过在所述隔膜上沉积和蚀刻第三导电层形成第二公共电极而形成上部驱动单元，通过在所述第二公共电极上沉积和蚀刻第二压电层形成第二压电板，并且通过沉积和蚀刻第二压电板上的第四导电层。

3. 发明授权

US08275155B2 Method for fabricating micro speaker and micro speaker fabricated by the same 有权
标题翻译：用于制造由其制造的微型扬声器和微型扬声器的方法
公开(公告)号：US08275155B2
公开(公告)日：2012-09-25
申请号：US12186677
申请日：2008-08-06
申请人： Byung-gil Jeong , Hyung-jae Shin , Seok-whan Chung , Dong-kyun Kim
发明人： Byung-gil Jeong , Hyung-jae Shin , Seok-whan Chung , Dong-kyun Kim
IPC分类号： H04R25/00 , H01L21/00
CPC分类号： H04R19/005 , H01L2224/11 , H04R31/006 , H04R2201/003
摘要： A method for fabricating a micro speaker is provided, including forming a package wafer and a device wafer by batch processing, bonding the package wafer and the device wafer to each other, and forming a diaphragm by isotropic-etching a back surface of the device wafer using a xenon difluoride (XeF2). As a result, a micro-electronic-mechanic system (MEMS) technology-based piezoelectric micro speaker having a wide frequency response range is realized, by batch processing, thereby providing simplified structure and processing and reducing fabricating cost.
摘要翻译：提供了一种制造微型扬声器的方法，包括通过间歇处理形成封装晶片和器件晶片，将封装晶片和器件晶片彼此接合，并通过各向同性蚀刻器件晶片的背面形成隔膜使用氙二氟化物（XeF2）。结果，通过批量处理实现了具有宽频率响应范围的微电子机械系统（MEMS）技术的压电微型扬声器，从而提供简化的结构和处理并降低制造成本。

4. 发明申请

US20110075879A1 PIEZOELECTRIC MICRO SPEAKER WITH CURVED LEAD WIRES AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：具有弯曲导线的压电微型扬声器及其制造方法
公开(公告)号：US20110075879A1
公开(公告)日：2011-03-31
申请号：US12751686
申请日：2010-03-31
申请人： Dong-kyun KIM , Byung-gil JEONG , Seok-whan CHUNG , Jun-sik HWANG
发明人： Dong-kyun KIM , Byung-gil JEONG , Seok-whan CHUNG , Jun-sik HWANG
IPC分类号： H04R1/00 , H01L41/22 , H04R31/00
CPC分类号： H04R17/00 , H04R2201/003 , H04R2307/025 , H04R2499/11 , Y10T29/42 , Y10T29/49005
摘要： A micro speaker includes a substrate having a cavity formed therein, a diaphragm formed on the substrate overlapping the cavity. The diaphragm includes a first vibration membrane formed in a first area corresponding to a center portion of the cavity and a second vibration membrane formed in a second area corresponding to an edge portion of the cavity and formed of material different from that used for the first vibration membrane. A piezoelectric actuator is formed including a first electrode layer formed on the first vibration membrane, a piezoelectric layer formed on the first electrode layer, and a second electrode layer formed on the piezoelectric layer, and first and second curved lead wires, respectively connected to the first and second electrode layers across the second area, which are symmetrical to the center of the piezoelectric actuator.
摘要翻译：微型扬声器包括其中形成有空腔的基板，形成在基板上的与该空腔重叠的隔膜。隔膜包括形成在与空腔的中心部分相对应的第一区域中的第一振动膜和形成在与空腔的边缘部分相对应的第二区域中并由与用于第一振动的材料不同的材料形成的第二区域的第二振动膜膜。一种压电致动器，包括形成在第一振动膜上的第一电极层，形成在第一电极层上的压电层和形成在压电层上的第二电极层，以及分别连接到第一电极层上的第一和第二弯曲引线跨越第二区域的第一和第二电极层，其与压电致动器的中心对称。

5. 发明申请

US20100074459A1 PIEZOELECTRIC MICROSPEAKER AND METHOD OF FABRICATING THE SAME 有权
标题翻译：压电微型振荡器及其制造方法
公开(公告)号：US20100074459A1
公开(公告)日：2010-03-25
申请号：US12430652
申请日：2009-04-27
申请人： Seok-whan CHUNG , Dong-kyun KIM , Byung-gil JEONG
发明人： Seok-whan CHUNG , Dong-kyun KIM , Byung-gil JEONG
IPC分类号： H04R17/00 , B44C1/22
CPC分类号： H04R17/00 , H04R2201/003
摘要： Provided are a piezoelectric microspeaker and a method of fabricating the same. In the piezoelectric microspeaker, a diaphragm includes a first region and a second region. The first region may be formed of a material capable of maximizing an exciting force, and the second region may be formed of a material having less initial stress and a lower Young's modulus than the first region.
摘要翻译：提供一种压电微型扬声器及其制造方法。在压电微型扬声器中，隔膜包括第一区域和第二区域。第一区域可以由能够最大化激励力的材料形成，并且第二区域可以由初始应力较小的材料和比第一区域更低的杨氏模量形成。

