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    • 2. 发明申请
    • Method for Analyzing an Integrated Circuit, Apparatus and Integrated Circuit
    • 分析集成电路,装置和集成电路的方法
    • US20080304054A1
    • 2008-12-11
    • US11913675
    • 2006-05-04
    • Martijn GoosensFrank Zachariasse
    • Martijn GoosensFrank Zachariasse
    • G01N21/01H01L21/67H01L23/544
    • H01L22/12G01R31/311
    • A method for analyzing an integrated circuit (IC) comprising a plurality of semiconductor devices is disclosed. The method comprises the steps of forming a diffraction lens (100) comprising a plurality of concentric diffraction zones (110) in a first area of a further surface opposite to the first surface of the substrate (10), and a further step of optically accessing a subset (30) of the plurality of semiconductor devices (20) through the diffraction lens (100). Due to the fact that a diffraction lens (100) can be implemented at submicron sizes, the lens (100) can be formed more cheaply than a refraction lens, which usually is several microns deep. Moreover, the lens (100) can be easily polished off the substrate (10), which facilitates repeated relocation of the lens (100) on the substrate (10), thus improving the chance of optically detecting a fault inside the IC.
    • 公开了一种用于分析包括多个半导体器件的集成电路(IC)的方法。 该方法包括以下步骤:在与衬底(10)的第一表面相对的另一表面的第一区域中形成包括多个同心衍射区(110)的衍射透镜(100),以及进一步的光学存取步骤 通过衍射透镜(100)的多个半导体器件(20)中的子集(30)。 由于可以以亚微米尺寸实现衍射透镜(100),因此透镜(100)可以比通常为几微米深的折射透镜更廉价地形成。 此外,透镜(100)可以容易地从基板(10)抛光,这有利于透镜(100)在基板(10)上的重复定位,从而提高了光学检测IC内部故障的机会。