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1. 发明授权

US08562891B2 Process and apparatus for ultraviolet nano-imprint lithography 有权
公开(公告)号：US08562891B2
公开(公告)日：2013-10-22
申请号：US13298404
申请日：2011-11-17
申请人： Eun-Hyoung Cho , Sung Hoon Choa , Jin Seung Sohn , Byung Kyu Lee , Du Hyun Lee
发明人： Eun-Hyoung Cho , Sung Hoon Choa , Jin Seung Sohn , Byung Kyu Lee , Du Hyun Lee
IPC分类号： B29C59/16
CPC分类号： B05D5/02 , B29C47/92 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/0002 , Y10S977/887
摘要： A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.

2. 发明授权

US08363185B2 Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters 有权
标题翻译：光子晶体滤光器，透射滤色镜，透反射彩色滤光片，以及使用滤色片的显示装置
公开(公告)号：US08363185B2
公开(公告)日：2013-01-29
申请号：US12461530
申请日：2009-08-14
申请人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim
发明人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim
IPC分类号： G02F1/1335
CPC分类号： G02B5/201 , B82Y20/00 , G02B1/005 , G02B5/26 , G02F1/133514 , G02F1/133555 , G02F2001/133521 , G02F2202/32
摘要： Example embodiments relate to a photonic crystal optical filter, a transmissive color filter, a transflective color filter, and a display apparatus using the photonic crystal optical filter. The transmissive color filter may include a transparent substrate; a barrier layer formed on the transparent substrate and having a plurality of pixel areas; and a plurality of photonic crystal units formed on the plurality of pixel areas. Each of the plurality of photonic crystal units may have a structure such that a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to transmit light having a wavelength band corresponding to a photonic band gap. An optical cut-off layer may be formed on the first material.
摘要翻译：示例性实施例涉及光子晶体滤光器，透射滤色器，透反射滤色器以及使用光子晶体滤光器的显示装置。透射滤色器可以包括透明基板; 形成在所述透明基板上并具有多个像素区域的阻挡层; 以及形成在所述多个像素区域上的多个光子晶体单元。多个光子晶体单元中的每一个可以具有这样的结构，使得具有相对较高折射率的第一材料和具有相对低折射率的第二材料周期性地布置，以便透射具有对应于光子带的波长带的光间隙。可以在第一材料上形成光学截止层。

3. 发明授权

US08279555B2 Magnetic recording media and method of fabricating the same 有权
标题翻译：磁记录介质及其制造方法
公开(公告)号：US08279555B2
公开(公告)日：2012-10-02
申请号：US12057406
申请日：2008-03-28
申请人： Myung-bok Lee , Jin-seung Sohn , Hoo-san Lee
发明人： Myung-bok Lee , Jin-seung Sohn , Hoo-san Lee
IPC分类号： G11B5/82 , G11B5/667 , G11B5/66
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/66 , G11B5/743 , G11B5/746 , G11B5/855
摘要： A magnetic recording medium and a method of manufacturing the magnetic recording medium are provided. In order to increase the recording density of the magnetic recording medium, the magnetic recording medium is configured to multiple magnetic layers by consecutively forming a first magnetic layer having a thin film shape and a second magnetic layer comprising patterned magnetic bits. The first magnetic layer has a magnetic anisotropic coefficient greater than that of the second magnetic layer.
摘要翻译：提供磁记录介质和制造磁记录介质的方法。为了提高磁记录介质的记录密度，通过连续地形成具有薄膜形状的第一磁性层和包含图案化磁头的第二磁性层，将磁记录介质配置成多个磁性层。第一磁性层的磁各向异性系数大于第二磁性层的磁各向异性系数。

