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1. 发明授权

US11468555B2 Method and apparatus for generating a correction line indicating relationship between deviation of an edge of a wafer pattern from an edge of a reference pattern and space width of the reference pattern, and a computer-readable recording medium 有权
公开(公告)号：US11468555B2
公开(公告)日：2022-10-11
申请号：US17041405
申请日：2019-03-12
申请人： TASMIT, INC.
发明人： Koji Kaneko
IPC分类号： G06T7/00 , G06T7/13 , G01N23/2251
摘要： A method of generating a correction line indicating a relationship between an amount of deviation of an edge of a wafer pattern from an edge of a reference pattern and a width of a space adjacent to the edge of the reference pattern, includes: creating an appearance-frequency graph of widths of spaces adjacent to reference patterns located within a designated area; obtaining images of wafer patterns corresponding to a plurality of space widths shown in the appearance-frequency graph; calculating amounts of deviation between edges of the wafer patterns on the images and edges of corresponding reference patterns; plotting a plurality of data points on a coordinate system, the plurality of data points being specified by the plurality of space widths and the amounts of deviation; and generating a correction line from the plurality of data points on the coordinate system.

2. 发明授权

US11322332B2 Apparatus and method for measuring energy spectrum of backscattered electrons 有权
公开(公告)号：US11322332B2
公开(公告)日：2022-05-03
申请号：US16977808
申请日：2019-03-01
申请人： TASMIT, INC.
发明人： Makoto Kato , Sumio Sasaki , Yukihiro Tanaka , Yuichiro Yamazaki
IPC分类号： H01J37/244 , H01J37/28
摘要： The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source (101) for generating a primary electron beam; an electron optical system (102, 105, 112) configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen. The energy analyzing system includes: a Wien filter (108) configured to disperse the backscattered electrons; a detector (107) configured to measure the energy spectrum of the backscattered electrons dispersed by the Wien filter (108); and an operation controller (150) configured to change an intensity of a quadrupole field of the Wien filter (108), while moving a detecting position of the detector (107) for the backscattered electrons in synchronization with the change in the intensity of the quadrupole field.

3. 发明申请

US20210027979A1 AUTOFOCUS METHOD FOR A SCANNING ELECTRON MICROSCOPE 有权
公开(公告)号：US20210027979A1
公开(公告)日：2021-01-28
申请号：US16965850
申请日：2019-01-18
申请人： TASMIT, INC.
发明人： Daisuke KUBOTA
IPC分类号： H01J37/21 , H01J37/28 , H01J37/147
摘要： The present invention relates to an autofocus technique for a scanning electron microscope using interlaced scan. The autofocus method for a scanning electron microscope, includes: generating a thinned image of a pattern (160) formed on a surface of a specimen by repeatedly scanning the specimen with an electron beam while shifting a scanning position of the electron beam by predetermined plural pixels in a direction perpendicular to a scanning direction; performing said generating a thinned image of the pattern (160) plural times, while changing a focal position and an irradiation position of the electron beam, to generate thinned images of the pattern (160); calculating a plurality of sharpness levels of the respective thinned images; and determining an optimum focal position based on the sharpness levels.

4. 发明申请

US20210012999A1 APPARATUS AND METHOD FOR MEASURING ENERGY SPECTRUM OF BACKSCATTERED ELECTRONS 有权
公开(公告)号：US20210012999A1
公开(公告)日：2021-01-14
申请号：US16977808
申请日：2019-03-01
申请人： TASMIT, INC.
发明人： Makoto KATO , Sumio SASAKI , Yukihiro TANAKA , Yuichiro YAMAZAKI
IPC分类号： H01J37/244 , H01J37/28
摘要： The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source (101) for generating a primary electron beam; an electron optical system (102, 105, 112) configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen. The energy analyzing system includes: a Wien filter (108) configured to disperse the backscattered electrons; a detector (107) configured to measure the energy spectrum of the backscattered electrons dispersed by the Wien filter (108); and an operation controller (150) configured to change an intensity of a quadrupole field of the Wien filter (108), while moving a detecting position of the detector (107) for the backscattered electrons in synchronization with the change in the intensity of the quadrupole field.

5. 发明申请

US20230109853A1 SCANNING ELECTRON MICROSCOPE 有权
公开(公告)号：US20230109853A1
公开(公告)日：2023-04-13
申请号：US17913655
申请日：2021-03-18
申请人： TASMIT, INC.
发明人： Naoya SAITOH , Daisuke KUBOTA
IPC分类号： H01J37/28 , H01J37/147 , H01J37/244 , H01J37/153 , H01J37/21 , H01J37/26
摘要： The present invention relates to a scanning electron microscope configured to scan a workpiece, such as a wafer, mask, panel, or substrate, with an electron beam to generate an image of the workpiece. The scanning electron microscope includes a deflector (17, 18) configured to deflect the electron beam to scan a target region (T) on the workpiece (W) with the electron beam, and a deflection controller (22) configured to apply to the deflectors (17, 18) a scanning voltage that causes the electron beam to scan the target region (T) and an offset voltage that shifts the electron beam from an optical axial center (O) to the target region (T).

