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1. 发明授权

US09287155B2 Apparatus and method of controlling chuck, and exposure apparatus and control method thereof 有权
公开(公告)号：US09287155B2
公开(公告)日：2016-03-15
申请号：US13535603
申请日：2012-06-28
申请人： Ja Yul Kim , Sang Don Jang , Tae Kyu Son
发明人： Ja Yul Kim , Sang Don Jang , Tae Kyu Son
IPC分类号： H01L21/68 , G03F7/20
CPC分类号： G03F7/707 , G03F7/70775 , H01L21/681 , Y10T29/49998 , Y10T29/53013 , Y10T29/53022 , Y10T29/53052 , Y10T29/53061 , Y10T29/53087 , Y10T29/53091 , Y10T279/21
摘要： Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

2. 发明授权

US08836943B2 Workpiece alignment device 有权
标题翻译：工件对准装置
公开(公告)号：US08836943B2
公开(公告)日：2014-09-16
申请号：US13273549
申请日：2011-10-14
申请人： Sung Min Ahn , Sang Don Jang
发明人： Sung Min Ahn , Sang Don Jang
IPC分类号： G01B11/00 , G01B11/14 , G03F7/20 , G03F9/00 , G01B11/02
CPC分类号： G01B11/002 , G01B11/02 , G03F7/70275 , G03F9/7088
摘要： An example embodiment relates to an alignment device including an optical aligner system including a plurality of aligners configured to measure a position of a workpiece having a plurality of alignment marks, and an optical member. The optical member is configured to diverge alignment beams reflected from neighboring alignment marks of the plurality of alignment marks and transmit the beams to neighboring aligners of the plurality of aligners respectively if a distance between the neighboring aligners is greater than a distance between the neighboring alignment marks.
摘要翻译：示例性实施例涉及一种对准装置，其包括光学对准器系统，该对准器系统包括被配置成测量具有多个对准标记的工件的位置的多个对准器和光学构件。光学构件被配置为使从多个对准标记的相邻对准标记反射的对准光束发散，并且如果相邻对准器之间的距离大于相邻对准标记之间的距离，则将光束分别传送到多个对准器的相邻对准器。

3. 发明授权

US08804098B2 Maskless exposure apparatus having measurement optical unit to measure depths of focus of a plurality of beams and control method thereof 有权
标题翻译：具有测量光学单元以测量多个光束的焦深的无掩模曝光装置及其控制方法
公开(公告)号：US08804098B2
公开(公告)日：2014-08-12
申请号：US12926920
申请日：2010-12-17
申请人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
发明人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03B27/72 , G03F7/70291 , G03F7/70508 , G03F7/7085
摘要： Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.
摘要翻译：示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学单元获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据，及其控制方法。无掩模曝光装置包括：测量光学单元，包括光传感器和图像传感器;以及控制单元，被配置为使用由测量光学单元获取的信息来生成和/或校正曝光数据。

4. 发明申请

US20130001898A1 APPARATUS AND METHOD OF CONTROLLING CHUCK, AND EXPOSURE APPARATUS AND CONTROL METHOD THEREOF 有权
标题翻译：控制卡盘的装置和方法，以及曝光装置及其控制方法
公开(公告)号：US20130001898A1
公开(公告)日：2013-01-03
申请号：US13535603
申请日：2012-06-28
申请人： Ja Yul KIM , Sang Don JANG , Tae Kyu SON
发明人： Ja Yul KIM , Sang Don JANG , Tae Kyu SON
IPC分类号： B23B31/02 , B23Q7/00
CPC分类号： G03F7/707 , G03F7/70775 , H01L21/681 , Y10T29/49998 , Y10T29/53013 , Y10T29/53022 , Y10T29/53052 , Y10T29/53061 , Y10T29/53087 , Y10T29/53091 , Y10T279/21
摘要： Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.
摘要翻译：本发明的示例性实施例公开了一种调整卡盘参数的曝光装置和方法，其可以通过预先调谐卡盘的参数来减少卡盘水准所需的时间。调整卡盘的参数的方法包括检测卡盘的倾斜分量，执行卡盘倾斜调整以最小化卡盘的倾斜分量，以及如果在执行卡盘倾斜调整之后存在剩余倾斜分量，则调整卡盘的参数。

