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    • 2. 发明授权
    • Method for the growth of SiC, by chemical vapor deposition, using precursors in modified cold-wall reactor
    • 用于生长SiC的方法,通过化学气相沉积,在改性冷壁反应器中使用前体
    • US08329252B2
    • 2012-12-11
    • US13194967
    • 2011-07-31
    • Yuri MakarovMichael Spencer
    • Yuri MakarovMichael Spencer
    • C23C16/32
    • C23C16/32C23C16/4405C23C16/4411C30B25/02C30B25/08C30B29/36
    • A method is described for the growth of high-quality epitaxial silicon carbide (SiC) films and boules, using the Chemical Vapor Deposition (CVD) technique, which comprises the steps of supplying original species SiH4 and CCl4 into a growth chamber, decomposing at elevated temperatures, producing decomposition product SiH2, SiH, Si, CCl3, or CCl2, producing interaction product HCl, CH3Cl, CH4, or SiH2Cl2, etching by one of the byproducts HCl to suppress Si nucleation, providing main species SiCl2 and CH4 at a cooled insert located on sides of a substrate holder and at a shower-head located on top of the substrate holder, in the growth chamber, with proper Si to C atom ratio and Si to Cl atom ratio, to suppress parasitic deposits, and depositing SiC on a substrate at a proper growth substrate temperature (1500 to 1800 centigrade range).
    • 使用化学气相沉积(CVD)技术描述了用于生长高质量外延碳化硅(SiC)膜和晶粒的方法,其包括将原始物质SiH 4和CCl 4供应到生长室中的步骤,在升高的温度下分解 产生分解产物SiH2,SiH,Si,CCl3或CCl2,产生相互作用产物HCl,CH 3 Cl,CH 4或SiH 2 Cl 2,通过一种副产物HCl蚀刻以抑制Si成核,在冷却的插入物处提供主要的物质SiCl 2和CH 4 位于衬底保持器的侧面和位于衬底保持器顶部的淋浴头,在生长室中具有适当的Si至C原子比和Si至Cl原子比,以抑制寄生沉积物,并将SiC沉积在 底物在适当的生长衬底温度(1500至1800摄氏度范围内)。
    • 3. 发明申请
    • STENT DELIVERY SYSTEM
    • STENT交付系统
    • US20120226343A1
    • 2012-09-06
    • US13411340
    • 2012-03-02
    • Justin VoMichael SpencerSargon BourangWilliam S. HenryHong DoanHanh Doan
    • Justin VoMichael SpencerSargon BourangWilliam S. HenryHong DoanHanh Doan
    • A61F2/84
    • A61F2/95A61F2002/9583A61F2002/9665
    • A stent delivery system includes a delivery member, a frictional interfacing member disposed on a distal region of the delivery member, the frictional interfacing member comprising a plurality of perfusion channels, a self-expanding stent disposed over the respective frictional interfacing member and delivery member in a radially contracted configuration, and a sheath defining disposed over the respective self-expanding stent, frictional interfacing member, and delivery member, wherein the frictional interfacing member resists axial and/or rotational movement of the stent relative to the delivery member while the stent is in its radially contracted configuration, and wherein the perfusion channels permit fluid to flow from an interior region of the sheath proximal of the frictional interfacing member to an interior region of the sheath distal of the frictional interfacing member.
    • 支架输送系统包括输送构件,设置在输送构件的远侧区域上的摩擦接口构件,摩擦接口构件包括多个灌注通道,设置在相应摩擦接口构件和输送构件上方的自扩张支架 径向缩小的构造,以及限定设置在相应的自扩张支架,摩擦接口构件和输送构件上方的护套,其中所述摩擦接口构件抵抗支架相对于输送构件的轴向和/或旋转运动,而支架是 在其径向收缩构造中,并且其中所述灌注通道允许流体从所述摩擦接合构件的近侧的护套的内部区域流动到所述护套远离所述摩擦接合构件的内部区域。
    • 5. 发明授权
    • Method, system, and apparatus for the growth of on-axis SiC and similar semiconductor materials
    • 用于生长轴上SiC和类似半导体材料的方法,系统和装置
    • US08088222B2
    • 2012-01-03
    • US11829215
    • 2007-07-27
    • Yuri MakarovMichael Spencer
    • Yuri MakarovMichael Spencer
    • C30B29/00
    • C30B29/36C30B25/18
    • A novel approach for the growth of high-quality on-axis epitaxial silicon carbide (SiC) films and boules, using the Chemical Vapor Deposition (CVD) technique, is described here. The method includes a method of substrate preparation, which allows for the growth of “on-axis” SiC films, plus an approach giving the opportunity to grow silicon carbide on singular (a small-angle miscut) substrates, using halogenated carbon-containing precursors (carbon tetrachloride, CCl4, or halogenated hydrocarbons, CHCl3, CH2Cl2, or CH3Cl, or similar compounds or chemicals), or introducing other chlorine-containing species, in the gas phase, in the growth chamber. At gas mixtures greater than the critical amount, small clusters of SiC are etched, before they can become stable nuclei. The presence of chlorine and the formation of gas species allow an increased removal rate of these nuclei, in contrast to the growth without the presence of chlorine. Or, alternatively, the novel precursors introduced in the growth system reduce the effective supersaturation ratio of the Si species in the growth layer. The reduction of the supersaturation ratio reduces or eliminates the 2D (and 3C—SiC) nucleation which would occur due to the large terrace widths present on the on-axis wafers. This allows the growth of Silicon Carbide epitaxial layers on SiC substrates or composite substrates with monocrystalline layers. This can also be applied to the other semiconductors, chemicals, compounds, materials, growth methods, or devices.
