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    • 3. 发明授权
    • Method and device for managing authorization of right object in digital rights managment
    • 在数字版权管理中管理权利对象授权的方法和装置
    • US09135408B2
    • 2015-09-15
    • US12372825
    • 2009-02-18
    • Youn-Sung ChuSeung-Jae Lee
    • Youn-Sung ChuSeung-Jae Lee
    • G06F21/00G06F15/16G06F21/10
    • G06F21/10
    • Provided is a method for managing an authorization of digital rights, the method performed by a first server and comprising: receiving from a second server a drop domain authorization trigger message for an initiation of an authorization protocol to cease creating a domain rights object (RO) for a domain for which the first server has an authorization to create the domain RO, the trigger message including information on the domain; the domain being managed by the second server and the authorization being obtained by the first server from the second server checking status of the authorization; transmitting to the second server, a drop domain authorization request message including the ID of the domain; and receiving from the second server, a drop domain authorization response message including a status element indicating a result of processing of the request message based on content included in the request message.
    • 提供了一种用于管理数字权利的授权的方法,所述方法由第一服务器执行,并且包括:从第二服务器接收用于启动授权协议以停止创建域权限对象(RO)的丢弃域授权触发消息, 对于第一服务器具有创建域RO的授权的域,触发消息包括关于域的信息; 所述域由所述第二服务器管理,并且所述授权由所述第一服务器从所述第二服务器获取所述授权的检查状态; 向所述第二服务器发送包括所述域的ID的丢弃域授权请求消息; 以及从所述第二服务器接收包括根据所述请求消息中包含的内容指示所述请求消息的处理结果的状态元素的丢弃域授权响应消息。
    • 7. 发明授权
    • Methods of forming gates of semiconductor devices
    • 形成半导体器件栅极的方法
    • US08735250B2
    • 2014-05-27
    • US13241957
    • 2011-09-23
    • Jong-Won LeeBo-Un YoonSeung-Jae Lee
    • Jong-Won LeeBo-Un YoonSeung-Jae Lee
    • H01L21/8234
    • H01L21/28008H01L21/28105H01L21/823842H01L29/42376H01L29/49H01L29/513H01L29/66545
    • Methods of forming gates of semiconductor devices are provided. The methods may include forming a first recess in a first substrate region having a first conductivity type and forming a second recess in a second substrate region having a second conductivity type. The methods may also include forming a high-k layer in the first and second recesses. The methods may further include providing a first metal on the high-k layer in the first and second substrate regions, the first metal being provided within the second recess. The methods may additionally include removing at least portions of the first metal from the second recess while protecting materials within the first recess from removal. The methods may also include, after removing at least portions of the first metal from the second recess, providing a second metal within the second recess.
    • 提供了形成半导体器件的栅极的方法。 所述方法可以包括在具有第一导电类型的第一衬底区域中形成第一凹槽,并在具有第二导电类型的第二衬底区域中形成第二凹部。 所述方法还可以包括在第一和第二凹部中形成高k层。 所述方法还可以包括在第一和第二衬底区域中的高k层上提供第一金属,第一金属设置在第二凹槽内。 所述方法还可以包括从第二凹部移除第一金属的至少一部分,同时保护第一凹槽内的材料不被去除。 所述方法还可以包括在从第二凹部去除第一金属的至少一部分之后,在第二凹部内提供第二金属。