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1. 发明授权

US08293646B2 Semiconductor device manufacturing method and substrate processing apparatus 有权
标题翻译：半导体装置的制造方法和基板处理装置
公开(公告)号：US08293646B2
公开(公告)日：2012-10-23
申请号：US11667078
申请日：2005-11-02
申请人： Takashi Ozaki , Osamu Kasahara , Takaaki Noda , Kiyohiko Maeda , Atsushi Moriya , Minoru Sakamoto
发明人： Takashi Ozaki , Osamu Kasahara , Takaaki Noda , Kiyohiko Maeda , Atsushi Moriya , Minoru Sakamoto
IPC分类号： H01L21/02
CPC分类号： C23C16/54 , C23C16/4408 , C30B25/02 , C30B29/06 , H01L21/02046 , H01L21/02532 , H01L21/0262 , H01L21/02658 , H01L21/67017 , H01L21/67109
摘要： A high quality interface is formed at a low oxygen-carbon density between a substrate and a thin film while preventing heat damage on the substrate and increase of thermal budget. This method includes a step of loading a wafer into a reaction furnace, a step of pretreating the wafer in the reaction furnace, a step of performing a main processing of the pretreated wafer in the reaction furnace, and a step of unloading the wafer from the reaction furnace after the main processing. Hydrogen gas is continuously supplied to the reaction furnace in the period from the end of the pretreating step to the start of the main processing and at least during vacuum-exhausting an interior of the reaction furnace.
摘要翻译：在基板和薄膜之间以低的氧 - 碳密度形成高质量的界面，同时防止对基板的热损伤并增加热预算。该方法包括将晶片装载到反应炉中的步骤，在反应炉中预处理晶片的步骤，在反应炉中进行预处理的晶片的主要处理的步骤，以及将晶片从反应炉主要加工后。在从预处理步骤结束到主处理开始的时段内，至少在反应炉内部真空排气期间，将氢气连续供给到反应炉。

2. 发明授权

US07781125B2 Lithography mask blank 有权
标题翻译：光刻面罩空白
公开(公告)号：US07781125B2
公开(公告)日：2010-08-24
申请号：US10525524
申请日：2003-12-24
申请人： Masao Ushida , Megumi Takeuchi , Osamu Suzuki , Minoru Sakamoto
发明人： Masao Ushida , Megumi Takeuchi , Osamu Suzuki , Minoru Sakamoto
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/58
摘要： A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.
摘要翻译：作为用于制造光刻掩模的材料的光刻掩模坯料包括形成在基板上并且具有所需功能的至少一个薄膜。空白具有作为上述薄膜的含氮薄膜和形成在含氮薄膜上或至少在氮的表面部分形成的铵离子的铵离子产生防止层并且在制造光刻掩模之后暴露在光刻掩模的表面上。

3. 发明申请

US20090117752A1 Semiconductor device manufacturing method and substrate processing apparatus 有权
标题翻译：半导体装置的制造方法和基板处理装置
公开(公告)号：US20090117752A1
公开(公告)日：2009-05-07
申请号：US11667078
申请日：2005-11-02
申请人： Takashi Ozaki , Osamu Kasahara , Takaaki Noda , Kiyohiko Maeda , Atsushi Moriya , Minoru Sakamoto
发明人： Takashi Ozaki , Osamu Kasahara , Takaaki Noda , Kiyohiko Maeda , Atsushi Moriya , Minoru Sakamoto
IPC分类号： H01L21/02 , F23N5/22
CPC分类号： C23C16/54 , C23C16/4408 , C30B25/02 , C30B29/06 , H01L21/02046 , H01L21/02532 , H01L21/0262 , H01L21/02658 , H01L21/67017 , H01L21/67109
摘要： A high quality interface is formed at a low oxygen-carbon density between a substrate and a thin film while preventing heat damage on the substrate and increase of thermal budget. This method includes a step of loading a wafer into a reaction furnace, a step of pretreating the wafer in the reaction furnace, a step of performing a main processing of the pretreated wafer in the reaction furnace, and a step of unloading the wafer from the reaction furnace after the main processing. Hydrogen gas is continuously supplied to the reaction furnace in the period from the end of the pretreating step to the start of the main processing and at least during vacuum-exhausting an interior of the reaction furnace.
摘要翻译：在基板和薄膜之间以低的氧 - 碳密度形成高质量的界面，同时防止对基板的热损伤并增加热预算。该方法包括将晶片装载到反应炉中的步骤，在反应炉中预处理晶片的步骤，在反应炉中进行预处理的晶片的主要处理的步骤，以及将晶片从反应炉主要加工后。在从预处理步骤结束到主处理开始的时段内，至少在反应炉内部真空排气期间，将氢气连续供给到反应炉。

