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1. 发明授权

US08093595B2 Thin film array panel and manufacturing method thereof 有权
标题翻译：薄膜阵列面板及其制造方法
公开(公告)号：US08093595B2
公开(公告)日：2012-01-10
申请号：US12609568
申请日：2009-10-30
申请人： Sang-Gab Kim , Sung-Chul Kang , Ho-Min Kang , In-Ho Song , Hee-Hwan Choe
发明人： Sang-Gab Kim , Sung-Chul Kang , Ho-Min Kang , In-Ho Song , Hee-Hwan Choe
IPC分类号： H01L29/04
CPC分类号： H01L27/1259 , G02F1/136227 , G02F1/1368 , G02F2001/13629 , H01L27/1214 , H01L27/124 , H01L27/1288 , H01L27/3262
摘要： A method of manufacturing a thin film array panel is provided, which includes: forming a gate line formed on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming an ohmic contact layer on the semiconductor layer; forming a data line and a drain electrode disposed at least on the ohmic contact layer, forming an oxide on the data line; etching the ohmic contact layer using the data line and the drain electrode as an etch mask; and forming a pixel electrode connected to the drain electrode.
摘要翻译：提供一种制造薄膜阵列面板的方法，其包括：形成在基底上的栅极线; 在栅极线上形成栅极绝缘层; 在所述栅极绝缘层上形成半导体层; 在所述半导体层上形成欧姆接触层; 形成至少设置在所述欧姆接触层上的数据线和漏电极，在所述数据线上形成氧化物; 使用数据线和漏电极作为蚀刻掩模蚀刻欧姆接触层; 以及形成连接到所述漏电极的像素电极。

2. 发明授权

US07619249B2 Thin film array panel and manufacturing method thereof 失效
标题翻译：薄膜阵列面板及其制造方法
公开(公告)号：US07619249B2
公开(公告)日：2009-11-17
申请号：US10878529
申请日：2004-06-29
申请人： Sang-Gab Kim , Sung-Chul Kang , Ho-Min Kang , In-Ho Song , Hee-Hwan Choe
发明人： Sang-Gab Kim , Sung-Chul Kang , Ho-Min Kang , In-Ho Song , Hee-Hwan Choe
IPC分类号： H01L29/04
CPC分类号： H01L27/1259 , G02F1/136227 , G02F1/1368 , G02F2001/13629 , H01L27/1214 , H01L27/124 , H01L27/1288 , H01L27/3262
摘要： A method of manufacturing a thin film array panel is provided, which includes: forming a gate line formed on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming an ohmic contact layer on the semiconductor layer; forming a data line and a drain electrode disposed at least on the ohmic contact layer; forming an oxide on the data line; etching the ohmic contact layer using the data line and the drain electrode as an etch mask; and forming a pixel electrode connected to the drain electrode.
摘要翻译：提供一种制造薄膜阵列面板的方法，其包括：形成在基底上的栅极线; 在栅极线上形成栅极绝缘层; 在所述栅极绝缘层上形成半导体层; 在所述半导体层上形成欧姆接触层; 形成至少设置在所述欧姆接触层上的数据线和漏电极; 在数据线上形成氧化物; 使用数据线和漏电极作为蚀刻掩模蚀刻欧姆接触层; 以及形成连接到所述漏电极的像素电极。

