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    • 8. 发明授权
    • Apparatus and method for image processing capable of accelerating image overlay process
    • 用于加速图像叠加过程的图像处理装置和方法
    • US07330196B2
    • 2008-02-12
    • US10625111
    • 2003-07-22
    • Hiroshi Ishihara
    • Hiroshi Ishihara
    • G09G5/00
    • G06T15/005
    • An image processing apparatus includes an overlay detector and a memory. The image processing apparatus and method sequentially process graphic rendering instructions for image data. The graphic rendering instructions include first and second graphic rendering instructions. The first graphic rendering instruction is input immediately preceding said second graphic rendering instruction. The first graphic rendering instruction contains first rendering data representing a first original image to render a first output image. The second graphic rendering instruction contains second rendering data representing a second original image to render a second output image. The first original image is overlaid by the second original image.
    • 图像处理装置包括覆盖检测器和存储器。 图像处理装置和方法顺序处理图像数据的图形绘制指令。 图形渲染指令包括第一和第二图形渲染指令。 在第二图形呈现指令之前输入第一图形呈现指令。 第一图形渲染指令包含表示第一原始图像以呈现第一输出图像的第一渲染数据。 第二图形呈现指令包含表示第二原始图像以呈现第二输出图像的第二渲染数据。 第一个原始图像被第二个原始图像所覆盖。
    • 9. 发明授权
    • Semiconductor device and process for producing the same
    • 半导体装置及其制造方法
    • US07033958B2
    • 2006-04-25
    • US10649613
    • 2003-08-28
    • Yoshihisa FujisakiHiroshi Ishihara
    • Yoshihisa FujisakiHiroshi Ishihara
    • H01L21/31
    • H01L21/28185H01L21/28202H01L29/513H01L29/518
    • A semiconductor apparatus is provided that is thermally stable in a post process and is suitable for fabricating a gate insulator having a laminated structure with various high permittivity oxides, and a process is provided for producing the same. In order to achieve a high function formation of a gate insulator, a silicon nitride film having a specific inductive capacity approximately twice as much as that of silicon oxide, and which is thermally stable, is not provided with a Si—H bond and is used as at least a portion of the gate insulator. Further, an effective thickness of a gate insulator forming a multilayered structure insulator laminated with a metal oxide having a high dielectric constant, in conversion to silicon oxide, can be thinned to less than 3 nm while restraining leakage current.
    • 提供了一种在后工序中热稳定的半导体装置,并且适用于制造具有各种高介电常数氧化物的层叠结构的栅极绝缘体,并且提供了制造其的工艺。 为了实现栅极绝缘体的高功能性形成,具有比氧化硅大约是电化学氧化硅的比电感容量大约是其热稳定性的两倍的氮化硅膜不具有Si-H键并且被使用 作为栅极绝缘体的至少一部分。 此外,形成层叠有具有高介电常数的金属氧化物的多层结构绝缘体的栅极绝缘体的有效厚度可以在抑制漏电流的同时变薄到小于3nm。