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1. 发明授权

US6159827A Preparation process of semiconductor wafer 失效
标题翻译：半导体晶圆的制备工艺
公开(公告)号：US6159827A
公开(公告)日：2000-12-12
申请号：US285702
申请日：1999-04-05
申请人： Makoto Kataoka , Yasuhisa Fujii , Kentaro Hirai , Hideki Fukumoto , Masatoshi Kumagai
发明人： Makoto Kataoka , Yasuhisa Fujii , Kentaro Hirai , Hideki Fukumoto , Masatoshi Kumagai
IPC分类号： H01L21/304 , H01L21/68 , H01L21/46 , H01L21/78
CPC分类号： H01L21/6836 , H01L21/304 , H01L2221/68327 , Y10S156/941 , Y10S438/928 , Y10S438/974 , Y10S438/976 , Y10S438/977 , Y10T156/19
摘要： An object of the invention is to provide a preparation process of a semiconductor wafer, in which breakage of the wafer on grinding the back surface of the wafer and on peeling the adhesive tape is prevented, and the operation time can be reduced. The preparation process of a semiconductor wafer comprises the steps of: adhering an adhesive tape on a front surface of a semiconductor wafer; grinding a back surface of the semiconductor wafer by a grinding machine; peeling the adhesive tape; and cleaning the front surface of the semiconductor wafer, wherein an adhesive tape having heat shrinkability is used as the adhesive tape, and after grinding the back surface of the semiconductor wafer, warm water at a temperature of from 50 to 99.degree. C. is poured to peel the adhesive tape in a wafer cleaning machine, and the front surface of the semiconductor wafer is cleaned in the wafer cleaning machine.
摘要翻译：本发明的目的是提供一种半导体晶片的制备方法，其中防止在研磨晶片的背面和剥离胶带时晶片破损，并且可以降低操作时间。半导体晶片的制备方法包括以下步骤：将粘合带粘附在半导体晶片的前表面上; 通过研磨机研磨半导体晶片的背面; 剥去胶带; 并且清洗半导体晶片的前表面，其中使用具有热收缩性的粘合带作为粘合带，并且在研磨半导体晶片的背表面之后，将温度为50至99℃的温水倒入将晶片清洗机中的胶带剥离，在晶圆清洗机中清洗半导体晶片的前表面。

2. 发明授权

US4882338A Substituted isoquinoline derivatives and anti-ulcer agents 失效
标题翻译：取代的异喹啉衍生物和抗溃疡剂
公开(公告)号：US4882338A
公开(公告)日：1989-11-21
申请号：US68934
申请日：1987-07-01
申请人： Kentaro Hirai , Yukio Mizushima
发明人： Kentaro Hirai , Yukio Mizushima
IPC分类号： C07D217/16 , A61K31/47 , A61K31/472 , A61P1/04 , C07D217/26 , C07D401/12 , C07D405/14 , C07D491/04 , C07D491/056
CPC分类号： C07D401/12 , C07D405/14 , C07D491/04
摘要： A compound of the formula: ##STR1## (wherein R is hydrogen, hydroxy, methoxy, acetoxy, acetoxymethyl or trifluoromethyl;R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each is hydrogen, hydroxy, optionally substituted C.sub.1 -C.sub.5 alkoxy, acetoxy, propynyloxy, allyloxy or benzyloxy; or R.sup.2 and R.sup.3 taken together form methylenedioxy;R.sup.5 is hydrogen, hydroxymethyl, C.sub.2 -C.sub.4 alkoxycarbonyl, C.sub.2 -C.sub.5 acyloxymethyl or phthalidyl; and n is 0 or 1 except for the case in which R is methoxy and R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each is hydrogen) or its pharmaceutically acceptable acid addition salt, being useful as anti-ulcer agents is provided through several routes.