5. 发明申请

US20120081682A1 MASKLESS EXPOSURE APPARATUS AND METHOD TO DETERMINE EXPOSURE START POSITION AND ORIENTATION IN MASKLESS LITHOGRAPHY 有权
标题翻译： MASKEESS曝光装置和方法确定接触开始位置和方向在MASKLESS LITHOGRAPHY
公开(公告)号：US20120081682A1
公开(公告)日：2012-04-05
申请号：US13185863
申请日：2011-07-19
申请人： Sung Min AHN , Sang Don JANG , Tae Kyu SON
发明人： Sung Min AHN , Sang Don JANG , Tae Kyu SON
IPC分类号： G03B27/54
CPC分类号： G03F7/70633 , G03B27/521 , G03B27/53 , G03F7/70291 , G03F9/70 , G03F9/7011 , G03F9/7015
摘要： According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark of a second set of alignment marks of a second pattern layer is exposed on the substrate using maskless lithography. A position of the at least one alignment mark of the first set of alignment marks and a position of the at least one alignment mark of the second set of alignment marks on the substrate is measured. A relative orientation difference between a desired exposure start orientation and an obtained exposure start orientation is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks. A relative position difference between a desired exposure start position and an obtained start position is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks. An exposure start position and orientation compensated using the relative position difference and the relative orientation difference is determined.
摘要翻译：根据示例性实施例，确定曝光开始位置和取向的方法包括将基板装载在移动台上。衬底包括构图在其上的第一图案层的第一组对准标记的至少一个对准标记。使用无掩模光刻在第二图案层的第二组对准标记的至少一个对准标记曝光在基板上。测量第一组对准标记的至少一个对准标记的位置和第二组对准标记的至少一个对准标记在基板上的位置。使用第一组对准标记的至少一个对准标记的测量位置和第二组对准标记的至少一个对准标记来获取期望的曝光开始方位和所获得的曝光开始方向之间的相对取向差。使用第一组对准标记的至少一个对准标记的测量位置和第二组对准标记的至少一个对准标记来获取期望的曝光开始位置与获得的开始位置之间的相对位置差。确定使用相对位置差和相对方位差补偿的曝光开始位置和取向。

6. 发明申请

US20120038936A1 Measurement System Using Alignment Unit And Position Measuring Method 审中-公开
标题翻译：使用对位单元和位置测量方法的测量系统
公开(公告)号：US20120038936A1
公开(公告)日：2012-02-16
申请号：US13185047
申请日：2011-07-18
申请人： Sung Min Ahn , Sang Don Jang , Tae Kyu Son
发明人： Sung Min Ahn , Sang Don Jang , Tae Kyu Son
IPC分类号： G01B11/14
CPC分类号： G03F9/7011 , G03F7/70791 , G03F9/7088
摘要： In one example embodiment, position of the alignment unit is acquired using a fiducial mark formed on a moving table, and the moving table is moved such that an alignment mark formed on the workpiece is located within a field of view of the alignment unit to measure the position of the alignment mark. Subsequently, the position and posture of the workpiece are accurately measured based on the position of the alignment unit and the position of the alignment mark measured by the alignment unit.
摘要翻译：在一个示例性实施例中，使用形成在移动台上的基准标记来获取对准单元的位置，移动台移动，使得形成在工件上的对准标记位于对准单元的视场内以测量对齐标记的位置。随后，基于对准单元的位置和由对准单元测量的对准标记的位置，精确地测量工件的位置和姿态。

