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    • 2. 发明授权
    • Method and system for regenerating of plating baths
    • 电镀浴再生方法及系统
    • US06942779B2
    • 2005-09-13
    • US10137548
    • 2002-05-02
    • Brett Matthew BelongiaZhen Wu LinJohn E. PillionJieh-Hwa Shyu
    • Brett Matthew BelongiaZhen Wu LinJohn E. PillionJieh-Hwa Shyu
    • C25D21/18C25D21/22C25D21/06
    • C25D21/18C25D21/22Y10S210/918
    • The present invention provides a system and method for selectively removing one or more organic and inorganic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass. Residual organics, if desired and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.
    • 本发明提供一种用于从镀液中选择性地除去一种或多种有机和无机以及还优选一种或多种无机污染物的系统和方法。 更具体地说,本发明的方法涉及与化学氧化剂组合使用能量源,单独或与催化剂结合使氧化电镀槽中的有机污染物的水平达到使电镀浴能够在 适当的化学调整。 氧化处理方法可以是在单程中进行的连续方法或分批方法。 如果需要,残留的有机物和浴中的氯离子通过化学吸附或物理吸附处理从溶液中除去。 通过选择性离子交换树脂或电渗析从电镀浴中除去无机污染物,同时通过过滤除去颗粒和悬浮胶体颗粒,然后再处理处理后的镀液。