6. 发明申请

US20090154734A1 METHOD FOR FABRICATING MICRO SPEAKER AND MICRO SPEAKER FABRICATED BY THE SAME 有权
标题翻译：用于制造微波扬声器和由其组成的微型扬声器的方法
公开(公告)号：US20090154734A1
公开(公告)日：2009-06-18
申请号：US12186677
申请日：2008-08-06
申请人： Byung-gil JEONG , Hyung-jae SHIN , Seok-whan CHUNG , Dong-kyun KIM
发明人： Byung-gil JEONG , Hyung-jae SHIN , Seok-whan CHUNG , Dong-kyun KIM
IPC分类号： H01L21/50 , H04R17/00
CPC分类号： H04R19/005 , H01L2224/11 , H04R31/006 , H04R2201/003
摘要： A method for fabricating a micro speaker is provided, including forming a package wafer and a device wafer by batch processing, bonding the package wafer and the device wafer to each other, and forming a diaphragm by isotropic-etching a back surface of the device wafer using a xenon difluoride (XeF2). As a result, a micro-electronic-mechanic system (MEMS) technology-based piezoelectric micro speaker having a wide frequency response range is realized, by batch processing, thereby providing simplified structure and processing and reducing fabricating cost.
摘要翻译：提供了一种制造微型扬声器的方法，包括通过间歇处理形成封装晶片和器件晶片，将封装晶片和器件晶片彼此接合，并通过各向同性蚀刻器件晶片的背面形成隔膜使用氙二氟化物（XeF2）。结果，通过批量处理实现了具有宽频率响应范围的微电子机械系统（MEMS）技术的压电微型扬声器，从而提供简化的结构和处理并降低制造成本。

7. 发明授权

US07456434B2 Micro optical bench structure 有权
标题翻译：微型光学台架结构
公开(公告)号：US07456434B2
公开(公告)日：2008-11-25
申请号：US11033720
申请日：2005-01-13
申请人： Yong-sung Kim , Seok-whan Chung , Jao-ho You , Hyung Choi , Woong-lin Hwang
发明人： Yong-sung Kim , Seok-whan Chung , Jao-ho You , Hyung Choi , Woong-lin Hwang
IPC分类号： H01L27/15
CPC分类号： G11B7/1362 , G11B7/123 , G11B7/22 , H01L2224/81 , H01S5/02248 , H01S5/02292
摘要： A micro optical bench structure and a method of manufacturing a micro optical bench structure are provided. The micro optical bench structure includes: a lower substrate; an upper substrate which is bonded to the lower substrate, and has a through-hole for exposing the lower substrate; and a first optical device which is installed at the lower substrate, and units relating to the first optical device.
摘要翻译：提供微型光学台架结构和制造微型光学台架结构的方法。微型光学台架结构包括：下基板; 上基板，其结合到下基板，并具有用于使下基板曝光的通孔; 以及安装在下基板上的第一光学装置和与第一光学装置相关的单元。

8. 发明申请

US20080100898A1 ELECTROMAGNETIC MICRO-ACTUATOR 审中-公开
标题翻译：电磁致动器
公开(公告)号：US20080100898A1
公开(公告)日：2008-05-01
申请号：US11742022
申请日：2007-04-30
申请人： Seok-jin KANG , Hyun-ku JEONG , Seok-whan CHUNG
发明人： Seok-jin KANG , Hyun-ku JEONG , Seok-whan CHUNG
IPC分类号： G02B26/08
CPC分类号： H01F17/0006 , G02B26/085 , H01F7/066 , H01F7/14 , H01F2007/068
摘要： An electromagnetic micro-actuator is provided that includes a stage rotatably formed on a surface of a substrate; first and second torsion springs respectively connected to opposite sides of the stage in a rotation axis direction; a fixed frame that supports the first and second torsion springs and surrounds the stage; a driving coil wound to a predetermined depth in an upper surface of the stage; a mirror unit formed on a side of the driving coil that is in the stage; and first and second permanent magnets respectively formed on opposite sides of the fixed frame so as to face each other.
摘要翻译：提供了一种电磁微致动器，其包括可旋转地形成在基板的表面上的台架; 第一和第二扭转弹簧沿旋转轴线方向分别连接到舞台的相对侧; 固定框架，其支撑第一和第二扭转弹簧并围绕平台; 驱动线圈，其在所述台的上表面中缠绕到预定深度; 形成在所述驱动线圈的处于所述台的一侧的反射镜单元; 以及分别形成在固定框架的相对侧上以彼此面对的第一和第二永磁体。

