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    • 1. 发明授权
    • GaN series light-emitting diode structure
    • GaN系列发光二极管结构
    • US08138494B2
    • 2012-03-20
    • US12694600
    • 2010-01-27
    • Ray-Ming LinJhong-Hao JiangBor-Ren Fang
    • Ray-Ming LinJhong-Hao JiangBor-Ren Fang
    • H01L33/00
    • H01L33/04H01L33/32
    • The present invention relates to a GaN series light-emitting diode structure, which includes a substrate; at least one GaN series layer formed over the substrate; subsequently an interface blocking structure composed of an n-type GaN series superlattice structure and a GaN series light-emitting layer, and a GaN series light-emitting layer are formed over the GaN series layer; and a p-type GaN series layer formed over the GaN series light-emitting layer. In the present invention, the radiative recombination efficiency is improved by introducing an interface blocking structure before the light-emitting layer under the epitaxial conditions of low temperature and pure nitrogen atmosphere.
    • 本发明涉及一种GaN系发光二极管结构,其包括:基板; 在衬底上形成至少一个GaN系列层; 随后在GaN系列层上形成由n型GaN系超晶格结构和GaN系列发光层构成的界面阻挡结构和GaN系列发光层; 以及形成在GaN系发光层上的p型GaN系列层。 在本发明中,通过在低温纯氮气氛的外延条件下在发光层之前引入界面阻挡结构来提高辐射复合效率。