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1. 发明授权

US06851872B1 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US06851872B1
公开(公告)日：2005-02-08
申请号：US09706817
申请日：2000-11-07
申请人： Kenichi Okubo , Akira Kanbayashi
发明人： Kenichi Okubo , Akira Kanbayashi
IPC分类号： H01L21/027 , B65G49/07 , G03D5/00 , H01L21/00
CPC分类号： H01L21/67276 , Y10S414/135
摘要： Transferring apparatus control means movement of a transferring apparatus for transferring a wafer to a resist liquid coating unit from a cooling process unit. A storage section of the transferring apparatus controller stores a coating time required for a resist film coating and a moving time required for the transfer of the wafer. When a coating start time of a resist film is inputted, the control section calculates a coating end time from the stored coating time. Further, the control section calculates time of taking out a wafer W, which is next subjected to a coating process from the cooling process unit, from the coating end time and the stored moving time. Based on the calculated time, the transferring apparatus controller instructs the transferring apparatus about timing to take out the wafer. This makes it possible to improve the throughput.
摘要翻译：转印装置控制装置是用于从冷却处理单元移动用于将晶片转印到抗蚀剂涂料单元的转印装置。转印装置控制器的存储部分存储抗蚀剂膜涂覆所需的涂布时间和晶片转印所需的移动时间。当输入抗蚀剂膜的涂层开始时间时，控制部分从存储的涂布时间计算涂布结束时间。此外，控制部分计算从涂覆结束时间和存储的移动时间取出接下来经过来自冷却处理单元的涂布处理的晶片W的时间。基于计算出的时间，传送装置控制器指示传送装置关于取出晶片的定时。这使得可以提高吞吐量。

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