专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09275884B2 Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers 有权
标题翻译：用于抑制衬底处理器真空室中的氧化物生长的系统和方法
公开(公告)号：US09275884B2
公开(公告)日：2016-03-01
申请号：US13419625
申请日：2012-03-14
申请人： Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
发明人： Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
IPC分类号： H01L21/677 , C23C14/56
CPC分类号： H01L21/67742 , C23C14/564 , C23C14/568
摘要： A substrate handling robot includes an arm section and a wrist portion connected to the arm section. An end effector is connected to the wrist portion and is configured to support a substrate. A housing is arranged adjacent to the end effector and includes a gas outlet that directs gas onto an exposed surface of the substrate during transport.
摘要翻译：基板处理机器人包括臂部和连接到臂部的腕部。端部执行器连接到腕部并被构造成支撑衬底。壳体布置成与端部执行器相邻，并且包括在运输期间将气体引导到衬底的暴露表面上的气体出口。

2. 发明申请

US20130005140A1 SYSTEMS AND METHODS FOR CONTROLLING ETCH SELECTIVITY OF VARIOUS MATERIALS 有权
标题翻译：用于控制各种材料的选择性的系统和方法
公开(公告)号：US20130005140A1
公开(公告)日：2013-01-03
申请号：US13536095
申请日：2012-06-28
申请人： Esther Jeng , Anand Chandrashekar , Raashina Humayun , Michal Danek , Ronald Powell
发明人： Esther Jeng , Anand Chandrashekar , Raashina Humayun , Michal Danek , Ronald Powell
IPC分类号： H01L21/768 , H01L21/306
CPC分类号： H01L21/76877 , C23C16/045 , H01L21/28556 , H01L21/32136 , H01L21/76865 , H01L21/76879
摘要： A method for filling a recessed feature of a substrate includes a) at least partially filling a recessed feature of a substrate with tungsten-containing film using at least one of chemical vapor deposition (CVD) and atomic layer deposition (ALD); b) at a predetermined temperature, using an etchant including activated fluorine species to selectively etch the tungsten-containing film more than an underlying material of the recessed feature without removing all of the tungsten-containing film at a bottom of the recessed feature; and c) filling the recessed feature using at least one of CVD and ALD.
摘要翻译：用于填充衬底的凹陷特征的方法包括：a）使用化学气相沉积（CVD）和原子层沉积（ALD）中的至少一种至少部分地用含钨膜填充衬底的凹陷特征; b）在预定温度下，使用包括活性氟物质的蚀刻剂来选择性地蚀刻含钨膜比凹陷特征的下层材料，而不去除凹陷特征底部的所有含钨膜; 以及c）使用CVD和ALD中的至少一种填充所述凹陷特征。

3. 发明申请

US20050205259A1 Controlling chlorite or hypochlorite break rate of well treatment fluids using magnesium or calcium ions 有权
标题翻译：使用镁离子或钙离子控制井处理液的亚氯酸盐或次氯酸盐破裂率
公开(公告)号：US20050205259A1
公开(公告)日：2005-09-22
申请号：US10681976
申请日：2004-03-22
申请人： Ronald Powell , Robert Hauge
发明人： Ronald Powell , Robert Hauge
IPC分类号： C09K8/66 , C09K8/68 , C09K8/70 , C09K8/90 , E21B43/25 , E21B43/26
CPC分类号： C09K8/90 , C09K8/665 , C09K8/685 , C09K8/706
摘要： The present invention provides methods and compositions for treating a subterranean formation penetrated by a well. The method comprising the steps of: (a) forming a treatment fluid, and (b) introducing the treatment fluid into the well and into contact with the formation. According to one aspect, the treatment fluid comprises: (1) water; (2) a water-soluble polysaccharide capable of increasing the viscosity of the water and present in a sufficient concentration to increase the viscosity of the water or a water-soluble polysaccharide and a crosslinking agent for the water-soluble polysaccharide, which are present in a sufficient concentration to effect crosslinking of the of the polysaccharide and increase the viscosity of the water; (3) a breaker comprising at least one member selected from the group consisting of a source of chlorite ions and a source of hypochlorite ions, wherein the breaker is present in a sufficient concentration to break the treatment fluid after introduction of the fluid into the subterranean formation; and (4) a breaker moderator comprising at least one member selected from the group consisting of a source of magnesium ions and a source of calcium ions, wherein the breaker moderator is present in a sufficient concentration to control the break rate of the fluid.
摘要翻译：本发明提供了用于处理由井渗透的地层的方法和组合物。该方法包括以下步骤：（a）形成处理流体，和（b）将处理流体引入井并与地层接触。根据一个方面，处理流体包括：（1）水; （2）能够增加水的粘度并以足够的浓度存在以增加水或水溶性多糖和用于水溶性多糖的交联剂的粘度的水溶性多糖，其存在于足够的浓度来实现多糖的交联并增加水的粘度; （3）包含至少一种选自亚氯酸根离子源和次氯酸根离子的成员的破碎机，其中所述破碎剂以足够的浓度存在，以将流体引入地下之后破坏处理流体形成; 和（4）包含选自镁离子源和钙离子源中的至少一种的断路器调节剂，其中所述断路器缓和剂以足够的浓度存在以控制流体的断裂速率。

