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1. 发明授权

US09090722B2 Chemical amplification resist composition, and mold preparation method and resist film using the same 有权
标题翻译：化学放大抗蚀剂组合物，以及模具制备方法和使用其的抗蚀剂膜
公开(公告)号：US09090722B2
公开(公告)日：2015-07-28
申请号：US13256397
申请日：2010-06-23
申请人： Toru Fujimori , Koji Shirakawa , Toshihiro Usa , Kenji Sugiyama , Takayuki Ito , Hideaki Tsubaki , Katsuhiro Nishimaki , Shuji Hirano , Hidenori Takahashi
发明人： Toru Fujimori , Koji Shirakawa , Toshihiro Usa , Kenji Sugiyama , Takayuki Ito , Hideaki Tsubaki , Katsuhiro Nishimaki , Shuji Hirano , Hidenori Takahashi
IPC分类号： C08F20/50 , G03F7/00 , G03F7/039 , B82Y10/00 , B82Y40/00 , B29C59/02 , B29C33/38 , B29C33/42 , G03F7/004
CPC分类号： C08F20/50 , B29C33/38 , B29C2033/426 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
摘要翻译：提供了用于制备模具的化学增幅抗蚀剂组合物，以及使用该组合物的模具制备方法和抗蚀剂膜。

2. 发明授权

US08637222B2 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern 有权
标题翻译：用于其的负抗蚀剂图案形成方法，显影剂和负极化学放大抗蚀剂组合物以及抗蚀剂图案
公开(公告)号：US08637222B2
公开(公告)日：2014-01-28
申请号：US13146976
申请日：2010-01-29
申请人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
发明人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
IPC分类号： G03C5/00
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/325
摘要： A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
摘要翻译：一种抗蚀剂图案形成方法，包括以下顺序：（1）通过使用能够通过交联反应进行负转化的负性化学增幅抗蚀剂组合物形成膜的步骤，（2）曝光所述膜的步骤，以及（4）通过使用含有有机溶剂的显影剂使曝光的膜显影的步骤; 用于此的显影剂和负化学放大抗蚀剂组合物; 以及通过图案形成方法形成的抗蚀剂图案。

3. 发明申请

US20110171577A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物及其与组合物形成图案的方法
公开(公告)号：US20110171577A1
公开(公告)日：2011-07-14
申请号：US13071153
申请日：2011-03-24
申请人： Tomotaka TSUCHIMURA , Koji SHIRAKAWA , Toru TSUCHIHASHI , Hideaki TSUBAKI
发明人： Tomotaka TSUCHIMURA , Koji SHIRAKAWA , Toru TSUCHIHASHI , Hideaki TSUBAKI
IPC分类号： G03F7/004 , G03F7/20 , C07C321/30 , C07D333/76 , C07C317/14
CPC分类号： C07C309/42 , C07C309/25 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/28 , C07C2602/42 , C07C2602/44 , C07C2603/24 , C07C2603/28 , C07C2603/74 , C07D209/82 , C07D339/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O)2— and —OS(═O)2—, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包含下列通式（I）的任何化合物; 其中：Ar表示可以具有除 - （A-B）基团以外的取代基的芳香环; n是1或更大的整数; A表示选自单键，亚烷基，-O - ， - S - ， - C（= O） - ， - S（= O） - ， - S（ ≡O）2-和-OS（ΟO）2-，条件是不包括-C（= O）O-; B表示含有具有4个以上碳原子的烃基，其中含有叔或季碳原子的基团，当n为2以上时，两个以上（AB）基可以相同或不同，其他; M +表示有机鎓离子。

4. 发明申请

US20100224207A1 Eyelash Curler 审中-公开
标题翻译：睫毛夹
公开(公告)号：US20100224207A1
公开(公告)日：2010-09-09
申请号：US12086388
申请日：2008-03-14
申请人： Koji Otsuka , Koji Shirakawa
发明人： Koji Otsuka , Koji Shirakawa
IPC分类号： A45D2/48
CPC分类号： A45D2/48
摘要： [Subject] To provide an eyelash curler capable of curling the entire eyelashes easily and beautifully in an ideally radial state by using the eyelash curler once.[Solving Means] An eyelash curler according to the present invention is provided with a pair of supporting columns 10, a movable member 14 in a curved shape capable of moving in the up and down direction along supporting column upper parts 10a in a linear shape of a pair of the supporting columns, an elastic body 16 attached to the movable member, a fixing member 12 in a curved shape fixed to the upper parts 10a of a pair of the supporting column and handles 18 and 22 for moving the movable member 14 in the up and down direction, a curvature radius R3 of a lower edge 12a of the fixing member 12 (excluding the vicinities of both ends) in a front view is set to 16.5 to 22.5 mm, and a curvature radius R1 of the lower edge 12a of the fixing member 12 (excluding the vicinities of the both ends) in a plan view is set to 18.5 to 24.5 mm.
摘要翻译： [主题]提供一种能够通过使用睫毛夹卷发器，在理想的径向状态下容易且美观地卷曲整个睫毛的睫毛夹。具体实施方式根据本发明的睫毛夹具设置有一对支柱10，能够沿着支撑柱上部10a沿上下方向沿着上下方向移动的可动构件14，其形状为直线状一对支撑柱，附接到可动构件的弹性体16，固定在一对支柱的上部10a上的弯曲形状的固定构件12和用于使可动构件14移动的手柄18和22 前后方向上的固定构件12的下边缘12a的曲率半径R3（不包括两端附近）设定为16.5〜22.5mm，下边缘12a的曲率半径R1 （不包括两端附近）在平面图中设定为18.5〜24.5mm。