3. 发明申请

US20080280379A1 METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE AND MANUFACTURING SYSTEM USING THE SAME 审中-公开
标题翻译：制造薄膜晶体管基板的方法和使用该薄膜晶体管基板的制造系统
公开(公告)号：US20080280379A1
公开(公告)日：2008-11-13
申请号：US11933413
申请日：2007-10-31
申请人： Min-Seok OH , Sang-Gab KIM , Hong-Kee CHIN , Yu-Gwang JEONG , Seung-Ha CHOI , Ki-Hyun KIM , In-Ho SONG
发明人： Min-Seok OH , Sang-Gab KIM , Hong-Kee CHIN , Yu-Gwang JEONG , Seung-Ha CHOI , Ki-Hyun KIM , In-Ho SONG
IPC分类号： H01L21/66 , H01L21/67
CPC分类号： H01L22/12 , H01L27/1288 , H01L2924/0002 , H01L2924/00
摘要： Provided is a method of manufacturing a thin film transistor substrate and a manufacturing system using the same, wherein the production of corrosive substances is reduced during the process of manufacturing the thin film transistor substrate. The method includes providing an etching unit with an insulation substrate on which a thin metal film has been deposited, and dry-etching the insulation substrate so as to form a predetermined circuit pattern; providing a waiting unit with the insulation substrate waiting to be cleaned; performing a preliminary cleaning operation by a cleaning unit having a plurality of nozzles while the insulation substrate waits and checking the preliminary cleaning operation; and performing a main cleaning operation with regard to the insulation substrate based on the result of the check.
摘要翻译：提供一种制造薄膜晶体管基板的方法和使用该薄膜晶体管基板的制造系统，其中在制造薄膜晶体管基板的过程中，腐蚀性物质的产生减少。该方法包括：提供具有绝缘基板的蚀刻单元，在其上沉积有薄金属膜，并对绝缘基板进行干蚀刻以形成预定的电路图案; 提供等待单元与等待清理的绝缘基板; 在绝缘基板等待并检查预备清洗操作的同时，通过具有多个喷嘴的清洗单元执行初步清洁操作; 并且基于检查结果对绝缘基板进行主清洗操作。

4. 发明申请

US20070065991A1 Thin film transistor array panel and method of manufacturing the same 有权
标题翻译：薄膜晶体管阵列面板及其制造方法
公开(公告)号：US20070065991A1
公开(公告)日：2007-03-22
申请号：US10572234
申请日：2004-09-16
申请人： Sang-Gab Kim , Je-Min Lee , Gwan-Young Cho , Jong-Tae Jeong , In-Ho Song , Hee-Hwan Choe , Sung-Chul Kang , Ho-Min Kang , Beohm-Rock Choi , Joon-Hoo Choi
发明人： Sang-Gab Kim , Je-Min Lee , Gwan-Young Cho , Jong-Tae Jeong , In-Ho Song , Hee-Hwan Choe , Sung-Chul Kang , Ho-Min Kang , Beohm-Rock Choi , Joon-Hoo Choi
IPC分类号： H01L21/84 , H01L21/00 , H01L31/00 , G02F1/1343
CPC分类号： G02F1/13439 , G02F1/1345 , G02F1/136227 , G02F2001/13629 , H01L27/322 , H01L27/3244 , H01L27/3276 , H01L51/5215 , H01L2251/558
摘要： The present invention relates to a thin film transistor array panel, a liquid crystal display, and a manufacturing method of the same. A TFT array for a LCD or an EL display is used as a circuit board for driving the respective pixels in an independent manner. The present invention provides pixel electrodes and contact assistants, which connect expansions of gate lines and data lines to an external circuit, having a structure of double layers including IZO layer and ITO layer. The ITO layer is disposed on the IZO layer. In the present invention, the pixel electrodes are formed to have double layers of IZO layer and ITO layer to avoid wires from getting damage by the ITO etchant and to prevent prove pins from having accumulation of foreign body during the gross test. In the present invention, the contact assistants may only be formed to have double layers of IZO layer and ITO layer to prevent prove pins from having accumulation of foreign body during the gross test. Since the consumption of ITO is reduced, manufacturing cost decreases.
摘要翻译：本发明涉及薄膜晶体管阵列面板，液晶显示器及其制造方法。用于LCD或EL显示器的TFT阵列用作用于独立地驱动各个像素的电路板。本发明提供了将栅极线和数据线的扩展连接到外部电路的像素电极和接触辅助件，其具有包括IZO层和ITO层的双层结构。 ITO层设置在IZO层上。在本发明中，像素电极形成为具有双层IZO层和ITO层，以避免电线被ITO蚀刻剂损坏，并且防止在总体测试期间引脚不会积累异物。在本发明中，接触助剂只能形成为具有双层IZO层和ITO层，以防止在总体测试期间引脚不会积累异物。由于ITO的消耗减少，制造成本降低。