3. 发明授权

US4341704A 4,1-Benzoxazepines and thia analogs thereof 失效
标题翻译： 4,1-苯并氧氮杂及其类似物
公开(公告)号：US4341704A
公开(公告)日：1982-07-27
申请号：US276632
申请日：1981-06-23
申请人： Kentaro Hirai , Shigeru Matsutani , Teruyuki Ishiba , Itsuo Makino
发明人： Kentaro Hirai , Shigeru Matsutani , Teruyuki Ishiba , Itsuo Makino
IPC分类号： A61K31/395 , A61K31/4196 , A61K31/55 , A61K31/553 , A61K31/554 , A61P21/02 , A61P25/00 , A61P25/02 , A61P25/08 , A61P25/20 , A61P25/22 , C07D249/08 , C07D249/10 , C07D267/14 , C07D273/00 , C07D281/10 , C07D285/36 , C07D498/04 , C07D513/04 , C07D521/00
CPC分类号： C07D249/08 , C07D231/12 , C07D233/56 , C07D249/10 , C07D267/14 , C07D273/00 , C07D285/36 , C07D513/04
摘要： 4,1-Benzoxazepines and thia analogs thereof of the formula: ##STR1## (wherein --A--B-- is the following group: ##STR2## (wherein R.sup.1 is hydrogen, C.sub.1 to C.sub.3 alkyl, or C.sub.7 to C.sub.9 aralkyl;R.sup.2 is C.sub.1 to C.sub.3 alkyl or C.sub.1 to C.sub.3 .alpha.-aminoalkyl;R.sup.3 is C.sub.2 to C.sub.6 dialkylamino;R.sup.4 is C.sub.2 to C.sub.6 dialkylamino or C.sub.5 to C.sub.7 alkylpiperazino;R.sup.5 is C.sub.1 to C.sub.3 alkyl; andQ is oxygen or sulfur);D is oxygen or sulfur;X is halogen or nitro;Y is hydrogen or halogen; andZ is hydrogen, C.sub.1 to C.sub.3 alkoxy, or C.sub.3 to C.sub.9 dialkylaminoalkoxy;with the proviso that when --A--B-- is ##STR3## Z is not hydrogen.) useful as novel central nervous system drugs are prepared by various synthetic routes.
摘要翻译：（其中-AB-是下列基团：其中R 1是氢，C 1至C 3烷基或C 7至C 9芳烷基） ; R2是C1-C3烷基或C1-C3α-氨基烷基; R3是C2-C6二烷基氨基; R4是C2-C6二烷基氨基或C5-C7烷基哌嗪基; R5是C1-C3烷基; Q是氧或硫）; D 是氧或硫; X是卤素或硝基; Y是氢或卤素; Z是氢，C 1至C 3烷氧基或C 3至C 9二烷基氨基烷氧基;条件是当-AB-不是氢时。）作为新型中枢神经系统药物通过各种合成途径制备。

