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    • 2. 发明授权
    • Process for producing an inorganic thin film on a substrate using a
target
    • 使用靶材在基板上制造无机薄膜的工序
    • US5002648A
    • 1991-03-26
    • US398090
    • 1989-08-24
    • Eugen MorachMarcellus PeuckertGunter SchmidtHans-Peter Scholch
    • Eugen MorachMarcellus PeuckertGunter SchmidtHans-Peter Scholch
    • C01G3/00C01G1/00C01G15/00C01G29/00C23C4/10C23C14/08C23C14/34H01B13/00H01L21/31H01L39/24
    • H01L39/2435C23C14/087C23C4/11Y10S505/731
    • An inorganic thin film is deposited on a substrate by sputtering a sputter target by cathode sputtering in the vicinity of the substrate. To produce the target, at least two pulverulent starting components are mixed. The mixture is tempered if a uniform reaction product can be obtained in this process. It is powdered and the powder is deposited on a metallic base by plasma-jet spraying. This produces the target. Preferably, an oxide mixture is tempered which is a starting product for a superconducting ceramic material. In order to convert the thin film deposited to a superconducting state, it is treated for a prolonged time at temperatures of 300.degree.-800.degree. C. in an oxygen-containing atmosphere. The reaction product obtained on tempering may have, for example, the overall composition ZBa.sub.m Cu.sub.n O.sub.x, where 1.5.ltoreq.m.ltoreq.2.5, 2.ltoreq.n.ltoreq.5 and 4.ltoreq.x.ltoreq.9, Z standing for at least one of the elements Y, La, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, or may have the overall compositions TlBa.sub.l Ca.sub.m Cu.sub.n O.sub.x or BiSr.sub.l Ca.sub.m Cu.sub.n O.sub.x, where 0.3.ltoreq.1.ltoreq.3, 0.3.ltoreq. m.ltoreq.3, 0.3.ltoreq.n.ltoreq.3 and 2.ltoreq.x.ltoreq.11.
    • 通过在衬底附近通过阴极溅射溅射溅射靶,在衬底上沉积无机薄膜。 为了产生目标,混合至少两种粉状起始组分。 如果在此过程中可获得均匀的反应产物,则混合物回火。 它是粉末状的,粉末通过等离子喷射喷涂沉积在金属基底上。 这产生目标。 优选地,对作为超导陶瓷材料的起始产物进行回火的氧化物混合物。 为了将沉积的超薄膜转化为超导状态,在含氧气氛中在300℃-800℃的温度下进行长时间处理。 在回火中获得的反应产物可以具有例如整体组成ZBamCunOx,其中1.5≤2.5,2≤n≤5和4≤x≤9,Z站立 对于元素Y,La,Nd,Sm,Eu,Gd,Dy,Ho,Er,Tm,Yb和Lu中的至少一种,或者可以具有总组成TlBalCamCunOx或BiSrlCamCunOx,其中0.3 < 3,0.3