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1. 发明授权

US07667819B2 System and method for contrast enhanced zone plate array lithography 失效
公开(公告)号：US07667819B2
公开(公告)日：2010-02-23
申请号：US11154352
申请日：2005-06-16
申请人： Rajesh Menon , Henry I. Smith
发明人： Rajesh Menon , Henry I. Smith
IPC分类号： G03B27/34
CPC分类号： G03F7/70291 , G03F7/091
摘要： A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

2. 发明授权

US07470473B2 Nanocrystal structures 有权
标题翻译：纳米晶体结构
公开(公告)号：US07470473B2
公开(公告)日：2008-12-30
申请号：US11594732
申请日：2006-11-09
申请人： Hans J. Eisler , Vikram C. Sundar , Michael E. Walsh , Victor I. Klimov , Moungi G. Bawendi , Henry I. Smith
发明人： Hans J. Eisler , Vikram C. Sundar , Michael E. Walsh , Victor I. Klimov , Moungi G. Bawendi , Henry I. Smith
IPC分类号： B32B9/00
CPC分类号： C30B29/605 , C30B5/00 , G02B6/122 , H01L21/02381 , H01L21/0242 , H01L21/0243 , H01L21/02521 , H01L21/02601 , H01L29/06 , H01L29/20 , H01L29/22 , H01L29/26 , Y10S977/813 , Y10T428/12528 , Y10T428/24917 , Y10T428/252 , Y10T428/31678
摘要： A structure including a grating and a semiconductor nanocrystal layer on the grating, can be a laser. The semiconductor nanocrystal layer can include a plurality of semiconductor nanocrystals including a Group II-VI compound, the nanocrystals being distributed in a metal oxide matrix. The grating can have a periodicity from 200 nm to 500 nm.
摘要翻译：在光栅上包括光栅和半导体纳米晶体层的结构可以是激光。半导体纳米晶体层可以包括多个包括II-VI族化合物的半导体纳米晶体，纳米晶体分布在金属氧化物基质中。光栅可以具有从200nm到500nm的周期。

3. 发明授权

US07405806B2 Imaging system and method employing beam folding 失效
标题翻译：使用光束折叠的成像系统和方法
公开(公告)号：US07405806B2
公开(公告)日：2008-07-29
申请号：US11106204
申请日：2005-04-14
申请人： Rajesh Menon , Henry I. Smith
发明人： Rajesh Menon , Henry I. Smith
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70383
摘要： A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.
摘要翻译：公开了一种无掩模光刻系统，其包括空间光调制器，第一和第二成像区域以及第一折叠光学器件。空间光调制器从照明源接收照明，并且提供调制照明光束，该调制照明光束在长度方向上具有第一横截面线长度，并且在宽度方向上具有基本上小于所述第一宽度方向的第一横截面宽度截面长度。第一成像区域接收调制照明光束的第一部分。第一折叠光学器件提供调制照明光束的第二部分，该第二部分在长度方向上与第一成像区域不相邻的第二成像区域沿长度方向相邻于调制照明光束的第一部分。

4. 发明授权

US07348104B2 System and method for fabrication and replication of diffractive optical elements for maskless lithography 失效
$System and method for fabrication and replication of diffractive optical elements for maskless lithography$
标题翻译：用于无掩模光刻的衍射光学元件的制造和复制的系统和方法
公开(公告)号：US07348104B2
公开(公告)日：2008-03-25
申请号：US10677173
申请日：2003-10-02
申请人： Dario Gil , Jeffrey T. Hastings , James G. Goodberlet , Rajesh Menon , David J. Carter , Henry I. Smith
发明人： Dario Gil , Jeffrey T. Hastings , James G. Goodberlet , Rajesh Menon , David J. Carter , Henry I. Smith
IPC分类号： G02B27/44 , G02B27/42 , G02B5/18
CPC分类号： G03F7/70291 , G03F7/0005 , G03F7/0757 , G03F7/2059 , G03F7/70275
摘要： A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.
摘要翻译：公开了一种用于形成用于光刻系统的聚焦元件阵列的方法。该方法包括改变区域上的曝光特性以产生在某些实施例中厚度变化的聚焦元件。在另外的实施例中，该方法包括以下步骤：通过在衬底中的光刻提供第一图案，在衬底上沉积导电吸收材料，将电位施加到导电吸收材料的至少第一部分，留下第二部分所述导电材料没有电位，并且蚀刻所述导电材料的第二部分以在所述基底上提供与所述导电吸收材料的所述第一部分对准的第一图案。