4. 发明授权

US4318858A Thioethylamide derivatives 失效
标题翻译：硫代乙酰胺衍生物
公开(公告)号：US4318858A
公开(公告)日：1982-03-09
申请号：US212222
申请日：1980-12-02
申请人： Kentaro Hirai , Shigeru Matsutani , Teruyuki Ishiba , Itsuo Makino , Masami Doteuchi , Koichi Otani
发明人： Kentaro Hirai , Shigeru Matsutani , Teruyuki Ishiba , Itsuo Makino , Masami Doteuchi , Koichi Otani
IPC分类号： C07D333/16 , A61K31/34 , A61K31/341 , A61P43/00 , C07D307/52 , C07D307/68 , C07D333/20 , C07D333/38 , C07D405/12 , C07D409/12 , C07D207/04 , C07D333/18
CPC分类号： C07D307/68 , C07D307/52 , C07D333/20 , C07D333/38 , Y10S514/927
摘要： A compound of the formula: ##STR1## [wherein R is dimethylamino or 1-pyrrolidinyl;R.sup.1 and R.sup.2 each is hydrogen or C.sub.1 -C.sub.3 alkyl;R.sup.3 is hydrogen, C.sub.1 -C.sub.3 alkyl (optionally substituted by one member selected from the group consisting of cyano, C.sub.1 -C.sub.3 alkoxy, phenyl, and 5- or 6-membered heterocyclic group), C.sub.3 -C.sub.6 cycloalkyl, C.sub.2 -C.sub.5 alkenyl (optionally substituted by one member selected from the group consisting of C.sub.1 -C.sub.3 alkoxy, phenyl, and phenoxy), C.sub.6 -C.sub.10 aryl (optionally substituted by one or two members selected from the group consisting of hydroxy, halogen, nitro, sulfamoyl, C.sub.1 -C.sub.3 alkyl, C.sub.1 -C.sub.3 alkoxy, C.sub.1 -C.sub.3 alkanoyl, C.sub.2 -C.sub.4 alkoxycarbonyl, C.sub.2 -C.sub.4 dialkylamino, and C.sub.1 -C.sub.3 alkanesulfonyl), or 5- or 6-membered heterocyclic group (optionally substituted by one member selected from the group consisting of oxo, halogen, C.sub.1 -C.sub.3 alkyl, and C.sub.1 -C.sub.3 alkoxy);and X is oxygen or sulfur]and its pharmaceutically acceptable acid addition salts is useful as histamine H.sub.2 blockers.
摘要翻译：下式的化合物：其中R是二甲基氨基或1-吡咯烷基; R1和R2各自为氢或C1-C3烷基; R 3是氢，C 1 -C 3烷基（任选地被选自氰基，C 1 -C 3烷氧基，苯基和5-或6-元杂环基中的一个取代），C 3 -C 6环烷基，C 2 -C 5烯基（任选地被选自C 1 -C 3烷氧基，苯基和苯氧基的一个取代基取代），C 6 -C 10芳基（任选被一个或两个选自羟基，卤素，硝基，氨磺酰基，C1- C 3烷基，C 1 -C 3烷氧基，C 1 -C 3烷酰基，C 2 -C 4烷氧基羰基，C 2 -C 4二烷基氨基和C 1 -C 3烷磺酰基）或5或6元杂环基（任选被一个选自的氧代，卤素，C 1 -C 3烷基和C 1 -C 3烷氧基）; 并且X是氧或硫]，其药学上可接受的酸加成盐可用作组胺H2阻断剂。

