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1. 发明授权

US08957395B2 Charged particle beam lithography system and target positioning device 有权
公开(公告)号：US08957395B2
公开(公告)日：2015-02-17
申请号：US14221204
申请日：2014-03-20
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

2. 发明申请

US20120069317A1 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION 审中-公开
标题翻译：基础上的平移系统，以及用于安置基础上的平移系统的方法
公开(公告)号：US20120069317A1
公开(公告)日：2012-03-22
申请号：US13237797
申请日：2011-09-20
申请人： Jerry Peijster
发明人： Jerry Peijster
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70833 , G03F7/709
摘要： The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is arranged, and a method for arranging a lithography system on a foundation. The lithography system is arranged on top of a rigid or solid base plate, wherein said base plate having one or more struts attached thereto for placing the lithography system onto the foundation, wherein the one or more struts are arranged at a side of the base plate facing the foundation, and wherein the base plate is provided with a cut-out or an opening for mounting equipment underneath a vacuum chamber of the lithography system.
摘要翻译：本发明涉及一种布置在基础上的隔离需求系统，例如光刻系统，例如布置光刻系统的房间中的地板的一部分，以及用于在基础上布置光刻系统的方法。光刻系统布置在刚性或实心基板的顶部上，其中所述基板具有一个或多个连接到其上的支柱，用于将光刻系统放置在基座上，其中一个或多个支柱布置在基板的一侧面向基础，并且其中底板设置有用于在光刻系统的真空室下方安装设备的切口或开口。

3. 发明申请

US20060150400A1 Component placement machine as well as a method for transporting printed circuit boards 审中-公开
标题翻译：元件贴装机以及传输印刷电路板的方法
公开(公告)号：US20060150400A1
公开(公告)日：2006-07-13
申请号：US10534751
申请日：2003-10-27
申请人： Lambertus Van Halder , Adrianus Van Der Horst , Johannes Van Deursen , Jerry Peijster , Hendrik Broekhuizen , Jan Baartman
发明人： Lambertus Van Halder , Adrianus Van Der Horst , Johannes Van Deursen , Jerry Peijster , Hendrik Broekhuizen , Jan Baartman
IPC分类号： B23P23/00
CPC分类号： H05K13/0061 , Y10T29/5136 , Y10T29/5196 , Y10T29/53178 , Y10T29/53261
摘要： A component placement machine with a frame and with a transport device for transporting printed circuit boards in an X-direction as well as a method for transporting printed circuit boards whereby the transport device comprises at least one transport beam extending in the X-direction. The transport beam can be driven in the X-direction in a reciprocating movement, whereby the transport device is provided with a clamping mechanism connected to the transport beam for clamping on to a lateral edge extending in the X-direction of the printed circuit boards to be transported. The device is further provided with a supporting mechanism connected to the frame for supporting two lateral edges on both sides of the printed circuit boards, whereby the clamping mechanism can be brought into an active clamping position such that the clamping mechanism is active during the movement of the transport beam in the positive X-direction and can be brought to a resting position during the return of the transport beam in the negative X-direction. While the clamping mechanism is in a resting position the printed circuit boards are supported by the supporting mechanism.
摘要翻译：一种具有框架并具有用于沿X方向传送印刷电路板的传送装置的组件放置机器以及用于传送印刷电路板的方法，由此传送装置包括沿X方向延伸的至少一个传送光束。输送梁可以在往复运动中沿X方向驱动，由此输送装置设置有连接到输送梁的夹紧机构，用于夹持在沿印刷电路板的X方向延伸的侧向边缘上被运送该装置还设置有连接到框架的支撑机构，用于支撑印刷电路板两侧的两个侧边缘，由此夹紧机构可以进入主动夹紧位置，使得夹紧机构在移动期间是活动的传输光束处于正X方向并且可以在传输光束在负X方向返回期间被带到静止位置。当夹持机构处于静止位置时，印刷电路板由支撑机构支撑。

