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    • 4. 发明授权
    • Substrate with metal film and method for manufacturing the same
    • 金属薄膜基板及其制造方法
    • US08563873B2
    • 2013-10-22
    • US12607666
    • 2009-10-28
    • Ayao NikiAtsushi IshidaRyojiro Tominaga
    • Ayao NikiAtsushi IshidaRyojiro Tominaga
    • H05K1/11C08F2/46C08J7/18
    • H05K3/4661H05K3/0035H05K3/387H05K3/422H05K3/4682H05K2201/0195H05K2201/0209H05K2201/0239H05K2201/09581H05K2201/09827H05K2203/1168
    • A method for manufacturing a substrate with a metal film includes preparing a first insulation layer having first and second surfaces, forming a first conductive circuit on the first surface of the first insulation layer, forming on the first surface of the first insulation layer and on the first conductive circuit a second insulation layer having first and second surfaces, forming in the second insulation layer a penetrating hole tapering from the first surface toward the first conductive circuit, forming on the inner wall of the penetrating hole, a composition containing a polymerization initiator and a polymerizable compound, providing a polymer on the inner wall of the penetrating hole by irradiating the composition, applying a plating catalyst on the polymer, and forming a plated-metal film on the inner wall of the penetrating hole. The first surface of the first insulation layer faces the second surface of the second insulation layer.
    • 一种用金属膜制造衬底的方法包括制备具有第一和第二表面的第一绝缘层,在第一绝缘层的第一表面上形成第一导电电路,在第一绝缘层的第一表面上形成第一绝缘层, 第一导电电路,具有第一和第二表面的第二绝缘层,在所述第二绝缘层中形成从所述第一表面向所述第一导电电路渐缩的穿透孔,在所述穿透孔的内壁上形成含有聚合引发剂和 聚合性化合物,通过照射该组合物,在该聚合物上涂布电镀催化剂,在该贯通孔的内壁上形成聚合物,在该贯通孔的内壁上形成电镀金属膜。 第一绝缘层的第一表面面向第二绝缘层的第二表面。