5. 发明授权

US4309433A Pyridinecarbonamido-oxy or thio loweralkyl-1-(diloweralkylaminoloweralkyl)benzene and derivatives thereof, compositions containing same and method of using same 失效
标题翻译：吡啶羰基酰氧基或硫代低级烷基-1-（二低烷基氨基低级烷基）苯及其衍生物，含有它们的组合物及其使用方法
公开(公告)号：US4309433A
公开(公告)日：1982-01-05
申请号：US164016
申请日：1980-06-30
申请人： Kentaro Hirai , Teruyuki Ishiba , Shigeru Matsutani , Itsuo Makino , Toshio Fujishita , Masami Doteuchi , Koichi Otani
发明人： Kentaro Hirai , Teruyuki Ishiba , Shigeru Matsutani , Itsuo Makino , Toshio Fujishita , Masami Doteuchi , Koichi Otani
IPC分类号： C07D295/18 , A61K31/16 , A61K31/165 , A61K31/34 , A61K31/341 , A61K31/40 , A61K31/4015 , A61K31/41 , A61K31/415 , A61K31/42 , A61K31/4245 , A61K31/435 , A61K31/4402 , A61K31/4406 , A61K31/4409 , A61K31/445 , A61K31/455 , A61K31/535 , A61K31/5375 , A61K31/5377 , A61P43/00 , C07C67/00 , C07C231/00 , C07C233/18 , C07C233/20 , C07C233/22 , C07C233/60 , C07C233/69 , C07C235/20 , C07C235/48 , C07C235/72 , C07C237/08 , C07C237/32 , C07C237/42 , C07C239/00 , C07C261/04 , C07C301/00 , C07C311/18 , C07C313/00 , C07C323/29 , C07C323/39 , C07C323/41 , C07C325/00 , C07C327/40 , C07C327/46 , C07C327/48 , C07C327/50 , C07D207/16 , C07D207/28 , C07D211/60 , C07D213/81 , C07D213/82 , C07D233/90 , C07D249/10 , C07D257/04 , C07D261/18 , C07D271/06 , C07D295/08 , C07D295/096 , C07D295/14 , C07D295/15 , C07D307/68 , C07D333/38 , C07D335/06 , C07D498/04 , C07D213/56 , C07D401/10
CPC分类号： C07D213/81 , C07C323/29 , C07D207/16 , C07D207/28 , C07D213/82 , C07D257/04 , C07D261/18 , C07D271/06 , C07D295/096 , C07D295/15 , C07D333/38 , C07D335/06 , Y10S514/927
摘要： An aminoalkylbenzene derivative of the formula: ##STR1## [wherein A is oxygen or sulfur;Y is oxo, thioxo, or cyanoimino;a is an integer of 1 to 3;b is an integer of 0 to 3;c is an integer of 1 to 4;R.sup.1 is alkyl;R.sup.2 is hydrogen or alkyl; orR.sup.1 and R.sup.2 taken together represent pyrrolidinyl;R is hydrogen, cycloalkyl, trihaloalkyl, alkoxy, dialkylamino, aryl, aroyl, heterocyclic group, or a group of the formula: ##STR2## (wherein R.sup.3 is hydrogen, halogen, amino, alkyl, alkylamino, dialkylamino, alkylthio, or aryloxy;R.sup.4 is hydrogen, alkyl, alkenyl, aryl, or heterocyclic group; orR.sup.3 and R.sup.4 taken together represent alkylidene or aralkylidene;with the proviso that the above aryl, aroyl, and heterocyclic group can be substituted by 1 to 3 substituents] and its pharmaceutically acceptable acid addition salts being useful as histamine H.sub.2 blockers, especially peptic ulcer remedies, are provided via several routes.
摘要翻译：下式的氨基烷基苯衍生物：其中A是氧或硫; Y是氧代，硫代或氰基亚氨基; a为1〜3的整数， b为0〜3的整数; c为1〜4的整数， R1是烷基; R2是氢或烷基; 或者R 1和R 2一起代表吡咯烷基; R是氢，环烷基，三卤代烷基，烷氧基，二烷基氨基，芳基，芳酰基，杂环基或下式基团：其中R 3是氢，卤素，氨基，烷基，烷基氨基，二烷基氨基，烷硫基或芳氧基; R4是氢，烷基，烯基，芳基或杂环基;或R3和R4一起代表亚烷基或亚烷叉基;条件是上述芳基，芳酰基和杂环基可以被1至3个取代基取代] 作为组胺H2阻断剂，特别是消化性溃疡治疗剂可用的可接受的酸加成盐通过几种途径提供。

6. 发明授权

US4143048A Process for producing triazolylbenzophenone derivatives 失效
标题翻译：生产三唑并苯酮衍生物的方法
公开(公告)号：US4143048A
公开(公告)日：1979-03-06
申请号：US861009
申请日：1977-12-15
申请人： Kentaro Hirai , Toshio Fujishita , Teruyuki Ishiba , Hirohiko Sugimoto
发明人： Kentaro Hirai , Toshio Fujishita , Teruyuki Ishiba , Hirohiko Sugimoto
IPC分类号： A61K38/00 , C07D239/86 , C07D239/92 , C07D249/08 , C07K5/06 , C07K5/065 , C07D249/14
CPC分类号： C07D239/86 , C07D239/92 , C07D249/08 , C07K5/06026 , C07K5/06078 , A61K38/00 , Y10S514/906
摘要： Triazolylbenzophenone derivatives of the formula: ##STR1## (wherein R represents hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 halo-alkyl, the group --(CH.sub.2).sub.n --X--R.sup.5, or the group ##STR2## R.sup.5 represents hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.2 -C.sub.6 alkenyl, C.sub.2 -C.sub.6 alkynyl, C.sub.6 -C.sub.10 aryl, or C.sub.2 -C.sub.8 acyl; X represents sulfur or oxygen; n represents 0, 1, 2, or 3; R.sup.6 and R.sup.7 each represents hydrogen or C.sub.1 -C.sub.6 alkyl; or the group ##STR3## represents pyrrolidino, piperidino, morpholino, or .gamma.-methylpiperazino; R.sup.1 represents hydrogen or halogen; R.sup.2 represents halogen, nitro, or trifluoromethyl; R.sup.3 represents C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 halo-alkyl, C.sub.1 -C.sub.6 azido-alkyl, C.sub.6 -C.sub.10 aryl, C.sub.2 -C.sub.8 acyl, or the group ##STR4## R.sup.4 and R.sup.8 each represents hydrogen, C.sub.1 -C.sub.6 alkyl, or C.sub.7 -C.sub.10 aralkyl; R.sup.9 represents hydrogen or C.sub.1 -C.sub.6 alkyl; R.sup.10 represents hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.7 -C.sub.10 aralkyl, or C.sub.2 -C.sub.11 .alpha.-amino-acyl; or the group ##STR5## represents phthalimido, pyrrolidino, piperidino, morpholino, or .gamma.-methylpiperazino) and their pharmaceutically acceptable acid addition salts, useful as anxiolytics, sedatives, hypnotics, anticonvulsants, muscle relaxants, antidepressants, their synthetic intermediates, and their preparation.