4. 发明授权

US4027430A Locking jalousie frame 失效
标题翻译：锁定jalousie框架
公开(公告)号：US4027430A
公开(公告)日：1977-06-07
申请号：US680798
申请日：1976-04-27
申请人： Minoru Sakamoto
发明人： Minoru Sakamoto
IPC分类号： E06B7/084
CPC分类号： E06B7/084
摘要： A locking jalousie frame having a pair of longitudinally extending, spaced, substantially parallel side rails provided with fixed pivots supporting jalousie retaining cover assemblies. Each of the cover assemblies includes a sheath provided with a socket arranged for retainingly receiving an end of a slat. A filler member is insertable into and removable from the sheath independently of the slat for permitting installation and removal of the slat in an opposed pair of the sheaths, while removal of the filler member, and accordingly the slat, from the sheath can only be accomplished from the normally interior side of the jalousie so as to prevent surreptitious illegal entry through the jalousie.
摘要翻译：具有一对纵向延伸的，间隔开的基本上平行的侧轨的锁定百叶窗框架，其设置有固定枢轴支撑百叶窗保持盖组件。每个盖组件包括设置有用于保持接收板条端部的插座的护套。填充构件可独立于板条插入并从壳体中移除，用于允许在相对的一对护套中安装和移除板条，同时从外壳去除填充构件，因此板条也可以完成从犹太人的通常的内侧，以防止偷偷偷窥非法进入。

5. 发明授权

US3705611A Circular saw and attachment therefor 失效
标题翻译：圆形表面及其附件
公开(公告)号：US3705611A
公开(公告)日：1972-12-12
申请号：US3705611D
申请日：1970-12-16
申请人： MINORU SAKAMOTO
发明人： SAKAMOTO MINORU
IPC分类号： B23D45/16 , B27B5/34 , B27G19/04
CPC分类号： B23D45/165 , B27B5/34 , B27G19/04 , Y10T83/7734 , Y10T83/7747
摘要： An elongated extension shaft engageable with the drive shaft of a circular saw and projecting therefrom for the reception thereon of a pair of laterally spaced circular saw blades mounted to provide parallel cuts. A two part positioning sleeve is mounted on the extension shaft between the blades and adjustable so as to achieve a predetermined spacing between the blades. Nut means lock the blades for rotation with the extension shaft. A laterally adjustable fixed guard overlies the upper portion of the laterally adjustable blades and a laterally adjustable swinging guard underlies the adjustable blades.
摘要翻译：细长的延伸轴可与圆锯的驱动轴接合并从其中突出，以便在其上接收安装成提供平行切割的一对横向间隔的圆锯片。两部分定位套筒安装在叶片之间的延伸轴上并且可调节，以便实现叶片之间的预定间隔。螺母意味着锁定刀片以与延长轴一起旋转。可横向调节的固定护罩覆盖在可横向调节的叶片的上部，并且横向可调的摆动保护件位于可调叶片的下面。

6. 发明授权

US3601874A Rotary rasping surface scarifying attachment 失效
标题翻译：旋转移动表面扫描附件
公开(公告)号：US3601874A
公开(公告)日：1971-08-31
申请号：US3601874D
申请日：1969-09-05
申请人： SAKAMOTO SHUICHI , MINORU SAKAMOTO , NAGATO TOKUICHI
发明人： SAKAMOTO MINORU , NAGATO TOKUICHI
IPC分类号： B23B49/00 , B23B51/04 , B23D57/00 , B23D67/00 , B23D71/00 , B27B5/12 , B27C1/00
CPC分类号： B27B5/12 , B23B49/005 , B23B51/0406 , B23D57/0076 , B23D67/00 , B23D71/00 , Y10T29/44
摘要： A rotary rasping surface texturing attachment comprising a cupped rotary saw and a companion depth-of-cut adjusting safety guard. This attachment can, if desired, replace a detachable circular saw and safety guard assembly on a portable handleequipped electric power unit. No alterations in the power unit are resorted to. All that is necessary is to detach the usual circular saw and guard and substitute the herein disclosed attachment, using the same bolting means to mount and retain it in place. The stated attachment lends itself for use in (1) producing a rough-sawn but desired surface finish on suitably receptive lumber and timber and (2) for use in removing paint, stains and the like from wood surfaces and (3) scarifying room wall surfaces in preparation for application of new plaster and similar wall-finishing jobs.

