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1. 发明授权

US4863829A Positive type high gamma-value photoresist composition with novolak resin possessing 失效
标题翻译：具有酚醛清漆树脂的正型高γ值光刻胶组合物
公开(公告)号：US4863829A
公开(公告)日：1989-09-05
申请号：US175658
申请日：1988-03-29
申请人： Akihiro Furuta , Makoto Hanabata , Seimei Yasui , Osamu Hiroaki , Naoyoshi Jinno
发明人： Akihiro Furuta , Makoto Hanabata , Seimei Yasui , Osamu Hiroaki , Naoyoshi Jinno
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： A positive type photoresist composition comprising a novolak resin and O-quinone diazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed in one stage by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, or in two stages by using an acid catalyst in the subsequent stage, the phenol being at least one compound represented by the formula ##STR1## wherein R is hydrogen or an alkyl group of carbon number 1 to 4, the compound being such that the average carbon number in the substituent per one phenol nucelus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, is disclosed. The positive type photoresist composition of the invention has an improved resolving power, i.e., .gamma.-value.
摘要翻译：一种正型光致抗蚀剂组合物，其包含酚醛清漆树脂和O-醌二叠氮化合物，所述酚醛清漆树脂是通过苯酚和甲醛的加成缩合反应得到的酚醛清漆树脂，其通过使用作为催化剂在一个阶段中进行的一个阶段中进行的有机酸盐二价金属，其比氢更正电，或者在后续阶段通过使用酸催化剂分两个阶段，所述酚是至少一种由下式表示的化合物：其中R是氢或碳数为1的烷基至4，该化合物使得每一个酚醛树脂的取代基中的平均碳数为0.5至1.5，相对于羟基在邻位或对位取代基的平均碳数小于50mol％，被披露。本发明的正型光致抗蚀剂组合物具有改进的分辨能力，即γ值。

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