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1. 发明授权

US08120861B2 Patterned polarization-sensitive optical elements and devices using the same 有权
标题翻译：图案偏振敏感光学元件和使用其的器件
公开(公告)号：US08120861B2
公开(公告)日：2012-02-21
申请号：US12563597
申请日：2009-09-21
申请人： Martin Moskovits , Qihong Wu , Robert Koefer , Xu Zhang , Linh Nguyen , Thomas Tombler
发明人： Martin Moskovits , Qihong Wu , Robert Koefer , Xu Zhang , Linh Nguyen , Thomas Tombler
IPC分类号： G02B7/02
CPC分类号： G02B5/3058 , G02B23/10 , G02B27/28
摘要： In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.
摘要翻译：通常，在一个方面，本发明的特征在于一种装置，其包括布置成形成物体的图像的多个光学元件。这些元件包括包括偏振材料的一个或多个区域的第一元件，该区域被定形为一个或多个视觉特征，偏振器和包括用于第一元件的第一安装件和用于偏振器的第二安装件的安装组件。至少第一或第二安装件可相对于第一取向和第二定向之间的光轴旋转。在第一方向上，视觉特征在对象的图像中是可见的，并且在第二方向中，视觉特征在对象的图像中是不可见的。

2. 发明授权

US08617799B2 Post arrays and methods of making the same 失效
标题翻译：发布数组和制作相同的方法
公开(公告)号：US08617799B2
公开(公告)日：2013-12-31
申请号：US12563683
申请日：2009-09-21
申请人： Robert Koefer , Sheng Liu , Thomas Tombler
发明人： Robert Koefer , Sheng Liu , Thomas Tombler
IPC分类号： G02B3/00 , G03F7/20
CPC分类号： G03F7/40 , G02B3/0018 , G03F7/0005
摘要： In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.
摘要翻译：通常，在一个方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，掩模特征具有包括凹陷诱导掩模特征的掩模材料的质量传递以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。通常，在另一方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，引起掩模材料的质量传递掩模特征以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。第一层由无定形材料构成，第一结构是具有约60度至约80度范围内的基底侧壁角度的柱。

3. 发明申请

US20100075262A1 POST ARRAYS AND METHODS OF MAKING THE SAME 失效
标题翻译：后阵列及其制作方法
公开(公告)号：US20100075262A1
公开(公告)日：2010-03-25
申请号：US12563683
申请日：2009-09-21
申请人： Robert Koefer , Sheng Liu , Thomas Tombler
发明人： Robert Koefer , Sheng Liu , Thomas Tombler
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , G02B3/0018 , G03F7/0005
摘要： In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.
摘要翻译：通常，在一个方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，掩模特征具有包括凹陷诱导掩模特征的掩模材料的质量传递以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。通常，在另一方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，引起掩模材料的质量传递掩模特征以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。第一层由无定形材料构成，第一结构是具有约60度至约80度范围内的基底侧壁角度的柱。

4. 发明申请

US20100291489A1 EXPOSURE METHODS FOR FORMING PATTERNED LAYERS AND APPARATUS FOR PERFORMING THE SAME 审中-公开
标题翻译：用于形成图案的曝光方法和用于实施其的装置
公开(公告)号：US20100291489A1
公开(公告)日：2010-11-18
申请号：US12466853
申请日：2009-05-15
申请人： Martin Moskovits , Linh Nguyen , Robert Koefer , Qihong Wu , Xu Zhang , Shiaw-Wen Tai
发明人： Martin Moskovits , Linh Nguyen , Robert Koefer , Qihong Wu , Xu Zhang , Shiaw-Wen Tai
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , G02B5/04 , G02B5/1857 , G03F7/70341 , G03F7/70408
摘要： Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at λ through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
摘要翻译：方法包括提供包括衬底，由衬底支撑的第一层以及衬底和第一层之间的界面的制品。衬底对于波长λ的辐射基本上是透明的，第一层由光致抗蚀剂形成。这些方法包括通过将λ射线通过衬底引导辐射第一层到辐射，以撞击界面，使得辐射在界面处经受全内反射。

5. 发明申请

US20100073756A1 PATTERNED POLARIZATION-SENSITIVE OPTICAL ELEMENTS AND DEVICES USING THE SAME 有权
标题翻译：图案极化的敏感光学元件和使用它的设备
公开(公告)号：US20100073756A1
公开(公告)日：2010-03-25
申请号：US12563597
申请日：2009-09-21
申请人： Martin Moskovits , Qihong Wu , Robert Koefer , Xu Zhang , Linh Nguyen , Thomas Tombler
发明人： Martin Moskovits , Qihong Wu , Robert Koefer , Xu Zhang , Linh Nguyen , Thomas Tombler
IPC分类号： G02B26/00
CPC分类号： G02B5/3058 , G02B23/10 , G02B27/28
摘要： In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.
摘要翻译：通常，在一个方面，本发明的特征在于一种装置，其包括布置成形成物体的图像的多个光学元件。这些元件包括包括偏振材料的一个或多个区域的第一元件，该区域被定形为一个或多个视觉特征，偏振器和包括用于第一元件的第一安装件和用于偏振器的第二安装件的安装组件。至少第一或第二安装件可相对于第一取向和第二定向之间的光轴旋转。在第一方向上，视觉特征在对象的图像中是可见的，并且在第二方向中，视觉特征在对象的图像中是不可见的。

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