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    • 2. 发明申请
    • ADJUSTABLE NOSE WIDTH BICYLE SEAT ASSEMBLY
    • 可调节宽度的座椅座椅组件
    • US20130292977A1
    • 2013-11-07
    • US13938044
    • 2013-07-09
    • Jess BailiePo Liao
    • Jess BailiePo Liao
    • B62J1/10
    • B62J1/10B62J1/002
    • A bicycle seat assembly having an adjustable width nose portion includes an H-shaped base that supports a lateral left side pad and a lateral right side pad. A rail extends under the base and between the left and right side nose portions of the seat assembly. A front rail mount includes a housing, a shuttle, an actuator, and left and right mount supports. Operation of the actuator alters the position of the left and right mount supports relative to the housing and thereby alters a distance between the respective left and right side nose portions of the seat base.
    • 具有可调节宽度鼻部的自行车座椅组件包括支撑横向左侧衬垫和侧面右侧衬垫的H形底座。 轨道在基座下方延伸并且在座椅组件的左侧和右侧鼻部之间延伸。 前导轨安装件包括壳体,梭子,致动器以及左右安装支架。 执行器的操作改变左右安装支架相对于壳体的位置,从而改变座椅底座的相应的左和右侧鼻部之间的距离。
    • 4. 发明授权
    • Adjustable nose width bicyle seat assembly
    • 可调鼻宽双座座组件
    • US09045186B2
    • 2015-06-02
    • US13938044
    • 2013-07-09
    • Jess BailiePo Liao
    • Jess BailiePo Liao
    • B62J1/10B62J1/00
    • B62J1/10B62J1/002
    • A bicycle seat assembly having an adjustable width nose portion includes an H-shaped base that supports a lateral left side pad and a lateral right side pad. A rail extends under the base and between the left and right side nose portions of the seat assembly. A front rail mount includes a housing, a shuttle, an actuator, and left and right mount supports. Operation of the actuator alters the position of the left and right mount supports relative to the housing and thereby alters a distance between the respective left and right side nose portions of the seat base.
    • 具有可调节宽度鼻部的自行车座椅组件包括支撑横向左侧衬垫和侧面右侧衬垫的H形底座。 轨道在基座下方延伸并且在座椅组件的左侧和右侧鼻部之间延伸。 前导轨安装件包括壳体,梭子,致动器以及左右安装支架。 执行器的操作改变左右安装支架相对于壳体的位置,从而改变座椅底座的相应的左和右侧鼻部之间的距离。
    • 5. 发明申请
    • TOOTHBRUSH
    • 牙刷
    • US20140373293A1
    • 2014-12-25
    • US13924276
    • 2013-06-21
    • Jin-Po LIAO
    • Jin-Po LIAO
    • A46B9/04
    • A46B9/04A46B7/06A46B13/08A61C17/32
    • A toothbrush has a handle assembly, a brush-head assembly and a transmitting assembly. The brush-head assembly is slidably mounted in the handle assembly and has a sliding shaft and a swing head. The sliding shaft has two supporting portions mounted on the sliding shaft opposite to the handle assembly. The swing head is mounted on the supporting portions and has a toothed part. The transmitting assembly has a transmitting shaft. The transmitting shaft is rotatably inserted in the sliding shaft and has a longitudinal restriction relative to the sliding shaft. The transmitting shaft has a toothed portion engaging the toothed part. When the transmitting shaft is rotated, the swing head is driven to swing by the toothed part and the toothed portion to provide an improved cleaning effect.
