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    • 8. 发明申请
    • DELAYED OPTICAL LOGIC GATES FOR BOOLEAN ALGEBRA
    • 延迟BOOLEAN ALGEBRA的光学逻辑门
    • US20150346581A1
    • 2015-12-03
    • US14729840
    • 2015-06-03
    • GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGYINHA INDUSTRY PARTNERSHIP INSTITUTE
    • Byoung Seung HAM
    • G02F3/00G02F1/35H04Q11/00
    • G02F3/00G02F1/3536H04Q11/0005H04Q2011/002
    • A system, method, and apparatus for delayed optical logic gates based on slow light and enhanced nondegenerate four-wave mixing processes, where a single or multiple delayed optical routers are utilized for dark resonance interactions in which two-color lasers interact with a three-level nonlinear optical medium comprised of two ground states and one excited state through the nondegenerate four-wave mixing processes. The delayed optical logic mechanism is based on combination of single or multiple dark resonance-induced two-photon coherence conversion via slow light phenomenon. The two-photon coherence induced on the ground states is optically detected via nondegenerate four-wave mixing processes. The nondegenerate four-wave mixing generation is enhanced owing to dark resonance or electromagnetically induced transparency. The delayed optical logic gates have potential to keep up ultra-high-bandwidth optical information processing using relatively slow electronic processing devices.
    • 一种基于慢光和增强的非衰变四波混频过程的延迟光逻辑门的系统,方法和装置,其中单个或多个延迟光路由器用于暗谐振相互作用,其中双色激光器与三维激光器相互作用, 通过非衰变四波混合过程由两个基态和一个激发态组成的非线性非线性光学介质。 延迟光学逻辑机制是基于通过慢光现象的单个或多个暗谐振诱导的双光子相干转换的组合。 通过非衰变四波混合过程光学检测在基态诱发的双光子相干性。 由于暗谐振或电磁感应透明度,非衰减四波混频产生得到增强。 延迟的光逻辑门具有利用相对较慢的电子处理器件来保持超高带宽光信息处理的潜力。
    • 9. 发明申请
    • HIGH HEAT-DISSIPATING HIGH STRENGTH ALUMINUM ALLOY
    • 高耐热高强度铝合金
    • US20150337413A1
    • 2015-11-26
    • US14648229
    • 2012-11-30
    • INHA-INDUSTRY PARTNERSHIP INSTITUTE
    • Mok Soon KIM
    • C22C21/00
    • C22C21/00C22C21/08
    • The present invention relates to a high heat-dissipating, high strength aluminum alloy, more particularly to an aluminum alloy containing, as essential components, manganese (Mn), silicon (Si) and magnesium (Mg) at a predetermined content ratio and further containing one or more metal selected from a group consisting of copper (Cu), iron (Fe), zirconium (Zr), chromium (Cr) and titanium (Ti) at a predetermined content ratio, with the remainder being aluminum (Al) and inevitable impurities.The aluminum alloy provided by the present invention has very superior heat-dissipating property and strength and, therefore, can be used as a heat-dissipating material and also as a material for electric/electronic device packaging, a peripheral material for power devices and a material for heat exchangers for use in various applications including transportation such as electric vehicles, hybrid vehicles, gasoline vehicles, etc., energy such as solar generation, etc., home electric appliances, industrial equipment, lighting, and so forth.
    • 本发明涉及一种高散热,高强度的铝合金,更具体地说,涉及以预定含量比含有锰(Mn),硅(Si)和镁(Mg)作为必要成分的铝合金,并且还含有 一种或多种选自铜(Cu),铁(Fe),锆(Zr),铬(Cr)和钛(Ti)的金属,其余为铝(Al)和不可避免的 杂质。 本发明提供的铝合金具有非常优异的散热性和强度,因此可以用作散热材料,也可以用作电气/电子器件封装的材料,用于功率器件的外围材料和 家用电器,工业设备,照明等的能量,例如电动汽车,混合动力汽车,汽油车等交通工具的各种应用的热交换器用材料。
    • 10. 发明申请
    • METHOD FOR FABRICATION PATTERN OF NANO MATERIAL
    • 纳米材料的制造方法
    • US20150266051A1
    • 2015-09-24
    • US14482076
    • 2014-09-10
    • INHA-INDUSTRY PARTNERSHIP INSTITUTE
    • Se-Geun PARKJin-Kyun LEEMyung-Soo KIMJung SEOKHEON
    • B05D1/28B05D1/32
    • H01L31/18H01L51/0023H01L51/44H01L51/444
    • The present invention provides a method for fabricating nano material pattern comprising the steps of forming a perfluorinated polymer pattern on top of the substrate (step 1); spreading a dispersion containing the dispersed nano material on the substrate patterned in step 1) (step 2); and eliminating the perfluorinated polymer pattern formed on the substrate of step 2) (step 3). The method for fabricating nano material pattern of the present invention has advantages over the conventional lift-off method for the fabrication of nano material pattern, which are easiness in eliminating the perfluorinated polymer pattern after forming the nano material pattern with it and no chance of damaging the substrate, suggesting that the method of the invention is excellent in fabricating an excellent nano material pattern.
    • 本发明提供一种制造纳米材料图案的方法,其包括以下步骤:在基底上形成全氟化聚合物图案(步骤1); 在步骤1)中将包含分散的纳米材料的分散体铺展在图案化的基板上(步骤2); 并消除在步骤2)的基板上形成的全氟聚合物图案(步骤3)。 本发明的纳米材料图案的制造方法相对于用于制造纳米材料图案的常规剥离方法具有优点,其在形成纳米材料图案之后容易消除全氟化聚合物图案,并且不会损坏 表明本发明的方法在制备优异的纳米材料图案方面是优异的。