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    • 1. 发明授权
    • Incremental preamble detection
    • 增量前导码检测
    • US09362977B2
    • 2016-06-07
    • US13566146
    • 2012-08-03
    • Ivan Leonidovich MazurenkoAlexander Alexandrovich PetyushkoMeng-Lin YuJian-Guo Chen
    • Ivan Leonidovich MazurenkoAlexander Alexandrovich PetyushkoMeng-Lin YuJian-Guo Chen
    • H04B1/7075H04L7/04
    • H04B1/70755H04L7/042
    • In one embodiment, the present invention is a method for performing incremental preamble detection in a wireless communication network. The method processes non-overlapping chunks of incoming antenna data, where each chunk is smaller than the preamble length, to detect the signature of the transmitted preamble. For each chunk processed, chips of the chunk are correlated with possible signatures employed by the wireless network to update a set of correlation profiles, each profile comprising a plurality of profile values. Further, an intermediate detection is performed by comparing the updated profile values to an intermediate threshold that is also updated for each chunk. Upon receiving the final chunk, the correlation profiles are updated, and a final preamble detection is made by comparing the updated profile values to a final threshold. Detections are performed on an incremental basis to meet latency requirements of the wireless network.
    • 在一个实施例中,本发明是一种用于在无线通信网络中执行增量前导码检测的方法。 该方法处理输入天线数据的不重叠块,其中每个块小于前导码长度,以检测所发送的前导码的签名。 对于处理的每个块,块的码片与由无线网络使用的可能的签名相关联,以更新一组相关轮廓,每个轮廓包括多个轮廓值。 此外,通过将更新的简档值与也为每个块更新的中间阈值进行比较来执行中间检测。 在接收到最后的块之后,更新相关轮廓,并且通过将更新的简档值与最终的阈值进​​行比较来进行最终的前导码检测。 检测是按增量执行的,以满足无线网络的延迟要求。
    • 5. 发明授权
    • Method of selectively removing patterned hard mask
    • 选择性去除图案化硬掩模的方法
    • US08486842B2
    • 2013-07-16
    • US12901453
    • 2010-10-08
    • Che-Hua HsuShao-Hua HsuZhi-Cheng LeeCheng-Guo Chen
    • Che-Hua HsuShao-Hua HsuZhi-Cheng LeeCheng-Guo Chen
    • H01L21/302
    • H01L21/31144H01L27/0629H01L28/24
    • A method of selectively removing a patterned hard mask is described. A substrate with a patterned target layer thereon is provided, wherein the patterned target layer includes a first target pattern and at least one second target pattern, and the patterned hard mask includes a first mask pattern on the first target pattern and a second mask pattern on the at least one second target pattern. A first photoresist layer is formed covering the first mask pattern. The sidewall of the at least one second target pattern is covered by a second photoresist layer. The second mask pattern is removed using the first photoresist layer and the second photoresist layer as a mask.
    • 描述了选择性地去除图案化的硬掩模的方法。 提供了其上具有图案化目标层的衬底,其中所述图案化目标层包括第一目标图案和至少一个第二目标图案,并且所述图案化硬掩模包括第一目标图案上的第一掩模图案和第二掩模图案 所述至少一个第二目标图案。 形成覆盖第一掩模图案的第一光致抗蚀剂层。 所述至少一个第二目标图案的侧壁被第二光致抗蚀剂层覆盖。 使用第一光致抗蚀剂层和第二光致抗蚀剂层作为掩模去除第二掩模图案。