会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • High Cv bulk process valve, control system and method
    • 高Cv体积过程阀,控制系统和方法
    • US6026835A
    • 2000-02-22
    • US102625
    • 1998-06-23
    • Richard L. MartinHarry Clay NesbittDavid Edward DwellyJohn F. Schoeppel
    • Richard L. MartinHarry Clay NesbittDavid Edward DwellyJohn F. Schoeppel
    • F16K1/10F16K41/10F16K31/126
    • F16K41/106F16K1/10Y10T137/0318Y10T137/3109
    • A high Cv bulk process valve, control system and method convey a process gas or liquid for manufacturing semiconductors through a fluid passage. The fluid passage contains an aerodynamically shaped expansion chamber within which a valve seat and a moveable poppet are arranged for opening and closing the fluid passage. The aerodynamically shaped expansion chamber includes a conically expanding entry and a conically contracting exit and is shaped such that the resistance to flow of the process gas or liquid through the fluid passage of the valve is very nearly the same as through a straight tubing having a cross-sectional area of an inlet to the valve and a length of the fluid passage through the valve. The valve can be added or subtracted from a gas or liquid control system with virtually no changes in pressure drop of flow restriction, when the valve is in the open position. The valve minimizes the energy consumed by valves in semiconductor gas systems.
    • 高Cv体积过程阀,控制系统和方法通过流体通道输送用于制造半导体的工艺气体或液体。 流体通道包含空气动力学形状的膨胀室,在该膨胀室中布置有用于打开和关闭流体通道的阀座和可移动提升阀。 空气动力学形状的膨胀室包括锥形膨胀入口和锥形收缩出口,并且成形为使得通过阀的流体通道的工艺气体或液体的流动阻力与通过具有十字形的直管非常接近相同 阀的入口的截面面积和通过阀的流体通道的长度。 当阀门处于打开位置时,可以从气体或液体控制系统中添加或减少阀门,实际上流量限制压降几乎没有变化。 该阀将半导体气体系统中的阀消耗的能量最小化。