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1. 发明申请

US20160289820A1 ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR HIGH TARGET UTILIZATION 审中-公开
标题翻译：旋转MAGNETRON磁条和包含相同目标的设备用于高目标使用
公开(公告)号：US20160289820A1
公开(公告)日：2016-10-06
申请号：US15180289
申请日：2016-06-13
申请人： JOHN E. MADOCKS , PATRICK LAWRENCE MORSE , PHONG NGO
发明人： JOHN E. MADOCKS , PATRICK LAWRENCE MORSE , PHONG NGO
IPC分类号： C23C14/54 , C23C14/35 , C23C14/34 , H01J37/34
CPC分类号： C23C14/54 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3452 , H01J37/3482 , H01J2237/24585 , H01J2237/332
摘要： An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
摘要翻译：提供了一种用于涂覆基板的设备，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。由形成涂层组分的目标材料形成的管状目标具有一端。目标在等离子体源附近用于目标材料的溅射。目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。目标利用率达到初始目标重量的87％（重量）。

2. 发明申请

US20100155226A1 ROTATABLE MAGNETRON SPUTTERING WITH AXIALLY MOVABLE TARGET ELECTRODE TUBE 失效
标题翻译：可旋转的磁铁溅射与轴向移动目标电极管
公开(公告)号：US20100155226A1
公开(公告)日：2010-06-24
申请号：US12602298
申请日：2008-06-06
申请人： John Madocks , Patrick Lawrence Morse
发明人： John Madocks , Patrick Lawrence Morse
IPC分类号： C23C14/35
CPC分类号： H01J37/342 , H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： A new and useful rotatable sputter magnetron assembly is provided, that addresses the issue of uneven wear of the target electrode tube. According to the principles of the present invention, a rotatable sputter magnetron assembly for use in magnetron sputtering target material onto a substrate comprises a. a longitudinally extending tubular shaped target electrode tube having a longitudinal central axis, b. the target electrode tube extending about a magnet bar that is configured to generate a plasma confining magnetic field adjacent the target electrode tube, c. the magnet bar being held substantially stationary within the target electrode tube, and d. the target electrode tube supported for rotation about its longitudinal central axis and for axial movement along its longitudinal central axis, so that wear of the target electrode tube can be controlled by moving the target electrode tube axially during magnetron sputtering of the target material.
摘要翻译：提供了一种新的和有用的可旋转溅射磁控管组件，其解决了目标电极管的不均匀磨损的问题。根据本发明的原理，用于磁控溅射靶材的可旋转溅射磁控管组件包括a。一个具有纵向中心轴的纵向延伸的管状目标电极管，b。所述目标电极管围绕磁棒延伸，所述磁棒被配置为产生邻近所述目标电极管的等离子体约束磁场，c。磁棒基本上固定在目标电极管内，d。目标电极管被支撑用于围绕其纵向中心轴线旋转并且用于沿其纵向中心轴线轴向运动，使得可以通过在目标材料的磁控溅射期间轴向移动目标电极管来控制目标电极管的磨损。

3. 发明申请

US20120261253A1 ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR HIGH TARGET UTILIZATION 有权
标题翻译：旋转MAGNETRON磁条和包含相同目标的设备用于高目标使用
公开(公告)号：US20120261253A1
公开(公告)日：2012-10-18
申请号：US13504366
申请日：2010-10-26
申请人： John E. Madocks , Patrick Lawrence Morse , Phong Ngo
发明人： John E. Madocks , Patrick Lawrence Morse , Phong Ngo
IPC分类号： C23C14/35
CPC分类号： C23C14/54 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3452 , H01J37/3482 , H01J2237/24585 , H01J2237/332
摘要： An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
摘要翻译：提供了一种用于涂覆基板的设备，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。由形成涂层组分的目标材料形成的管状目标具有一端。目标在等离子体源附近用于目标材料的溅射。目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。目标利用率达到初始目标重量的87％（重量）。

4. 发明授权

US09388490B2 Rotary magnetron magnet bar and apparatus containing the same for high target utilization 有权
标题翻译：旋转磁控管磁棒和含有相同目的的高磁导率仪器
公开(公告)号：US09388490B2
公开(公告)日：2016-07-12
申请号：US13504366
申请日：2010-10-26
申请人： John E. Madocks , Patrick Lawrence Morse , Phong Ngo
发明人： John E. Madocks , Patrick Lawrence Morse , Phong Ngo
IPC分类号： H01J37/34 , C23C14/35 , C23C14/34
CPC分类号： C23C14/54 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3452 , H01J37/3482 , H01J2237/24585 , H01J2237/332
摘要： An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
摘要翻译：提供了一种用于涂覆基板的设备，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。由形成涂层组分的目标材料形成的管状目标具有一端。目标在等离子体源附近用于目标材料的溅射。目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。目标利用率达到初始目标重量的87％（重量）。

5. 发明授权

US08535490B2 Rotatable magnetron sputtering with axially movable target electrode tube 失效
标题翻译：可旋转磁控溅射与轴向移动目标电极管
公开(公告)号：US08535490B2
公开(公告)日：2013-09-17
申请号：US12602298
申请日：2008-06-06
申请人： John Madocks , Patrick Lawrence Morse
发明人： John Madocks , Patrick Lawrence Morse
IPC分类号： C23C14/00
CPC分类号： H01J37/342 , H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： A new and useful rotatable sputter magnetron assembly is provided, that addresses the issue of uneven wear of the target electrode tube. According to the principles of the present invention, a rotatable sputter magnetron assembly for use in magnetron sputtering target material onto a substrate comprises a. a longitudinally extending tubular shaped target electrode tube having a longitudinal central axis, b. the target electrode tube extending about a magnet bar that is configured to generate a plasma confining magnetic field adjacent the target electrode tube, c. the magnet bar being held substantially stationary within the target electrode tube, and d. the target electrode tube supported for rotation about its longitudinal central axis and for axial movement along its longitudinal central axis, so that wear of the target electrode tube can be controlled by moving the target electrode tube axially during magnetron sputtering of the target material.
摘要翻译：提供了一种新的和有用的可旋转溅射磁控管组件，其解决了目标电极管的不均匀磨损的问题。根据本发明的原理，用于磁控溅射靶材的可旋转溅射磁控管组件包括a。一个具有纵向中心轴的纵向延伸的管状目标电极管，b。所述目标电极管围绕磁棒延伸，所述磁棒被配置为产生邻近所述目标电极管的等离子体约束磁场，c。磁棒基本上固定在目标电极管内，d。目标电极管被支撑用于围绕其纵向中心轴线旋转并且用于沿其纵向中心轴线轴向运动，使得可以通过在目标材料的磁控溅射期间轴向移动目标电极管来控制目标电极管的磨损。

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