    • 这里描述了使用化学气相沉积(CVD)技术生长高质量轴向外延碳化硅(SiC)膜和晶粒的新颖方法。 该方法包括一种衬底制备方法,其允许“轴上”SiC膜的生长,以及使用卤代含碳前体在单个(小角度杂交)衬底上生长碳化硅的机会的方法 (四氯化碳,CCl 4或卤代烃,CHCl 3,CH 2 Cl 2或CH 3 Cl,或类似的化合物或化学物质),或在气相中引入生长室中的其它含氯物质。 在大于临界量的气体混合物中,SiC的小簇在它们变得稳定的核之前被蚀刻。 与不存在氯的生长相反,氯的存在和气体物质的形成允许这些核的去除速率增加。 或者,在生长系统中引入的新型前体降低生长层中Si物质的有效过饱和比。 过饱和比的降低降低或消除了由于在轴上晶片上存在大的平台宽度而会发生的2D(和3C-SiC)成核。 这允许在SiC衬底或具有单晶层的复合衬底上生长碳化硅外延层。 这也可以应用于其他半导体,化学品,化合物,材料,生长方法或器件。
    • 6. 发明申请
    • Betavoltaic battery with a shallow junction and a method for making same
    • 具有浅结的Betavoltaic电池及其制造方法
    • US20110287567A1
    • 2011-11-24
    • US13195484
    • 2011-08-01
    • Michael SpencerMVS Chandrashekhar
    • Michael SpencerMVS Chandrashekhar
    • H01L21/20
    • H01L21/02625G21H1/02G21H1/06H01L21/02378H01L21/02529H01L21/02579
    • This is a novel SiC betavoltaic device (as an example) which comprises one or more “ultra shallow” P+N− SiC junctions and a pillared or planar device surface (as an example). Junctions are deemed “ultra shallow”, since the thin junction layer (which is proximal to the device's radioactive source) is only 300 nm to 5 nm thick (as an example). In one example, tritium is used as a fuel source. In other embodiments, radioisotopes (such as Nickel-63, promethium or phosphorus-33) may be used. Low energy beta sources, such as tritium, emit low energy beta-electrons that penetrate very shallow distances (as shallow as 5 nm) in semiconductors, including SiC, and can result in electron-hole pair creation near the surface of a semiconductor device rather than pair creation in a device's depletion region. By contrast, as a high energy electron penetrates a semiconductor device surface, such as a diode surface, it produces electron hole-pairs that can be collected at (by drift) and near (by diffusion) the depletion region of the device. This is a betavoltaic device, made of ultra-shallow junctions, which allows such penetration of emitted lower energy electrons, thus, reducing or eliminating losses through electron-hole pair recombination at the surface.
    • 这是一种新型的SiC催化剂装置(作为实例),其包括一个或多个“超浅”P + N-SiC结和柱状或平面的器件表面(作为示例)。 连接点被认为是“超浅”,因为薄接层(其接近器件的放射源)仅为300nm至5nm厚(作为示例)。 在一个实例中,使用氚作为燃料源。 在其它实施方案中,可以使用放射性同位素(例如,镍63,prom或磷-33)。 诸如氚的低能β源发射出半导体(包括SiC)中非常浅的距离(浅达5nm)的低能β-电子,并且可以在半导体器件的表面附近产生电子 - 空穴对,而不是 比设备耗尽区域中的配对创建。 相反,当高能电子穿透诸如二极管表面的半导体器件表面时,它产生电子空穴对,其可以在(通过漂移)和靠近(通过扩散)器件的耗尽区域收集。 这是一种由超浅结点制成的紫外线装置,其允许发射的较低能量电子的这种穿透,从而减少或消除在表面处的电子 - 空穴对复合的损耗。
    • 9. 发明申请
    • Interactive Advertising Platform and Methods
    • 互动广告平台与方法
    • US20110154203A1
    • 2011-06-23
    • US12878558
    • 2010-09-09
    • Andrew Michael SpencerDaniel John SpencerScott Christian Reese
    • Andrew Michael SpencerDaniel John SpencerScott Christian Reese
    • G06F3/01
    • G06Q30/02
    • A method of providing an entertaining and interactive interface for a user to view a displayable multimedia packet, comprises: obtaining a multimedia packet (“MMP”) relating to a product, service or provider, the MMP having a predesigned progression from beginning to end; obtaining or generating a series of queries relating to the product, service or provider; establishing a series of predetermined elapsed times, based on the MMP's predesigned progression, at which each of the various queries will be presented to the user; associating each of the various queries with one of the predetermined elapsed times; and placing the MMP and the queries into a format presentable to a user to allow the user to view the MMP along with the queries.
    • 一种向用户提供娱乐和交互界面以查看可显示多媒体分组的方法,包括:获得与产品,服务或提供者相关的多媒体分组(“MMP”),所述多媒体分组(“MMP”)具有从开始到结束的预先设计的进展; 获取或产生与产品,服务或提供者相关的一系列查询; 基于所述MMP的预先设计的进程,建立一系列预定的经过时间,在该过程中将各种查询呈现给用户; 将各种查询中的每一个与预定经过时间之一相关联; 以及将MMP和查询放置成可呈现给用户的格式,以允许用户与查询一起查看MMP。