    • 牙刷具有手柄组件,刷头组件和传送组件。 刷头组件可滑动地安装在手柄组件中,并具有滑动轴和摆动头。 滑动轴具有两个支撑部分,其安装在与手柄组件相对的滑动轴上。 摆动头安装在支撑部分上并具有齿形部分。 传动组件具有传动轴。 传动轴可旋转地插入滑动轴中并具有相对于滑动轴的纵向限制。 传动轴具有啮合齿形部分的齿形部分。 当传动轴旋转时,摆动头由齿形部分和齿形部分驱动摆动以提供改进的清洁效果。
    • 6. 发明授权
    • Reading circuit of gyroscope
    • 陀螺仪阅读电路
    • US08857259B2
    • 2014-10-14
    • US13430685
    • 2012-03-26
    • Yu-Wen HsuSheng-Ren ChiuLu-Po LiaoShih-Ting Lin
    • Yu-Wen HsuSheng-Ren ChiuLu-Po LiaoShih-Ting Lin
    • G01C19/56
    • G01C19/5776
    • A reading circuit of a gyroscope is provided. The reading circuit includes a driving unit, a high pass filter, a signal processing unit, and a low pass filter. The driving unit generates a resonance signal for a resonator of the gyroscope and generates a demodulation signal for the signal processing unit. The signal processing unit provides a modulation signal to a Coriolis accelerometer of the gyroscope. An input terminal of the high pass filter receives an output signal of the Coriolis accelerometer. The signal processing unit processes and demodulates an output of the high pass filter according to the demodulation signal and outputs a demodulation result to the low pass filter.
    • 提供陀螺仪的读取电路。 读取电路包括驱动单元,高通滤波器,信号处理单元和低通滤波器。 驱动单元产生用于陀螺仪的谐振器的谐振信号,并产生信号处理单元的解调信号。 信号处理单元向陀螺仪的科里奥利加速度计提供调制信号。 高通滤波器的输入端接收科里奥利加速度计的输出信号。 信号处理单元根据解调信号对高通滤波器的输出进行处理和解调,并向低通滤波器输出解调结果。
    • 7. 发明授权
    • Pneumatic grease applicator
    • 气动油脂涂抹器
    • US07621375B2
    • 2009-11-24
    • US11490186
    • 2006-07-21
    • Lin Po Liao
    • Lin Po Liao
    • F16C1/24
    • F16N11/08F16N2210/14
    • Disclosed is a pneumatic grease applicator includes a receptacle in which a retainer that forms a tubular axle selectively fit into a bearing to which grease is to be applied and a presser that defines a bore fit over the axle are movably received. The presser forms a top cavity in which a nozzle for coupling an external grease source is fixed. Grease is pneumatically supplied through the nozzle into the tubular axle and discharge through radially-extending holes defined in the axle to cover the bearing fit on the axle. An air vent is formed in the presser for pressure balance. Sealing members are provided between side wall of the receptacle and both the retainer and the presser to prevent leakage of grease.
    • 公开了一种气动润滑脂涂抹器,其包括容纳部,其中形成有选择性地装配到要被施加润滑脂的轴承的管状轴的保持器和限定在轴上配合的孔的压脚可移动地被接收。 压脚形成顶部腔体,其中用于联接外部油脂源的喷嘴是固定的。 润滑脂通过喷嘴气动地供应到管状轴中,并通过限定在轴中的径向延伸的孔排出以覆盖轴上的轴承。 在压力机中形成通风口用于压力平衡。 密封构件设置在容器的侧壁和保持器和压紧件之间,以防止润滑脂泄漏。
    • 8. 发明授权
    • Method for repairing plasma damage after spacer formation for integrated circuit devices
    • 集成电路器件间隔件形成后修复等离子体损伤的方法
    • US07132368B2
    • 2006-11-07
    • US10928716
    • 2004-08-26
    • Mingching WangKuang-Yu HuangChi-po LiaoYan-Shi Tian
    • Mingching WangKuang-Yu HuangChi-po LiaoYan-Shi Tian
    • H01L21/311
    • H01L21/31116H01L27/11
    • A method for processing integrated circuit memory devices. The method includes supporting a partially completed substrate, the substrate comprising a plurality of MOS gate structures. Each of the gate structures has substantially vertical regions that define sides of the gate structures. The method forms a conformal dielectric layer overlying the gate structures. The conformal dielectric layer has a predetermined thickness of material that covers each of the gate structures including vertical regions. The method also forms sidewall spacers on the sides of the gate structures from the conformal dielectric layer using an anisotropic etching process and exposes a portion of the substrate region during the formation of the sidewall spacers using the anisotropic etching process to cause physical damage (e.g., plasma damage, cracks) to a portion of the exposed portion of the substrate. The method smoothes exposed portions of the sidewall spacers and exposed portions of the substrate using at least a plasma treatment process including an isotropic etching component to the exposed portion of the substrate and sidewall spacers on the sides of the gate structures whereupon the exposed portion of the sidewall spacers result to a predetermined surface roughness value.