4. 发明申请

US20050056423A1 Methods of removing filter cake from well producing zones 失效
标题翻译：从生产区除去滤饼的方法
公开(公告)号：US20050056423A1
公开(公告)日：2005-03-17
申请号：US10661173
申请日：2003-09-11
申请人： Bradey Todd , Ronald Powell
发明人： Bradey Todd , Ronald Powell
IPC分类号： C09K8/52 , E21B37/06 , E21B43/04 , E21B37/00
CPC分类号： C09K8/52 , E21B37/06 , E21B43/04 , Y10S507/927
摘要： Methods are provided for removing filter cake containing a bridging agent soluble in a carboxylic acid salt from a formation fluids producing zone penetrated by a well bore. The methods basically comprise the steps of introducing in an aqueous carrier liquid a carboxylic acid ester and a base for slowly catalyzing the hydrolysis of the ester and forming a carboxylic acid salt therewith into the producing zone, and allowing the base to catalyze the hydrolysis of the carboxylic acid ester to form the carboxylic acid salt so that the carboxylic acid salt dissolves the bridging agent and the filter cake is removed.
摘要翻译：提供了用于从通过井眼渗透的地层流体产生区中除去含有可溶于羧酸盐的桥连剂的滤饼的方法。所述方法基本上包括以下步骤：在水性载体液体中引入羧酸酯和碱，用于缓慢催化酯的水解并与其形成羧酸盐，并产生羧酸盐，并使碱催化水解羧酸酯以形成羧酸盐，使得羧酸盐溶解桥连剂并除去滤饼。

5. 发明申请

US20120245061A1 ENHANCING DRAG REDUCTION PROPERTIES OF SLICK WATER SYSTEMS 有权
标题翻译：提高滑水系统的降低性能
公开(公告)号：US20120245061A1
公开(公告)日：2012-09-27
申请号：US13052947
申请日：2011-03-21
申请人： Sarkis R. Kakadjian , Frank Zamora , Ronald Powell , Erin Fitzgerald
发明人： Sarkis R. Kakadjian , Frank Zamora , Ronald Powell , Erin Fitzgerald
IPC分类号： C09K8/62
CPC分类号： C09K8/62 , C09K8/68 , C09K8/70 , C09K2208/28
摘要： Novel slick water fracturing fluid compositions are disclosed, where the compositions including with slick water fracturing compositions including a partially hydrolyzed polyacrylamide polymer system within invert emulsion and an effective amount of a friction reducer booster system, where the effective amount is sufficient to reduce a drag friction of the composition by an additional amount of at least 5% in the first 30 seconds of evaluation in high salinity and low temperature environments.
摘要翻译：公开了新型光滑水压裂液组合物，其中组合物包括具有光滑水压裂组合物的组合物，其包括反相乳液中的部分水解的聚丙烯酰胺聚合物体系和有效量的摩擦减小剂增压系统，其中有效量足以减少阻力摩擦的组合物在高盐度和低温环境下的前30秒评估中额外添加量至少5％。

6. 发明申请

US20070042602A1 Etch method using supercritical fluids 审中-公开
标题翻译：使用超临界流体的蚀刻方法
公开(公告)号：US20070042602A1
公开(公告)日：2007-02-22
申请号：US11337779
申请日：2006-01-23
申请人： James Watkins , Patrick Cleemput , Ronald Powell
发明人： James Watkins , Patrick Cleemput , Ronald Powell
IPC分类号： B44C1/22 , H01L21/302
CPC分类号： C23G5/032 , C23F1/16 , C23F1/18 , C23F1/44 , C23G5/06
摘要： Methods are described for removing a material from a substrate by dissolving an etchant into a solvent to form a solution; and exposing the substrate to the solution so that the etchant in the solution removes material from the substrate; wherein during the exposure the solution is maintained in a supercritical or near-supercritical phase. The described methods can include additional steps, such as exposing a precursor of the material to a reagent to form the material, and depositing a second material onto the substrate after removing the material from the substrate.
摘要翻译：描述了通过将蚀刻剂溶解到溶剂中以形成溶液来从基底去除材料的方法; 并将基底暴露于溶液中，使得溶液中的蚀刻剂从基材中去除材料; 其中在曝光期间将溶液保持在超临界或近临界阶段。所描述的方法可以包括额外的步骤，例如将材料的前体暴露于试剂以形成材料，以及在从衬底去除材料之后将第二材料沉积到衬底上。