4. 发明授权

US08264637B2 Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter 有权
标题翻译：光子晶体滤光器，反射滤色器，使用反射滤色器的显示装置，以及反射滤色片的制造方法
公开(公告)号：US08264637B2
公开(公告)日：2012-09-11
申请号：US12461455
申请日：2009-08-12
申请人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim , Xianyu Wenxu
发明人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim , Xianyu Wenxu
IPC分类号： G02F1/1335 , G02F1/141 , G02B6/00
CPC分类号： G02B5/201 , G02B5/26 , G02F1/133514
摘要： Example embodiments relate to a photonic crystal optical filter, a reflective color filter using the photonic crystal optical filter, a display apparatus using the reflective color filter, and a method of manufacturing the reflective color filter. The photonic crystal optical filter may include a transparent substrate; a barrier layer formed on the transparent substrate; and a photonic crystal layer formed on the barrier layer. The photonic crystal layer may have a structure in which a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to reflect light having a wavelength band corresponding to a photonic band gap.
摘要翻译：示例实施例涉及光子晶体滤光器，使用光子晶体滤光器的反射滤色器，使用反射滤色器的显示装置以及制造反射滤色器的方法。光子晶体滤光器可以包括透明衬底; 形成在所述透明基板上的阻挡层; 以及形成在阻挡层上的光子晶体层。光子晶体层可以具有其中周期性地布置具有较高折射率的第一材料和具有较低折射率的第二材料以便反射具有与光子带隙对应的波长带的光的结构。

5. 发明授权

US08085648B2 Servo master magnetically transferring servo patterns to magnetic recording medium, and magnetic transfer method using the servo master 有权
标题翻译：伺服主机将伺服模式磁转移到磁记录介质，以及使用伺服主机的磁传输方式
公开(公告)号：US08085648B2
公开(公告)日：2011-12-27
申请号：US12497066
申请日：2009-07-02
申请人： Kyoung-won Na , Jin-seung Sohn , Sang-chul Sul
发明人： Kyoung-won Na , Jin-seung Sohn , Sang-chul Sul
IPC分类号： G11B7/24 , G11B5/86
CPC分类号： G11B5/865 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： The servo master includes a membrane having a first surface and a second surface; a plurality of stamp areas which are disposed on the first surface, each of the plurality of stamp areas including a magnetic layer patterned with servo patterns to be magnetically transferred to a magnetic recording medium; and a pressing members which are disposed on the second surface, each of the plurality of pressing members being operable to apply pressure to a corresponding stamp area of the plurality of stamp areas.
摘要翻译：伺服主机包括具有第一表面和第二表面的膜; 多个印模区域设置在第一表面上，多个印模区域中的每一个包括用伺服图案图案化的磁性层，以磁性转印到磁记录介质上; 以及设置在所述第二表面上的按压构件，所述多个按压构件中的每一个可操作以对所述多个印章区域中的对应印章区域施加压力。

6. 发明授权

US08023228B2 Heat assisted magnetic recording head and method of manufacturing the same 有权
标题翻译：热辅助磁记录头及其制造方法
公开(公告)号：US08023228B2
公开(公告)日：2011-09-20
申请号：US11510796
申请日：2006-08-28
申请人： Jin-seung Sohn , Myung-bok Lee
发明人： Jin-seung Sohn , Myung-bok Lee
IPC分类号： G11B5/00
CPC分类号： G11B5/314 , G11B5/02 , G11B2005/0005 , G11B2005/0021
摘要： A heat assisted magnetic recording (HAMR) head and manufacturing method are provided. The HAMR head is mounted on a slider having an air-bearing surface (ABS) and includes a substrate; a recording unit formed on the substrate and having a stepped end; a waveguide located in a space formed by the stepped end; and a near field light emission (NFE) pole located adjacent to the recording unit and having an end located on a same plane as the ABS. The method includes forming a cladding layer on a substrate; forming a first metal layer on the cladding layer; etching a part of the first metal layer; forming a core layer on the etched region; forming a refraction part in a part of the core layer; forming a second metal layer the first metal layer and the core layer; and forming a recording unit on the second metal layer.
摘要翻译：提供热辅助磁记录（HAMR）头和制造方法。 HAMR头安装在具有空气轴承表面（ABS）的滑块上并且包括基板; 记录单元，形成在所述基板上并具有阶梯端; 位于由阶梯端形成的空间中的波导; 以及邻近记录单元并且具有位于与ABS相同的平面上的端部的近场发光（NFE）极。该方法包括在基板上形成包覆层; 在所述包层上形成第一金属层; 蚀刻第一金属层的一部分; 在蚀刻区域上形成芯层; 在芯层的一部分中形成折射部分; 形成第一金属层和芯层的第二金属层; 以及在所述第二金属层上形成记录单元。