    • 一种用于处理集成电路存储器件的方法。 该方法包括支撑部分完成的衬底,该衬底包括多个MOS栅极结构。 每个栅极结构具有限定栅极结构的侧面的基本上垂直的区域。 该方法形成覆盖栅极结构的共形介电层。 保形介电层具有覆盖包括垂直区域的每个栅极结构的材料的预定厚度。 该方法还使用各向异性蚀刻工艺从共形介电层在栅极结构的侧面上形成侧壁间隔物,并且在使用各向异性蚀刻工艺形成侧壁间隔件期间露出基板区域的一部分以引起物理损伤(例如, 等离子体损伤,裂纹)到衬底的暴露部分的一部分。 该方法使用至少包括各向同性蚀刻部件的等离子体处理工艺来平滑侧壁间隔物的暴露部分和衬底的暴露部分到衬底的暴露部分和栅极结构侧面上的侧壁间隔物,随后暴露部分 侧壁间隔物导致预定的表面粗糙度值。
    • 9. 发明申请
    • Method for repairing plasma damage after spacer formation for integrated circuit devices
    • 集成电路器件间隔件形成后修复等离子体损伤的方法
    • US20050287812A1
    • 2005-12-29
    • US10928716
    • 2004-08-26
    • Mingching WangKuang-Yu HuangChi-po LiaoYan-Shi Tian
    • Mingching WangKuang-Yu HuangChi-po LiaoYan-Shi Tian
    • H01L21/26H01L21/302H01L21/311H01L21/324H01L21/42H01L21/461H01L21/477H01L21/8244
    • H01L21/31116H01L27/11
    • A method for processing integrated circuit memory devices. The method includes supporting a partially completed substrate, the substrate comprising a plurality of MOS gate structures. Each of the gate structures has substantially vertical regions that define sides of the gate structures. The method forms a conformal dielectric layer overlying the gate structures. The conformal dielectric layer has a predetermined thickness of material that covers each of the gate structures including vertical regions. The method also forms sidewall spacers on the sides of the gate structures from the conformal dielectric layer using an anisotropic etching process and exposes a portion of the substrate region during the formation of the sidewall spacers using the anisotropic etching process to cause physical damage (e.g., plasma damage, cracks) to a portion of the exposed portion of the substrate. The method smoothes exposed portions of the sidewall spacers and exposed portions of the substrate using at least a plasma treatment process including an isotropic etching component to the exposed portion of the substrate and sidewall spacers on the sides of the gate structures whereupon the exposed portion of the sidewall spacers result to a predetermined surface roughness value.
    • 一种用于处理集成电路存储器件的方法。 该方法包括支撑部分完成的衬底,该衬底包括多个MOS栅极结构。 每个栅极结构具有限定栅极结构的侧面的基本上垂直的区域。 该方法形成覆盖栅极结构的共形介电层。 保形介电层具有覆盖包括垂直区域的每个栅极结构的材料的预定厚度。 该方法还使用各向异性蚀刻工艺从共形介电层在栅极结构的侧面上形成侧壁间隔物,并且在使用各向异性蚀刻工艺形成侧壁间隔件期间露出基板区域的一部分以引起物理损伤(例如, 等离子体损伤,裂纹)到衬底的暴露部分的一部分。 该方法使用至少包括各向同性蚀刻部件的等离子体处理工艺来平滑侧壁间隔物的暴露部分和衬底的暴露部分到衬底的暴露部分和栅极结构侧面上的侧壁间隔物,随后暴露部分 侧壁间隔物导致预定的表面粗糙度值。