5. 发明授权

US07303860B1 System and method for performing multi-resolution lithography 失效
标题翻译：用于执行多分辨率光刻的系统和方法
公开(公告)号：US07303860B1
公开(公告)日：2007-12-04
申请号：US10313309
申请日：2002-12-06
申请人： Bernhard Vogeli , Timothy A. Savas , Henry I. Smith , Caroline A. Ross
发明人： Bernhard Vogeli , Timothy A. Savas , Henry I. Smith , Caroline A. Ross
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/203
摘要： A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer. In various embodiments, the method may further include the steps of forming a first pattern in a first photo-resist, forming a second pattern in a second photo-resist, and transferring the first and second patterns to a target layer.
摘要翻译：公开了一种形成微结构的微结构和方法。该方法包括以下步骤：在第一光致抗蚀剂中形成第一图案，将第一光刻胶中的第一图案转印到掩模层，在第二光刻胶中形成第二图案，并将第二图案转印在第二光刻胶到掩模层。在各种实施例中，该方法还可以包括以下步骤：在第一光致抗蚀剂中形成第一图案，在第二光致抗蚀剂中形成第二图案，并将第一图案和第二图案转印到目标层。

6. 发明授权

US07193782B2 System and method for manipulating micro-particles using electromagnetic fields 有权
标题翻译：使用电磁场操纵微粒子的系统和方法
公开(公告)号：US07193782B2
公开(公告)日：2007-03-20
申请号：US10748058
申请日：2003-12-30
申请人： Rajesh Menon , Dario Gil , George Barbastathis , Henry I. Smith
发明人： Rajesh Menon , Dario Gil , George Barbastathis , Henry I. Smith
IPC分类号： G02B27/10 , G02B26/00 , H01S1/00 , G01N1/18
CPC分类号： G21K1/00 , Y10T436/25375
摘要： An optical manipulation system is disclosed that includes an array of focusing elements, which focuses the energy beamlets from an array of beamlet sources into an array of focal spots in order to individually manipulate a plurality of samples on an adjacent substrate.
摘要翻译：公开了一种光学操纵系统，其包括聚焦元件阵列，聚焦元件将能量子束从一束子束源聚焦到焦点阵列中，以便单独地操纵相邻基底上的多个样本。

7. 发明授权

US5915051A Wavelength-selective optical add/drop switch 失效
标题翻译：波长选择性光分插开关
公开(公告)号：US5915051A
公开(公告)日：1999-06-22
申请号：US792916
申请日：1997-01-21
申请人： Jay N. Damask , Thomas E. Murphy , Juan Ferrera , Michael Hong Yeol Lim , Henry I. Smith , Hermann A. Haus
发明人： Jay N. Damask , Thomas E. Murphy , Juan Ferrera , Michael Hong Yeol Lim , Henry I. Smith , Hermann A. Haus
IPC分类号： G02B6/12 , G02F1/313 , G08B6/28
CPC分类号： G02B6/12007 , G02F1/3136 , G02B2006/12107 , G02B2006/12173
摘要： A wavelength-selective optical switch having a first input port for accepting a plurality of copropagating optical channels, each of the channels having a distinct wavelength band. The optical switch includes first and second output ports. A wavelength-selective optical filter is connected to receive the copropagating optical channels from the first input port to extract a selected one of the channels while allowing the remaining channels to copropagate to the first output port. An interferometric switch is connected to receive the selected extracted channel; the interferometric switch includes a controller for controlling propagation of the selected extracted channel to either the second output port, the optical filter, or both. The optical filter is connected to receive from the interferometric switch an optical channel to be combined with the remaining copropagating channels and all directed to the first output port. In a first control state of the controller, the interferometric switch is adapted to direct the selected extracted channel to the optical filter, while in a second control state of the controller, the interferometric switch is adapted to direct the selected extracted channel to the second output port. A second input port can be provided for accepting an injected optical channel having a wavelength band corresponding to the wavelength band of the selected extracted channel. This second input port is connected to direct the injected optical channel to the interferometric switch. In this scenario, the interferometric switch is adapted, in the second control state of the controller, to direct the injected channel to the optical filter, and is adapted to direct the injected channel, in a first control state of the controller, to the second output port.
摘要翻译：一种波长选择性光开关，具有用于接收多个共传播光信道的第一输入端口，每个信道具有不同的波段。光开关包括第一和第二输出端口。连接波长选择性滤光器以从第一输入端口接收共同传播的光通道，以提取所选择的一个通道，同时允许其余通道共同传播到第一输出端口。连接干涉式开关以接收所选择的提取的通道; 干涉式开关包括控制器，用于控制所选择的提取的通道到第二输出端口，滤光器或两者的传播。光滤波器被连接以从干涉式开关接收要与剩余的共同传播信道组合的光信道，并且全部被引导到第一输出端口。在控制器的第一控制状态下，干涉式开关适于将所选择的提取的通道引导到滤光器，而在控制器的第二控制状态下，干涉式开关适于将所选择的提取的通道引导至第二输出港口。可以提供第二输入端口用于接受具有与所选择的提取的信道的波长带相对应的波长带的注入光信道。该第二输入端口被连接以将注入的光通道引导到干涉式开关。在这种情况下，在控制器的第二控制状态下，干涉式开关适应于将注入的通道引导到滤光器，并且适于在控制器的第一控制状态下将注入的通道引导到第二输出端口