7. 发明申请

US20110223279A1 NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译： NANO IMPRINT MASTER及其制造方法
公开(公告)号：US20110223279A1
公开(公告)日：2011-09-15
申请号：US13113534
申请日：2011-05-23
申请人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
发明人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
IPC分类号： B29C59/02
CPC分类号： G03F1/14 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24917
摘要： A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
摘要翻译：提供了纳米压印母版及其制造方法。该方法包括：将导电金属离子注入包括石英的衬底中，以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂，以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

8. 发明授权

US07968253B2 Nano imprint master and method of manufacturing the same 有权
标题翻译：纳米印记的主人和制造方法相同
公开(公告)号：US07968253B2
公开(公告)日：2011-06-28
申请号：US11745609
申请日：2007-05-08
申请人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
发明人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
IPC分类号： G03F1/00
CPC分类号： G03F1/14 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24917
摘要： A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
摘要翻译：提供了纳米压印母版及其制造方法。该方法包括：将导电金属离子注入包括石英的衬底中，以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂，以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

9. 发明授权

US07747121B2 Bending waveguide, method of fabricating the bending waveguide, light delivery module employing the bending waveguide, and heat assisted magnetic recording head employing the bending waveguide 有权
标题翻译：弯曲波导，制造弯曲波导的方法，使用弯曲波导的光输送模块和采用弯曲波导的热辅助磁记录头
公开(公告)号：US07747121B2
公开(公告)日：2010-06-29
申请号：US11758295
申请日：2007-06-05
申请人： Eun-hyoung Cho , Sung-dong Suh , Jin-seung Sohn
发明人： Eun-hyoung Cho , Sung-dong Suh , Jin-seung Sohn
IPC分类号： G02B6/10
CPC分类号： G02B6/125 , B82Y10/00 , G02B6/305 , G11B5/314 , G11B7/124 , G11B7/1387 , G11B11/10532 , G11B2005/0005 , G11B2005/0021
摘要： A bending waveguide is provided including a core having an input end and an output end, wherein the output end has a near field enhanced aperture structure, and a metal cladding enclosing the core. The core is bent in a curve and a radius of curvature of the curve is a resonance radius at which an intensity of transmitted light with respect to a wavelength of incident light is a maximum. Thus, the direction of the incident light can be changed by a predetermined angle while maintaining the field enhancement characteristic of the conventional near field enhanced aperture without an additional optical element.
摘要翻译：提供一种弯曲波导，其包括具有输入端和输出端的芯，其中输出端具有近场增强的孔结构，以及包围芯的金属包层。芯部曲线弯曲，曲线的曲率半径是透射光相对于入射光的波长的最大值的共振半径。因此，入射光的方向可以改变预定角度，同时保持常规近场增强光圈的场增强特性而不需要额外的光学元件。

10. 发明申请

US20080204684A1 PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY 有权
标题翻译：用于超紫外线纳米切片的方法和装置
公开(公告)号：US20080204684A1
公开(公告)日：2008-08-28
申请号：US12025375
申请日：2008-02-04
申请人： Eun Hyoung CHO , Sung Hoon CHOA , Jin Seung SOHN , Byung Kyu LEE , Du Hyun LEE
发明人： Eun Hyoung CHO , Sung Hoon CHOA , Jin Seung SOHN , Byung Kyu LEE , Du Hyun LEE
IPC分类号： G03B27/42
CPC分类号： B05D5/02 , B29C47/92 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/0002 , Y10S977/887
摘要： A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.
摘要翻译：提供了一种用于进行UV纳米压印光刻的工艺和设备。该方法使用聚合物垫，其允许对图案化模板均匀施加压力并容易地除去残留的树脂层。该设备包括倾斜和偏心校正器，其允许在纳米压印光刻工艺期间精确地对准层。

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