5. 发明申请

US20060118049A1 Vacuum-generating apparatus and thin film processing apparatus having the same 审中-公开
标题翻译：真空发生装置和具有该真空发生装置的薄膜处理装置
公开(公告)号：US20060118049A1
公开(公告)日：2006-06-08
申请号：US11261961
申请日：2005-10-28
申请人： In-Ho Song , Kwan-Young Cho
发明人： In-Ho Song , Kwan-Young Cho
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： F04D29/701 , C23C16/4412 , F04D17/168 , F04D19/04
摘要： A vacuum-generating apparatus includes a vacuum-generating unit and a stabilizing module. The vacuum-generating unit exhausts a fluid from a processing area to generate a vacuum pressure in the processing area. The stabilizing module is disposed between the processing area and the vacuum-generating unit, and the stabilizing module includes at least two curved fluid paths through which the fluid passes. The fluid is exhausted from the processing area through the curved fluid paths, to thereby improve uniformity of the vacuum pressure in the processing area.
摘要翻译：真空发生装置包括真空发生单元和稳定模块。真空发生单元从处理区域排出流体，以在处理区域中产生真空压力。稳定模块设置在处理区域和真空发生单元之间，并且稳定模块包括流体通过的至少两个弯曲流体路径。流体通过弯曲的流体路径从处理区域排出，从而提高处理区域中的真空压力的均匀性。

6. 发明申请

US20050016568A1 Apparatus and method for cleaning of semiconductor device manufacturing equipment 审中-公开
标题翻译：用于清洁半导体器件制造设备的装置和方法
公开(公告)号：US20050016568A1
公开(公告)日：2005-01-27
申请号：US10870309
申请日：2004-06-16
申请人： Hee-Hwan Choe , In-Ho Song , Sung-Chul Kang , Sang-Gab Kim
发明人： Hee-Hwan Choe , In-Ho Song , Sung-Chul Kang , Sang-Gab Kim
IPC分类号： B08B7/00 , C23C16/44 , H01J37/32 , H01L21/00 , H01L21/203 , H01L21/205 , H01L21/3065 , B08B3/00
CPC分类号： H01L21/67069 , B08B7/0035 , C23C16/4405 , H01J37/32568 , H01J37/32862
摘要： A cleaning apparatus and method are provided for the removal of contaminants from semiconductor processing equipment. An electrode to generate a cleaning plasma is provided within a processing chamber and a guide system is capable of moving the electrode over contaminated areas. Advantageously, the present invention saves cleaning time compared with a conventional cleaning method that requires the opening and cleaning of the chamber and also allows for increasing the interval between regular cleanings.
摘要翻译：提供了一种用于从半导体加工设备去除污染物的清洁设备和方法。在处理室内设置有用于产生清洗等离子体的电极，并且引导系统能够将电极移动到污染区域上。有利地，与需要打开和清洁室的常规清洁方法相比，本发明节省了清洁时间，并且还允许增加常规清洁之间的间隔。

7. 发明申请

US20140016293A1 HIGH FREQUENCY MODULE HAVING SURFACE ACOUSTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：具有表面声波装置的高频模块及其制造方法
公开(公告)号：US20140016293A1
公开(公告)日：2014-01-16
申请号：US13549132
申请日：2012-07-13
申请人： In Ho SONG
发明人： In Ho SONG
IPC分类号： H05K9/00 , H05K3/00
CPC分类号： H05K3/284 , H01L2224/16227 , H01L2224/97 , H01L2924/15313 , H01L2924/3025 , H05K1/0218 , H05K1/113 , H05K1/116 , H05K3/0052 , H05K5/0095 , H05K9/0026 , H05K2201/0715 , H05K2201/10083 , Y10T29/49124 , H01L2224/81
摘要： A high frequency module having a surface acoustic wave device and a method of manufacturing the same are provided. The high frequency module includes a substrate provided with a top ground pattern at both upper ends and provided with, inside thereof, an inner ground pattern electrically connected to the top ground pattern through a via electrode; at least one SAW device installed on the substrate; a molding layer formed on the substrate to cover the SAW device and provided with a groove at both ends to expose the top ground pattern; and an electromagnetic wave shield layer formed to cover a surface of the molding layer including an inside of the groove.
摘要翻译：提供具有声表面波装置的高频模块及其制造方法。高频模块包括在两个上端设置有顶部接地图案的基板，在其内部设置有通过通孔电极电连接到顶部接地图案的内部接地图案; 安装在所述基板上的至少一个SAW器件; 形成在所述基板上以覆盖所述SAW器件并且在两端设置有凹槽以暴露所述顶部接地图案的模制层; 以及电磁波屏蔽层，形成为覆盖包括槽内部的成型层的表面。