5. 发明申请

US20050064327A1 Positive resist composition and process for forming pattern using the same 有权
标题翻译：正型抗蚀剂组成和使用其形成图案的工艺
公开(公告)号：US20050064327A1
公开(公告)日：2005-03-24
申请号：US10941925
申请日：2004-09-16
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： C08F212/14 , C08F220/10 , C08F220/42 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且不溶或微溶于碱显影剂并且通过酸的作用变得可溶于碱性显影剂，和（B）在光化射线或辐射照射时产生本说明书中定义的式（3）表示的磺酸化合物的化合物。

6. 发明授权

US06489080B2 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06489080B2
公开(公告)日：2002-12-03
申请号：US09449899
申请日：1999-12-02
申请人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
发明人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
IPC分类号： G03F7027
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.
摘要翻译：本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。

7. 发明授权

US5629128A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5629128A
公开(公告)日：1997-05-13
申请号：US531081
申请日：1995-09-20
申请人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
发明人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.
摘要翻译：描述了一种正型光致抗蚀剂组合物，其包含由下式（I）表示的多羟基化合物的碱溶性树脂和1,2-萘醌 - 二叠氮基-5-（和/或-4-）磺酸盐：（I）其中R 1至R 11相同或不同，并且各自表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或环烷基，条件是R 1至R 11中的至少一个 R11为环烷基; A表示-CH（R 12） - ，其中R 12表示氢原子或烷基; m表示2或3。

8. 发明授权

US5612167A Image forming method using strippable layer and light-sensitive polymerizable layer containing silver halide 失效
标题翻译：使用可剥离层和含有卤化银的光敏聚合层的成像方法
公开(公告)号：US5612167A
公开(公告)日：1997-03-18
申请号：US559886
申请日：1995-11-20
申请人： Hiroaki Yokoya , Koji Shirakawa
发明人： Hiroaki Yokoya , Koji Shirakawa
IPC分类号： C08F2/48 , G03F3/10 , G03F7/028 , G03F7/28 , G03C11/12
CPC分类号： G03F7/28 , G03F3/106 , G03F7/0285
摘要： The present invention provides new image forming methods. The image forming methods use a combination of a light-sensitive material and an image receiving material. The light-sensitive material comprises a support, a strippable layer and a light-sensitive polymerizable layer in order. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. The light-sensitive polymerizable layer may further contain a colorant. An image forming method using the light-sensitive polymerizable layer containing no colorant comprises an exposing step, a developing step, a toning step and a transferring step. Another image forming method using the colorant-containing light-sensitive polymerizable layer comprises an exposing step, a developing step, a removing step and a transferring step. The present invention is characterized in that an image formed on the strippable layer is entirely transferred to the image receiving material. The strippable layer has a thickness of not less than 1.0 .mu.m. A new light-sensitive material having the strippable layer is also disclosed.
摘要翻译：本发明提供了新的成像方法。图像形成方法使用感光材料和图像接收材料的组合。感光材料依次包括支持体，可剥离层和光敏聚合层。光敏聚合层含有卤化银，还原剂和烯键式不饱和可聚合化合物或可交联聚合物。光敏聚合层还可以含有着色剂。使用不含着色剂的光敏聚合层的成像方法包括曝光步骤，显影步骤，调色步骤和转印步骤。使用含着色剂的光敏聚合层的另一成像方法包括曝光步骤，显影步骤，去除步骤和转印步骤。本发明的特征在于，形成在可剥离层上的图像被完全转印到图像接收材料。可剥离层的厚度不小于1.0μm。还公开了具有可剥离层的新的感光材料。

9. 发明授权

US08900791B2 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition 有权
标题翻译：光化射线敏感或辐射敏感性树脂组合物和组合物形成图案的方法
公开(公告)号：US08900791B2
公开(公告)日：2014-12-02
申请号：US13071153
申请日：2011-03-24
申请人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
发明人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
IPC分类号： G03F7/004 , G03F7/028 , C07C309/25 , C07C309/28 , C07C309/42 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07D209/82 , C07D339/08 , G03F7/038 , G03F7/039
CPC分类号： C07C309/42 , C07C309/25 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/28 , C07C2602/42 , C07C2602/44 , C07C2603/24 , C07C2603/28 , C07C2603/74 , C07D209/82 , C07D339/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O)2— and —OS(═O)2—, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包含下列通式（I）的任何化合物; 其中：Ar表示可以具有除 - （A-B）基团以外的取代基的芳香环; n是1或更大的整数; A表示选自单键，亚烷基，-O - ， - S - ， - C（= O） - ， - S（= O） - ， - S（ ≡O）2-和-OS（ΟO）2-，条件是不包括-C（= O）O-; B表示含有具有4个以上碳原子的烃基，其中含有叔或季碳原子的基团，当n为2以上时，两个以上（AB）基可以相同或不同，其他; M +表示有机鎓离子。

10. 发明申请

US20110287234A1 NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 有权
标题翻译：负极电阻图案形成方法，开发商和负极化学放大电阻组合物及其电阻图案
公开(公告)号：US20110287234A1
公开(公告)日：2011-11-24
申请号：US13146976
申请日：2010-01-29
申请人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
发明人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
IPC分类号： G03F7/038 , G03F7/20 , B32B3/14 , G03F7/30
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/325
摘要： A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
摘要翻译：一种抗蚀剂图案形成方法，包括以下顺序：（1）通过使用能够通过交联反应进行负转化的负性化学增幅抗蚀剂组合物形成膜的步骤，（2）曝光所述膜的步骤，以及（4）通过使用含有有机溶剂的显影剂使曝光的膜显影的步骤; 用于此的显影剂和负化学放大抗蚀剂组合物; 以及通过图案形成方法形成的抗蚀剂图案。

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