7. 发明申请

US20060185846A1 Methods for forming a permeable and stable mass in a subterranean formation 有权
标题翻译：在地层中形成可渗透和稳定的物质的方法
公开(公告)号：US20060185846A1
公开(公告)日：2006-08-24
申请号：US11061348
申请日：2005-02-21
申请人： Ronald Powell , Alexander Bismarck , Angelika Menner
发明人： Ronald Powell , Alexander Bismarck , Angelika Menner
IPC分类号： E21B43/04 , E21B33/138
CPC分类号： C09K8/502 , C09K8/52
摘要： This invention relates to subterranean treatment operations. More particularly, this invention provides methods that may be useful in providing void-free barriers between a subterranean formation and a portion of a well bore. A nonlimiting example of a method is a method of degrading a filter cake in a subterranean formation. Another nonlimiting example of a method is a method of producing hydrocarbons from a subterranean formation.
摘要翻译：本发明涉及地下处理操作。更具体地，本发明提供了可用于在地下地层和井眼的一部分之间提供无空隙屏障的方法。方法的非限制性实例是降解地层中滤饼的方法。方法的另一个非限制性实例是从地下地层生产烃的方法。

8. 发明授权

US08883637B2 Systems and methods for controlling etch selectivity of various materials 有权
标题翻译：用于控制各种材料的蚀刻选择性的系统和方法
公开(公告)号：US08883637B2
公开(公告)日：2014-11-11
申请号：US13536095
申请日：2012-06-28
申请人： Esther Jeng , Anand Chandrashekar , Raashina Humayun , Michal Danek , Ronald Powell
发明人： Esther Jeng , Anand Chandrashekar , Raashina Humayun , Michal Danek , Ronald Powell
IPC分类号： H01L21/44 , H01L21/4763 , H01L21/768 , C23C16/04 , H01L21/3213 , H01L21/285
CPC分类号： H01L21/76877 , C23C16/045 , H01L21/28556 , H01L21/32136 , H01L21/76865 , H01L21/76879
摘要： A method for filling a recessed feature of a substrate includes a) at least partially filling a recessed feature of a substrate with tungsten-containing film using at least one of chemical vapor deposition (CVD) and atomic layer deposition (ALD); b) at a predetermined temperature, using an etchant including activated fluorine species to selectively etch the tungsten-containing film more than an underlying material of the recessed feature without removing all of the tungsten-containing film at a bottom of the recessed feature; and c) filling the recessed feature using at least one of CVD and ALD.
摘要翻译：用于填充衬底的凹陷特征的方法包括：a）使用化学气相沉积（CVD）和原子层沉积（ALD）中的至少一种至少部分地用含钨膜填充衬底的凹陷特征; b）在预定温度下，使用包括活性氟物质的蚀刻剂来选择性地蚀刻含钨膜比凹陷特征的下层材料，而不去除凹陷特征底部的所有含钨膜; 以及c）使用CVD和ALD中的至少一种填充所述凹陷特征。

9. 发明授权

US08841240B2 Enhancing drag reduction properties of slick water systems 有权
标题翻译：提高滑水系统的减阻性能
公开(公告)号：US08841240B2
公开(公告)日：2014-09-23
申请号：US13052947
申请日：2011-03-21
申请人： Sarkis R. Kakadjian , Frank Zamora , Ronald Powell , Erin Fitzgerald
发明人： Sarkis R. Kakadjian , Frank Zamora , Ronald Powell , Erin Fitzgerald
IPC分类号： C09K8/62 , C09K8/70 , C09K8/68
CPC分类号： C09K8/62 , C09K8/68 , C09K8/70 , C09K2208/28
摘要： Novel slick water fracturing fluid compositions are disclosed, where the compositions including with slick water fracturing compositions including a partially hydrolyzed polyacrylamide polymer system within invert emulsion and an effective amount of a friction reducer booster system, where the effective amount is sufficient to reduce a drag friction of the composition by an additional amount of at least 5% in the first 30 seconds of evaluation in high salinity and low temperature environments.
摘要翻译：公开了新型光滑水压裂液组合物，其中组合物包括具有光滑水压裂组合物的组合物，其包括反相乳液中的部分水解的聚丙烯酰胺聚合物体系和有效量的摩擦减小剂增压系统，其中有效量足以减少阻力摩擦的组合物在高盐度和低温环境下的前30秒评估中额外添加量至少5％。

10. 发明申请

US20120251271A1 SYSTEMS AND METHODS FOR INHIBITING OXIDE GROWTH IN SUBSTRATE HANDLER VACUUM CHAMBERS 有权
标题翻译：用于抑制基底处理器真空室中氧化物生长的系统和方法
公开(公告)号：US20120251271A1
公开(公告)日：2012-10-04
申请号：US13419625
申请日：2012-03-14
申请人： Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
发明人： Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
IPC分类号： B65G47/90
CPC分类号： H01L21/67742 , C23C14/564 , C23C14/568
摘要： A substrate handling robot includes an arm section and a wrist portion connected to the arm section. An end effector is connected to the wrist portion and is configured to support a substrate. A housing is arranged adjacent to the end effector and includes a gas outlet that directs gas onto an exposed surface of the substrate during transport.
摘要翻译：基板处理机器人包括臂部和连接到臂部的腕部。端部执行器连接到腕部并被构造成支撑衬底。壳体布置成与端部执行器相邻，并且包括在运输期间将气体引导到衬底的暴露表面上的气体出口。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式