8. 外观设计

USD613645S1 Vehicle body 有权
公开(公告)号：USD613645S1
公开(公告)日：2010-04-13
申请号：US29342194
申请日：2009-08-20
申请人： In Ho Song , Young Sun Kim , Robert E. Boniface
设计人： In Ho Song , Young Sun Kim , Robert E. Boniface

9. 发明授权

US07212899B2 Automated transmission systems 有权
公开(公告)号：US07212899B2
公开(公告)日：2007-05-01
申请号：US11541361
申请日：2006-09-29
申请人： Ian Richard Joseph Bates , Burkhard Pollack , In Ho Song , Youngkeun Park , Christian Rieger
发明人： Ian Richard Joseph Bates , Burkhard Pollack , In Ho Song , Youngkeun Park , Christian Rieger
IPC分类号： G06F7/00
CPC分类号： B60W30/18109 , B60T1/06 , B60W10/11 , B60W10/18 , B60W30/18136 , F16H61/04 , F16H61/21 , F16H61/22 , F16H2061/0425 , F16H2061/0496 , F16H2312/04 , Y10T477/619 , Y10T477/6388
摘要： An automated transmission system includes a transmission brake which is used to apply a braking torque to the transmission, while the engine torque is negative and a transmission clutch is disengaged to effect a gear downshift, in order to avoid acceleration of the vehicle when the clutch is released and abrupt deceleration of the vehicle upon completion of the gear downshift.

10. 发明授权

US08568131B2 Horizontal molding method and apparatus of interior material of vehicle 有权
标题翻译：车辆内部材料的水平成型方法和装置
公开(公告)号：US08568131B2
公开(公告)日：2013-10-29
申请号：US12994888
申请日：2010-05-18
申请人： In Ho Song , Ji Hyun Cho
发明人： In Ho Song , Ji Hyun Cho
IPC分类号： B29C45/14 , B28B21/36
CPC分类号： B29C45/14262 , B29C2045/14286 , B29L2031/3005
摘要： Horizontal molding method and apparatus of an interior material of a vehicle are provided. The horizontal molding apparatus includes a preheating means for preheating a skin material; a transfer unit including fixing units for vertically attaching or detaching the preheated skin material on or from the transfer unit; a first mold disposed perpendicularly to a ground surface and including suction units for vacuum-sucking and fixing edges of the skin material, a base member having an embossed pattern printed on the skin material, fixing members for sealing an internal space between the skin material and the base member, and vacuum holes for vacuum-sucking the skin material onto the base member; a second mold disposed in parallel with the first mold and on which a base material is injected; and a mold moving means for horizontally moving the first or second mold and combining or separating the first and second molds to or from each other.
摘要翻译：提供了车辆的内部材料的水平成型方法和装置。水平成型设备包括用于预热皮肤材料的预热装置; 转印单元，其包括用于将预热的表皮材料垂直地附着或分离在转印单元上或从转印单元上拆卸的固定单元; 第一模具，其垂直于地面设置，并且包括用于真空吸附和固定表皮材料边缘的抽吸单元，具有印刷在表皮材料上的压纹图案的基底构件，用于密封表皮材料与皮肤材料之间的内部空间的固定构件基体部件和用于将表皮材料真空吸附到基底部件上的真空孔; 第二模具，其与所述第一模具平行地设置并且在其上注入基材; 以及用于水平移动第一或第二模具并将第一模具和第二模具彼此组合或分离的模具移动装置。

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