7. 发明授权

US4076705A Dipeptide derivatives and their production 失效
标题翻译：二肽衍生物及其生产
公开(公告)号：US4076705A
公开(公告)日：1978-02-28
申请号：US716268
申请日：1976-08-20
申请人： Kentaro Hirai , Teruyuki Ishiba , Kazuyuki Sasakura , Hirohiko Sugimoto
发明人： Kentaro Hirai , Teruyuki Ishiba , Kazuyuki Sasakura , Hirohiko Sugimoto
IPC分类号： A61K38/00 , C07K5/06 , C07K5/065 , C07K5/10 , C07C103/52
CPC分类号： C07K5/1027 , C07K5/06026 , C07K5/06078 , C07K5/06191 , A61K38/00 , Y02P20/55
摘要： Dipeptide derivatives represented by the formula: ##STR1## wherein R represents hydrogen, C.sub.1 -C.sub.6 alkyl group, C.sub.2 -C.sub.7 alkenyl group, C.sub.2 -C.sub.7 cyanoalkyl group, C.sub.2 -C.sub.7 carbamoylalkyl group, C.sub.3 -C.sub.10 dialkylaminoalkyl group or cyclopropylmethyl group, R.sup.1 represents hydrogen, C.sub.1 -C.sub.6 alkyl group, C.sub.7 -C.sub.14 aralkyl group, C.sub.7 -C.sub.14 hydroxyaralkyl group, C.sub.6 -C.sub.12 aryl group, C.sub.2 -C.sub.7 carbamoylalkyl group, C.sub.2 -C.sub.7 carboxyalkyl group, C.sub.1 -C.sub.6 aminoalkyl group, C.sub.4 -C.sub.10 guanidylalkyl group, C.sub.1 -C.sub.6 mercaptoalkyl group, C.sub.2 -C.sub.7 alkylthioalkyl group, C.sub.9 -C.sub.15 indolylalkyl group or C.sub.4 -C.sub.9 imidazolylalkyl group, R.sup.2 represents hydrogen, C.sub.1 -C.sub.6 alkyl group, C.sub.7 -C.sub.14 aralkyl group, C.sub.6 -C.sub.12 aryl group, glycyl group or glycyl-glycyl group, R.sup.3 represents hydrogen, C.sub.1 -C.sub.6 alkyl group or amino-protecting group, R.sup.1 and R.sup.2 optionally combine to from C.sub.2 -C.sub.4 alkylene group, ##STR2## optionally represents phthalimido group, piperidino group, 4-hydroxy-4-(p-halogenophenyl)piperidino, morpholino, or piperazino group substituted by C.sub.1 -C.sub.6 alkyl group or phenyl group, A ring represents benzene ring or pyridine ring optionally substituted by halogen and B ring represents benzene ring or thiophene ring optionally substituted by halogen, trifluoromethyl group, methylsulfonyl group, nitro group or C.sub.1 -C.sub.6 alkyl group and their acid addition salts, being useful as anxiolytics, sedatives, anticonvulsants, hypnotics, muscle relaxants, or their synthetic intermediates, are prepared.
摘要翻译：由下式表示的二肽衍生物：其中R表示氢，C1-C6烷基，C2-C7链烯基，C2-C7氰基烷基，C2-C7氨基甲酰基烷基，C3-C10二烷基氨基烷基或环丙基甲基，R1表示氢，C1- C 6烷基，C 7 -C 14芳烷基，C 7 -C 14羟基烷基，C 6 -C 12芳基，C 2 -C 7氨基甲酰基烷基，C 2 -C 7羧基烷基，C 1 -C 6氨基烷基，C 4 -C 10冠酰基烷基，C 1 -C 6巯基烷基，C 2 -C 7烷硫基烷基， C 9 -C 15吲哚基烷基或C 4 -C 9咪唑基烷基，R 2表示氢，C 1 -C 6烷基，C 7 -C 14芳烷基，C 6 -C 12芳基，甘氨酰基或甘氨酰 - 甘氨酰基，R 3表示氢，C 1 -C 6烷基或氨基保护基团，R 1和R 2任选地与C 2 -C 4亚烷基相结合，可任选地代表邻苯二甲酰亚氨基，哌啶子基，4-羟基-4-（对卤代苯基）哌啶子基，吗啉代或被C 1 -C 6烷基取代的哌嗪基或苯基，A环表示任选被卤素取代的苯环或吡啶环，B环表示任选被卤素，三氟甲基，甲基磺酰基，硝基或C 1 -C 6烷基取代的苯环或噻吩环及其酸加成盐，可用作抗焦虑剂，镇静剂，抗惊厥药，催眠药，肌肉松弛剂或其合成中间体。

