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    • 8. 发明授权
    • Semiconductor light source and method of fabrication thereof
    • 半导体光源及其制造方法
    • US08659038B2
    • 2014-02-25
    • US13375723
    • 2010-06-09
    • Kristian GroomRichard Hogg
    • Kristian GroomRichard Hogg
    • H01L33/00H01S3/04H01S5/00H01S3/00
    • H01S5/50H01S5/1014H01S5/168H01S5/205H01S5/2202H01S5/2209H01S5/2231
    • Embodiments of the present invention provided a method of fabricating a semiconductor light source structure. The method comprises providing a GaAs substrate; forming a lower cladding layer above the substrate, the lower cladding layer comprising an AIxGa1-xAs alloy; forming an active region above the lower cladding layer, the active region comprising a GaAs separate confinement heterostructure; and forming an upper cladding layer comprising an AIxGa1-xAs alloy above the active region in the form of an elongate stripe bounded on either side by an InGaP current-blocking layer, the elongate stripe defining an index-guided optical waveguide. The stripe is formed such that at least one free end of the stripe is spaced apart from an edge of the substrate in a direction parallel to a longitudinal axis of the stripe such that a portion of the lower cladding layer, active region, current blocking layer and upper cladding layer extend beyond the at least one free end of the stripe thereby to provide an unpumped and laterally unguided window region.
    • 本发明的实施例提供了一种制造半导体光源结构的方法。 该方法包括提供GaAs衬底; 在所述衬底上形成下包层,所述下包层包含Al x Ga 1-x As合金; 在所述下包层上形成有源区,所述有源区包括GaAs分离的限制异质结构; 并且在InGaP电流阻挡层的任一侧上以细长条纹的形式在有源区上方形成包含Al x Ga 1-x As合金的上包层,该细长条限定了折射率导引的光波导。 条纹形成为使得条带的至少一个自由端在平行于条纹的纵向轴线的方向上与基底的边缘间隔开,使得下包层的一部分,有源区,电流阻挡层 并且上包层延伸超过条带的至少一个自由端,从而提供未抽空和横向未导向的窗口区域。