7. 发明申请

US20120038899A1 EXPOSURE APPARATUS AND ALIGNMENT ERROR COMPENSATION METHOD USING THE SAME 审中-公开
标题翻译：曝光装置和对准误差补偿方法
公开(公告)号：US20120038899A1
公开(公告)日：2012-02-16
申请号：US13184963
申请日：2011-07-18
申请人： Sung Min Ahn , Sang Don Jang , Seung Won Yang
发明人： Sung Min Ahn , Sang Don Jang , Seung Won Yang
IPC分类号： G03B27/58 , G01B11/00
CPC分类号： G01B11/00 , G01B11/03 , G01B11/27 , G03F9/70
摘要： In one embodiment, a center of rotation and a slippage amount are estimated when slippage occurs due to radial runout during planar rotation θ to align the mask and the substrate. The slippage amount is estimated after rotation is reflected in a movement command value of a stage as a compensation value, and a moving table, on which the substrate is placed, is moved to compensate the slippage amount, thereby improving overlay performance.
摘要翻译：在一个实施例中，当在平面旋转期间由于径向跳动而发生滑动时估计旋转中心和滑动量; 以对准掩模和基底。在将旋转反映在作为补偿值的载物台的移动指令值之后，并且移动放置基板的移动台来补偿滑动量，从而提高叠加性能，估计滑移量。

8. 发明申请

US20120019793A1 EXPOSURE APPARATUS INCLUDING THE EXPOSURE HEAD AND CONTROL METHOD THEREOF 有权
标题翻译：曝光装置，包括曝光头及其控制方法
公开(公告)号：US20120019793A1
公开(公告)日：2012-01-26
申请号：US13185983
申请日：2011-07-19
申请人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
发明人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275
摘要： According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.
摘要翻译：根据示例性实施例，一种操作包括具有多个光束测量装置的平台的曝光装置的方法和具有第一组曝光头和第二组曝光头的曝光头单元包括测量第一曝光的位置通过移动舞台使第一组曝光头的头部与多个光束测量装置的第一光束测量装置与第一曝光头重合，将第一曝光头的测量位置设置为基准位置，并且测量位置相对于参考位置的第二组曝光头。

9. 发明申请

US20110157569A1 Maskless exposure apparatus and control method thereof 有权
标题翻译：无掩模曝光装置及其控制方法
公开(公告)号：US20110157569A1
公开(公告)日：2011-06-30
申请号：US12926920
申请日：2010-12-17
申请人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
发明人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03B27/72 , G03F7/70291 , G03F7/70508 , G03F7/7085
摘要： Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.
摘要翻译：示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学系统获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据，及其控制方法。无掩模曝光装置包括测量光学系统，包括光传感器和图像传感器，以及控制单元，其被配置为使用由测量光学系统获取的信息来生成和/或校正曝光数据。

10. 发明授权

US08994922B2 Lens barrel support device and maskless exposure apparatus having the same 有权
标题翻译：镜筒支撑装置和具有该镜筒支持装置的无掩模曝光装置
公开(公告)号：US08994922B2
公开(公告)日：2015-03-31
申请号：US12923939
申请日：2010-10-15
申请人： Sang Hyun Park , Sang Joon Hong , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
发明人： Sang Hyun Park , Sang Joon Hong , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
IPC分类号： G02B7/02 , G03F7/20 , G03B27/54
CPC分类号： G02B7/023 , G03B27/54 , G03F7/70275 , G03F7/70833
摘要： Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.
摘要翻译：提供了一种用于支撑镜筒的镜筒支撑装置。枪管支撑装置可以包括引导框架，其构造成横向地支撑透镜镜筒并且与镜筒倾斜;在引导框架的第一端上的旋转引导件，旋转引导件是环形的并且被配置为将镜筒附接到引导件框架和环形倾斜框架，其构造成支撑引导框架的第二端并倾斜引导框架，其中引导框架，旋转引导件和倾斜框架被配置为允许镜筒通过。

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