8. 发明授权

US06730595B2 Protecting method for semiconductor wafer and surface protecting adhesive film for semiconductor wafer used in said method 有权
标题翻译：用于所述方法的半导体晶片的半导体晶片和表面保护粘合膜的保护方法
公开(公告)号：US06730595B2
公开(公告)日：2004-05-04
申请号：US10003227
申请日：2001-12-06
申请人： Yoshihisa Saimoto , Yasuhisa Fujii , Makoto Kataoka , Kentaro Hirai , Hideki Fukumoto , Takanobu Koshimizu
发明人： Yoshihisa Saimoto , Yasuhisa Fujii , Makoto Kataoka , Kentaro Hirai , Hideki Fukumoto , Takanobu Koshimizu
IPC分类号： H01L2144
CPC分类号： H01L21/6835 , C09J7/22 , C09J7/38 , C09J2203/326 , H01L21/6836 , H01L24/27 , H01L24/83 , H01L2221/68327 , H01L2221/6834 , H01L2224/274 , H01L2224/2919 , H01L2224/8319 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01019 , H01L2924/01027 , H01L2924/01032 , H01L2924/01033 , H01L2924/01056 , H01L2924/01075 , H01L2924/01082 , H01L2924/0665 , H01L2924/07802 , H01L2924/12042 , H01L2924/00 , H01L2924/3512
摘要： This invention aims to provide a protecting method for a semiconductor wafer which can prevent breakage of a semiconductor wafer even when a semiconductor wafer is thinned to a thickness of 200 &mgr;m or less, and a surface protecting adhesive film for a semiconductor wafer used in the protecting method. According to this invention, there is provided a protecting method for a semiconductor wafer comprising a first step of adhering a surface protecting adhesive film for a semiconductor wafer to a circuit-formed surface of the semiconductor wafer, a second step of processing a non-circuit-formed surface of the semiconductor wafer and a third step of adhering a bonding film for die bonding to the non-circuit-formed surface of the semiconductor wafer, characterized in that the third step is performed without peeling the surface protecting adhesive film for the semiconductor wafer, and an adhesive film in which an adhesive layer is formed on one surface of a substrate film at least one layer of which is made of a resin having a melting point of 200° C. or more is used, and a surface protecting adhesive film for a semiconductor wafer used in the protecting method.
摘要翻译：本发明的目的在于提供一种用于半导体晶片的保护方法，即使将半导体晶片减薄至200μm以下的厚度，也可以防止半导体晶片的破损，以及用于保护半导体晶片的表面保护用粘接膜方法。根据本发明，提供了一种用于半导体晶片的保护方法，包括将用于半导体晶片的表面保护粘合剂膜粘合到半导体晶片的电路形成表面的第一步骤，第二步骤，并且将用于管芯接合的接合膜粘合到半导体晶片的非电路形成表面的第三步骤，其特征在于，在不剥离半导体的表面保护粘合剂膜的情况下进行第三步骤晶片和粘合剂层，其中在基材膜的一个表面上形成粘合剂层，至少一层由熔点为200℃以上的树脂制成，表面保护粘合剂用于保护方法中使用的半导体晶片的膜。