7. 发明授权

US07611808B2 Halftone type phase shift mask blank and halftone type phase shift mask 有权
标题翻译：半色调型相移掩模和半色调型相移掩模
公开(公告)号：US07611808B2
公开(公告)日：2009-11-03
申请号：US11642595
申请日：2006-12-21
申请人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
发明人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.
摘要翻译：以透明基板，半透明膜图案和半透明膜图案和屏蔽膜图案中的每一个反射的方式构成具有半透明膜图案和设置在透明基板上的屏蔽膜图案的半色调型相移掩模检查光表示可以基于在检查光照射在掩模上时产生的反射光来检测半透明膜图案和屏蔽膜图案的差异。

8. 发明申请

US20070134568A1 Halftone type phase shift mask blank and halftone type phase shift mask 有权
公开(公告)号：US20070134568A1
公开(公告)日：2007-06-14
申请号：US11642595
申请日：2006-12-21
申请人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
发明人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

9. 发明授权

US5351021A Ladder-type piezoelectric filter 失效
标题翻译：梯形压电滤波器
公开(公告)号：US5351021A
公开(公告)日：1994-09-27
申请号：US088488
申请日：1993-07-06
申请人： Kimio Masaie , Minoru Sakamoto
发明人： Kimio Masaie , Minoru Sakamoto
IPC分类号： H03H9/02 , H03H9/58 , H03H9/60
CPC分类号： H03H9/581 , H03H9/02141 , H03H9/605
摘要： In a ladder-type piezoelectric filter having a series arm constituted by a plurality of series resonators connected in series and parallel arms respectively constituted by parallel resonators, each of the resonators being constructed using a piezoelectric plate, the direction of polarization of the piezoelectric plate of the series resonator arranged in at least one end of the series arm and the direction of polarization of the piezoelectric plate of the parallel resonator connected to the series resonator arranged in at least one end of the series arm are the same as seen from the side of a node of the series resonator arranged in the end and the parallel resonator connected to the series resonator.
摘要翻译：在具有由串联连接的多个串联谐振器和分别由并联谐振器构成的并联臂构成的串联臂的梯形压电滤波器中，每个谐振器使用压电板构成，压电板的极化方向布置在串联臂的至少一端的串联谐振器和连接到布置在串联臂的至少一端的串联谐振器的并联谐振器的压电板的极化方向与从侧面观察到的相同布置在端部的串联谐振器的节点和连接到串联谐振器的并联谐振器。

10. 发明授权

US4014553A Combined golf ball tether and anchor structure 失效
标题翻译：组合高尔夫球系绳和锚结构
公开(公告)号：US4014553A
公开(公告)日：1977-03-29
申请号：US634654
申请日：1975-11-24
申请人： Minoru Sakamoto
发明人： Minoru Sakamoto
IPC分类号： A63B69/36 , A63B69/00 , A63B71/02
CPC分类号： A63B69/0079 , A63B2071/025
摘要： An upright standard is provided including structure carried by its lower end for support of the standard from a support surface from which a golf ball may be driven. A low horizontally outwardly projecting arm is stationarily supported from the lower end portion of the standard at an elevation spaced above the lower end of the standard. An elongated flexible tether member has one end thereof anchored to the outer free end portion of the arm and a ball simulating a golf ball is anchored to the other end of the tether member. The length of the tether member is equal to at least one and one-half the effective length of the arm and the standard projects above the arm a distance equal to at least the effective length of the tether member. The arm includes relatively extendable base and free end portions with the base end portion anchored to the standard and the latter comprises upper and lower telescopingly engaged end portions removably engaged with each other.
摘要翻译：提供了直立标准，其包括由其下端承载的结构，用于从可以驱动高尔夫球的支撑表面支撑标准。低水平向外突出的臂从标准的下端部固定地支撑在标准下端上方的高度上。细长的柔性系绳构件具有锚定到臂的外部自由端部的一端，并且模拟高尔夫球的球锚固到系绳构件的另一端。系链构件的长度等于臂的有效长度的至少一半，并且标准在臂的上方突出至少等于系绳构件的有效长度的距离。臂包括相对可延伸的基部和自由端部，其中基端部分锚定到标准件，并且后端部包括彼此可拆卸地接合的上部和下部可伸缩的接合端部。

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