8. 发明授权

US5892230A Scintillating fiducial patterns 失效
标题翻译：闪烁的基准模式
公开(公告)号：US5892230A
公开(公告)日：1999-04-06
申请号：US865095
申请日：1997-05-29
申请人： James G. Goodberlet , Henry I. Smith
发明人： James G. Goodberlet , Henry I. Smith
IPC分类号： H01J37/304 , H01J37/317 , G01B15/00 , G01J1/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174
摘要： A scintillating fiducial pattern, and methods of fabricating and using same, on a substrate or a resist/substrate composite, where the scintillating fiducial pattern is used in a spatial referencing scheme. The invention includes the use of a scintillating fiducial pattern as alignment or reference marks on a resist/substrate composite, into which a pattern or feature is to be defined. The invention includes the use of a scintillating fiducial in a mask alignment scheme. The invention includes the use of a scintillating fiducial grid or grating in conjunction with an energy beam locating method, or spatial-phase-locked electron-beam lithography. Spatial referencing to the scintillating fiducial grid, or grating, may be implemented with a delay-locked loop, which locks the phase of a signal from the scintillating grid, or grating, to the phase of a known signal. The invention includes the use of a scintillating fiducial grating, or grid, or the like, in conjunction with energy beam locating, to pattern a distortion-free grating or grid. The invention includes the use of an optical or combined photon/electron detection scheme to detect the scintillating fiducial pattern or a signal from the scintillating fiducial pattern.
摘要翻译：闪烁的基准图案及其制造和使用方法在衬底或抗蚀剂/衬底复合材料上，其中闪烁的基准图案用于空间参考方案。本发明包括使用闪烁的基准图案作为抗蚀剂/衬底复合材料上的对准或参考标记，其中将限定图案或特征。本发明包括在掩模对准方案中使用闪烁基准。本发明包括与能量束定位方法或空间锁相电子束光刻结合使用闪烁的基准栅格或光栅。闪烁基准栅格或光栅的空间参考可以用延迟锁定环来实现，该延迟锁定环锁定来自闪烁栅格或光栅的信号的相位到已知信号的相位。本发明包括使用闪烁的基准光栅或栅格等结合能量束定位来对无失真的光栅或栅格进行图案化。本发明包括使用光学或组合光子/电子检测方案来检测闪烁的基准图案或来自闪烁基准图案的信号。

9. 发明授权

US5620573A Reduced stress tungsten deposition 失效
标题翻译：减少应力钨沉积
公开(公告)号：US5620573A
公开(公告)日：1997-04-15
申请号：US431355
申请日：1995-04-28
申请人： Charles W. Jurgensen , Ratnaji R. Kola , Gabriel L. Miller , Henry I. Smith , Eric R. Wagner
发明人： Charles W. Jurgensen , Ratnaji R. Kola , Gabriel L. Miller , Henry I. Smith , Eric R. Wagner
IPC分类号： C23C14/54 , G03F1/22 , C23C14/00 , C23C14/32
CPC分类号： G03F1/22
摘要： X-ray masks are typically made by depositing and patterning a layer of heavy metal on a thin supporting membrane. The metal layer must have a relatively low and uniform stress to prevent stress-induced deformation of the pattern. Tungsten films having excellent stress characteristics are produced by employing a continuously operating capacitance-based measurement technique to allow adjustment of the deposition conditions in rapid response to changes in stress of the film being deposited. The stress gradients in the film are further reduced by transferring heat from the membrane as the metal is deposited thereon.
摘要翻译：通常通过在薄的支撑膜上沉积和图案化重金属层来制造X射线掩模。金属层必须具有相对较低且均匀的应力以防止图案的应力引起的变形。通过采用连续操作的基于电容的测量技术来产生具有优异应力特性的钨膜，以便能够快速响应沉积膜的应力变化来调节沉积条件。当金属沉积在膜上时，通过从膜传递热量来进一步降低膜中的应力梯度。

10. 发明授权

US5142385A Holographic lithography 失效
标题翻译：全息光刻
公开(公告)号：US5142385A
公开(公告)日：1992-08-25
申请号：US643141
申请日：1991-01-09
申请人： Erik H. Anderson , Henry I. Smith , Mark L. Schattenburg
发明人： Erik H. Anderson , Henry I. Smith , Mark L. Schattenburg
IPC分类号： G03F7/00 , G03F7/20 , G03H1/04
CPC分类号： G03F7/70408 , G03F7/001 , G03H1/0486 , G03H2001/0489
摘要： First and second coherent beams illuminate a common area on an exposure station. A phase detector senses the relative phase between the first and second beams to provide a control signal. There is at least one phase shifter in the path of at least one of the coherent beams. The control signal is coupled to the phase shifter to adjust the phase imparted thereby so that the relative phase between the first and second coherent beams is substantially constant.
摘要翻译：第一和第二相干光束照射曝光台上的公共区域。相位检测器检测第一和第二光束之间的相对相位以提供控制信号。在至少一个相干光束的路径中至少有一个移相器。控制信号耦合到移相器以调节由此赋予的相位，使得第一和第二相干光束之间的相对相位基本上恒定。

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