9. 发明授权

US4433154A Bis(carboxamide) derivatives 失效
标题翻译：双（羧酰胺）衍生物
公开(公告)号：US4433154A
公开(公告)日：1984-02-21
申请号：US328444
申请日：1981-12-07
申请人： Kentaro Hirai
发明人： Kentaro Hirai
IPC分类号： C07D295/08 , A61K31/17 , A61K31/40 , A61P43/00 , C07C67/00 , C07C231/00 , C07C231/02 , C07C233/18 , C07C233/20 , C07C233/58 , C07C233/60 , C07C233/62 , C07C233/65 , C07C233/68 , C07C239/00 , C07C279/04 , C07C313/00 , C07C323/44 , C07C323/60 , C07D213/81 , C07D213/82 , C07D233/54 , C07D233/64 , C07D277/20 , C07D277/48 , C07D295/096 , C07D307/52 , C07D307/68 , C07D333/20 , C07D405/14 , C07D409/12 , C07D409/14 , C07D417/12 , C07D417/14 , C07D277/38 , C07D403/12 , C07D405/12
CPC分类号： C07D213/81 , C07D213/82 , C07D233/64 , C07D277/48 , C07D295/096 , C07D307/52 , C07D307/68 , C07D333/20
摘要： Bis(carboxamide) derivatives being useful as histamine H.sub.2 receptor antagonists or anti-peptic ulcer agents are provided from certain dicarboxylic acid derivatives.
摘要翻译：用作组胺H2受体拮抗剂或抗消化性溃疡剂的双（甲酰胺）衍生物由某些二羧酸衍生物提供。

10. 发明授权

US4231930A 1-Substituted thiomethyltriazolobenzodiazepines 失效
标题翻译： 1-取代的硫代甲基三唑并苯并二氮杂卓
公开(公告)号：US4231930A
公开(公告)日：1980-11-04
申请号：US16615
申请日：1979-03-01
申请人： Kentaro Hirai , Toshio Fujishita , Teruyuki Ishiba
发明人： Kentaro Hirai , Toshio Fujishita , Teruyuki Ishiba
IPC分类号： A61K31/55 , A61P21/02 , A61P25/08 , A61P25/20 , C07D249/08 , C07D487/04 , C07D519/00
CPC分类号： C07D249/08 , C07D487/04 , Y02P20/55
摘要： A compound of the formula: ##STR1## wherein R is hydrogen, 2-5C alkoxycarbonyl, 1-7C acyl, 1-4C alkylthio, 7-10C phenylalkylthio, phenylthio, halo-phenylthio, disubstituted aminothio, ##STR2## R.sup.1 is hydrogen or halogen; R.sup.2 is halogen or nitro;and its pharmaceutically acceptable acid addition salts. The compounds and salts thereof are useful as psychotropic agents and as anxiolytics, anticonvulsants and hypnotics.
摘要翻译：下式的化合物：其中R是氢，2-5C烷氧基羰基，1-7C酰基，1-4C烷硫基，7-10C苯基烷硫基，苯硫基，卤代苯硫基，二取代氨基硫代，＆lt; IMAGE＆gt; + TR＆lt; IMAGE > R1是氢或卤素; R2是卤素或硝基; 及其药学上可接受的酸加成盐。其化合物和盐可用作精神药物和抗焦虑剂，抗惊厥药和催眠药。

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