9. 发明申请

US20080088221A1 Shadow mask, method of manufacturing the same and method of forming thin film using the same 有权
标题翻译：荫罩，其制造方法以及使用其形成薄膜的方法
公开(公告)号：US20080088221A1
公开(公告)日：2008-04-17
申请号：US11730120
申请日：2007-03-29
申请人： Seok-whan Chung , Seok-jin Kang , Hyun-koo Jeong
发明人： Seok-whan Chung , Seok-jin Kang , Hyun-koo Jeong
IPC分类号： H01J29/80
CPC分类号： B81C1/00396 , B81C2201/0198
摘要： A shadow mask, a method of manufacturing the shadow mask, and a method of forming a thin film using the shadow mask are provided. The shadow mask includes an upper layer and a lower layer. The upper layer includes a first opening. The lower layer is formed on a lower surface of the upper layer around the first opening and includes an opening having the same size as the first opening. When the thin film is formed using the shadow mask, the lower layer of the shadow mask is close to the edge of a cavity of a substrate, and a position on which the thin film may be formed as defined by the lower layer of the shadow mask. Therefore, the thickness of the thin film can be uniform.
摘要翻译：提供荫罩，荫罩的制造方法以及使用荫罩形成薄膜的方法。荫罩包括上层和下层。上层包括第一开口。下层形成在第一开口周围的上层的下表面上，并且包括具有与第一开口相同尺寸的开口。当使用荫罩形成薄膜时，荫罩的下层靠近基板的空腔的边缘，并且可以由薄膜的下层限定薄膜的位置面具。因此，薄膜的厚度可以是均匀的。

10. 发明申请

US20070284964A1 MICRO-ELECTRO MECHANICAL SYSTEM DEVICE AND METHOD OF FORMING COMB ELECTRODES OF THE SAME 审中-公开
标题翻译：微电子机械系统装置及其组合电极的形成方法
公开(公告)号：US20070284964A1
公开(公告)日：2007-12-13
申请号：US11754414
申请日：2007-05-29
申请人： Seok-whan Chung , Seok-jin Kang , Hyung Choi , Hyun-ku Jeong
发明人： Seok-whan Chung , Seok-jin Kang , Hyung Choi , Hyun-ku Jeong
IPC分类号： H01G9/00 , H02N1/00
CPC分类号： G02B26/0841 , B81B3/0086 , B81B2203/0136 , B81C1/00698
摘要： A micro-electro mechanical system (MEMS) device and a method of forming comb electrodes of the MEMS device are provided. The method includes forming a plurality of parallel trenches at regular intervals in one side of a first silicon substrate so as to define alternating first and second regions at different heights on the one side of the first silicon substrate, oxidizing the first silicon substrate in order to form an oxide layer in the first and second regions having different heights, forming a polysilicon layer on the oxide layer to at least fill up the trenches so as to level the oxide layer having different heights, bonding a second silicon substrate directly to a top surface of the polysilicon layer, selectively etching the second silicon substrate and the polysilicon layer using a first mask so as to form upper comb electrodes vertically aligned with the first regions, selectively etching the first silicon substrate using a second mask so as to form lower comb electrodes vertically aligned with the second regions, and removing the oxide layer interposed between the upper comb electrodes and the lower comb electrodes.
摘要翻译：提供了微电子机械系统（MEMS）装置和形成MEMS装置的梳状电极的方法。该方法包括在第一硅衬底的一侧中以规则的间隔形成多个平行的沟槽，以便在第一硅衬底的一侧上限定不同高度的交替的第一和第二区域，氧化第一硅衬底，以便在具有不同高度的第一和第二区域中形成氧化物层，在氧化物层上形成多晶硅层以至少填充沟槽，以使具有不同高度的氧化物层平坦化，将第二硅衬底直接接合到顶表面使用第一掩模选择性地蚀刻第二硅衬底和多晶硅层，以形成与第一区域垂直对准的上梳状电极，使用第二掩模选择性地蚀刻第一硅衬底，从而形成下梳状电极与第二区域垂直对准，以及去除介于上梳状电极和上梳状电极之间的氧化物层下梳电极。

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