4. 发明授权

US08952342B2 Support and positioning structure, semiconductor equipment system and method for positioning 有权
标题翻译：支撑定位结构，半导体设备系统及定位方法
公开(公告)号：US08952342B2
公开(公告)日：2015-02-10
申请号：US12970842
申请日：2010-12-16
申请人： Jerry Peijster , Aditya Mehendale , Andre Johannes Maria Hilderink
发明人： Jerry Peijster , Aditya Mehendale , Andre Johannes Maria Hilderink
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3177 , H01J2237/0264 , H01J2237/202
摘要： The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.
摘要翻译：本发明涉及一种具有支撑和定位结构的带电粒子系统，用于将靶材支撑并定位在桌子上，支撑和定位结构包括第一构件和第二构件以及至少一个马达，以使第一构件相对于第二构件，其中存在用于屏蔽来自由所述至少一个电动机产生的电磁场的至少一个带电粒子束的屏蔽，所述支撑和定位结构还包括弹簧，其将所述第一构件和所述第二构件机械地联接在一起最少部分地承载第一构件，工作台和目标的重量。

5. 发明申请

US20140203187A1 Charged Particle Beam Lithography System and Target Positioning Device 有权
标题翻译：带电粒子光刻系统和目标定位装置
公开(公告)号：US20140203187A1
公开(公告)日：2014-07-24
申请号：US14221204
申请日：2014-03-20
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译：本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向，目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。

6. 发明申请

US20110174985A1 LITHOGRAPHY SYSTEM WITH LENS ROTATION 审中-公开
标题翻译：具有镜头旋转的LITHOGRAPHY系统
公开(公告)号：US20110174985A1
公开(公告)日：2011-07-21
申请号：US13010658
申请日：2011-01-20
申请人： Jerry Peijster
发明人： Jerry Peijster
IPC分类号： H01J3/14 , H01J3/22 , H01J3/18
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/023 , H01J37/10 , H01J2237/1502
摘要： The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising:an electron optical subassembly comprising a charged particle source, a collimator lens, an aperture array, a blanking means and a beamstop for generating a plurality of charged particle beamlets; anda projector for projecting said plurality of charged particle beamlets on said target;said projector being moveably included in the system by means of at least one projector actuator for moving said projector relative to said electron optical subassembly;said projector actuator being included for mechanically actuating said projector and providing said projector with at least one degree of freedom of movement;wherein said degree of freedom relates to a movement around an optical axis of the system.
摘要翻译：本发明涉及一种基于带电粒子的光刻系统，用于使用多个带电粒子子束将图像投影到目标上，用于将所述图像转印到所述靶上，所述系统包括带电粒子柱，包括：包含带电粒子源的电子光学子组件准直透镜，孔径阵列，消隐装置和用于产生多个带电粒子子束的波束抑制器; 以及投影仪，用于将所述多个带电粒子子束投影在所述目标上; 所述投影仪通过至少一个用于相对于所述电子光学子组件移动所述投影仪的投影仪致动器可移动地包括在所述系统中; 所述投影机致动器被包括用于机械地致动所述投影仪并且为所述投影仪提供至少一个移动自由度; 其中所述自由度涉及围绕所述系统的光轴的运动。

7. 发明授权

US08796644B2 Charged particle beam lithography system and target positioning device 有权
标题翻译：带电粒子光刻系统和目标定位装置
公开(公告)号：US08796644B2
公开(公告)日：2014-08-05
申请号：US12542478
申请日：2009-08-17
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： H01J37/304 , H01J37/20
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译：本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向，目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。

8. 发明授权

US08779392B2 Charged particle beam lithography system and target positioning device 有权
公开(公告)号：US08779392B2
公开(公告)日：2014-07-15
申请号：US13298152
申请日：2011-11-16
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： A61N5/00 , H01J37/20
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

9. 发明申请

US20120056100A1 CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE 有权
标题翻译：充电颗粒光束光刻系统和目标定位装置
公开(公告)号：US20120056100A1
公开(公告)日：2012-03-08
申请号：US13298152
申请日：2011-11-16
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： H01J3/26
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising:a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction,a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column,wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译：本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向，目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。

10. 发明申请

US20100044578A1 Charged Particle Beam Lithography System and Target Positioning Device 有权
标题翻译：带电粒子光刻系统和目标定位装置
公开(公告)号：US20100044578A1
公开(公告)日：2010-02-25
申请号：US12542478
申请日：2009-08-17
申请人： Jerry Peijster , Guido de Boer
发明人： Jerry Peijster , Guido de Boer
IPC分类号： G21K5/10 , H01J3/14
CPC分类号： H01J37/20 , H01J37/3002 , H01J37/3174 , H01J2237/2007 , H01J2237/202 , H01J2237/20264 , H01J2237/20278 , H01J2237/20292 , H01J2237/3175
摘要： The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
摘要翻译：本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向，目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。

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