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1. 发明申请

US20110254451A1 APPARATUS AND METHOD FOR PREVENTING LAMP DAMAGE IN RAPID HEAT TREATMENT EQUIPMENT 审中-公开
标题翻译：用于防止快速热处理设备中的灯泡损伤的装置和方法
公开(公告)号：US20110254451A1
公开(公告)日：2011-10-20
申请号：US13132394
申请日：2009-11-27
申请人： Sang Hyun Ji , Dae Gyou Jin , Ki Nam Kim
发明人： Sang Hyun Ji , Dae Gyou Jin , Ki Nam Kim
IPC分类号： H05B37/03
CPC分类号： H05B39/02 , H05B37/03
摘要： Disclosed are an apparatus and method for preventing damage to the lamp of rapid heat treatment equipment. The most significant feature of the present invention is to provide an apparatus and method for preventing damage to a lamp in rapid heat treatment equipment, wherein the temperature of a quartz case comprising the lamp is sensed to identify an erratic increase in the temperature thereof so that problems with the lamp may be discovered early to take action. The apparatus and method according to the present invention allows the possibility of preventing damage or contamination of surrounding components due to lamp explosion; decisions regarding lamp replacement are also facilitated so that productivity can be enhanced. In addition, uniform lamp output may be ensured so that product quality is enhanced.
摘要翻译：公开了一种用于防止快速热处理设备的灯损坏的装置和方法。本发明最重要的特征在于提供一种用于防止在快速热处理设备中损坏灯的装置和方法，其中感测包括灯的石英壳的温度以识别其温度的不稳定增加，使得灯的问题可能会提早发现采取行动。根据本发明的装置和方法允许防止由于灯爆炸引起的周围部件的损坏或污染的可能性; 关于灯更换的决定也得到了促进，从而可以提高生产效率。此外，可以确保均匀的灯输出，从而提高产品质量。

2. 发明申请

US20110255847A1 RAPID HEAT TREATMENT APPARATUS THAT ENABLES EXTENDED PYROMETER LIFE 审中-公开
标题翻译：快速热处理设备使用延长生殖器寿命
公开(公告)号：US20110255847A1
公开(公告)日：2011-10-20
申请号：US13132682
申请日：2009-11-27
申请人： Sang Hyun Ji
发明人： Sang Hyun Ji
IPC分类号： F27D11/12
CPC分类号： H01L21/324 , H01L21/67115
摘要： In the rapid heat treatment apparatus according to the present invention, the pyrometer comprises a light receiving rod that is used to receive radiated light emitted from a wafer; a light source that is installed to radiate light onto a wafer through the light receiving load; and a light sensing part that receives radiated light reflected after being radiated from the light source to the wafer and light emitted from the wafer to measure the temperature of the wafer, wherein a transparent protective cap is installed on the light receiving load so that the light receiving load is not contaminated by by-products formed after the wafer is heated. According to the present invention, contamination is prevented by the transparent protective cap so that any difficulty experienced from replacing an expensive light receiving rod is eliminated, and the need for initial setting of the pyrometer is also eliminated, so that process downtime is reduced and process efficiency is enhanced.
摘要翻译：在根据本发明的快速热处理装置中，高温计包括用于接收从晶片发射的辐射光的光接收杆; 光源，其被安装成通过光接收负载将光辐射到晶片上; 以及感光部，其接收从所述光源向所述晶片辐射后的反射光和从所述晶片发射的光，以测量所述晶片的温度，其中，在所述受光负载上安装透明保护盖，使得所述光接收负载不会被晶片加热后形成的副产物污染。根据本发明，通过透明保护盖防止了污染，从而消除了更换昂贵的光接收棒所经历的任何困难，并且也消除了对高温计的初始设定的需要，从而减少了处理停机时间和处理效率提高。

3. 发明申请

US20110255848A1 APPARATUS AND METHOD FOR CONTROLLING HEATING LAMP OF RAPID HEAT TREATMENT EQUIPMENT 审中-公开
标题翻译：用于控制热处理设备加热灯的装置和方法
公开(公告)号：US20110255848A1
公开(公告)日：2011-10-20
申请号：US13132674
申请日：2009-11-27
申请人： Sang Hyun Ji , Dae Yong Lee , Seung Hwan Lee
发明人： Sang Hyun Ji , Dae Yong Lee , Seung Hwan Lee
IPC分类号： F27D11/00
CPC分类号： H05B3/0033
摘要： The method of the present invention for controlling a heating lamp of rapid heat treatment equipment comprises: a step wherein a heating lamp group is divided into a plurality of subgroups to determine graphical data regarding input voltage versus the reference input current that is applied to the subgroups uniformly; a step wherein actual input current respectively applied to each group is measured to obtain graphical data regarding input voltage versus actual input current; a step wherein a difference value for calibration of each subgroup is obtained from the difference between the reference input current and the actual input current; and a step wherein the difference value for calibration is reflected to apply a voltage to said subgroup individually. According to the present invention, substrate heating takes place uniformly because differences of calibration are reflected in actual input current to apply a voltage to a subgroup.
摘要翻译：用于控制快速热处理设备的加热灯的本发明的方法包括：将加热灯组分成多个子组以确定关于施加到子组的参考输入电流的输入电压的图形数据的步骤统一的测量分别施加到每个组的实际输入电流以获得关于输入电压与实际输入电流的图形数据的步骤; 从参考输入电流和实际输入电流之间的差获得每个子组的校准差值的步骤; 以及反映用于校准的差值以将电压单独施加到所述子组的步骤。根据本发明，基板加热均匀地进行，因为校正的差异反映在实际的输入电流中以向亚组施加电压。

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