6. 发明申请

US20210027473A1 PATTERN EDGE DETECTION METHOD 有权
公开(公告)号：US20210027473A1
公开(公告)日：2021-01-28
申请号：US17040533
申请日：2019-03-04
申请人： TASMIT, INC.
发明人： Masahiro OYA
IPC分类号： G06T7/13 , G01N23/2251 , G06K9/62 , G06T7/00
摘要： The present invention relates to a pattern edge detection method applicable to a semiconductor inspection apparatus that performs a pattern inspection using pattern design data. This method includes: generating an image of a pattern; detecting an edge of the pattern on the image based on a reference pattern generated from design data for the pattern; repeating generating of an image of a pattern and detecting of an edge of the pattern on the image to produce training-data candidates including a plurality of images and corresponding pattern edges; determining training data by removing pattern edges and corresponding images from the training-data candidates, the pattern edges to be removed being pattern edges satisfying a predetermined disqualification condition; producing an edge detection model by machine learning using the training data; generating an image of other pattern; and detecting an edge of the other pattern on the image using the edge detection model.

7. 发明申请

US20230005157A1 PATTERN-EDGE DETECTION METHOD, PATTERN-EDGE DETECTION APPARATUS, AND STORAGE MEDIUM STORING PROGRAM FOR CAUSING A COMPUTER TO PERFORM PATTERN-EDGE DETECTION 有权
公开(公告)号：US20230005157A1
公开(公告)日：2023-01-05
申请号：US17791155
申请日：2020-12-10
申请人： TASMIT, INC.
发明人： Yosuke OKAMOTO
IPC分类号： G06T7/13
摘要： The present invention relates to a method of detecting an edge (or a contour line) of a pattern, which is formed on a workpiece (e.g., a wafer or a mask) for use in manufacturing of semiconductor, from an image generated by a scanning electron microscope. The pattern-edge detection method includes: generating an objective image of a target pattern formed on a workpiece; generating a feature vector representing features of each pixel constituting the objective image; inputting the feature vector to a model constructed by machine learning; outputting, from the model, a determination result indicating whether the pixel having the feature vector is an edge pixel or a non-edge pixel; and connecting a plurality of pixels, each having a feature vector that has obtained a determination result indicating an edge pixel, with a line to generate a virtual edge.

8. 发明授权

US11380513B2 Autofocus method for a scanning electron microscope 有权
公开(公告)号：US11380513B2
公开(公告)日：2022-07-05
申请号：US16965850
申请日：2019-01-18
申请人： TASMIT, INC.
发明人： Daisuke Kubota
IPC分类号： H01J37/21 , H01J37/147 , H01J37/28
摘要： The present invention relates to an autofocus technique for a scanning electron microscope using interlaced scan. The autofocus method for a scanning electron microscope, includes: generating a thinned image of a pattern (160) formed on a surface of a specimen by repeatedly scanning the specimen with an electron beam while shifting a scanning position of the electron beam by predetermined plural pixels in a direction perpendicular to a scanning direction; performing said generating a thinned image of the pattern (160) plural times, while changing a focal position and an irradiation position of the electron beam, to generate thinned images of the pattern (160); calculating a plurality of sharpness levels of the respective thinned images; and determining an optimum focal position based on the sharpness levels.

9. 发明申请

US20220012404A1 IMAGE MATCHING METHOD AND ARITHMETIC SYSTEM FOR PERFORMING IMAGE MATCHING PROCESS 有权
公开(公告)号：US20220012404A1
公开(公告)日：2022-01-13
申请号：US17311997
申请日：2019-11-18
申请人： TASMIT, INC.
发明人： Taihei MORI
IPC分类号： G06F30/398 , G06T7/00 , G06F30/27
摘要： The present invention relates to an image matching process for aligning a pattern on design data with a pattern on an image, and particularly to an image matching process using a model constructed by machine learning. The method includes: converting a designated CAD pattern on design data into a CAD image (301); inputting the CAD image (301) into a model constructed by machine learning; outputting a pseudo image (321) from the model by performing calculations according to an algorithm defined by the model; and determining a pattern having a shape closest to a shape of a CAD pattern (322) on the pseudo image (321). The determined pattern is one of patterns on an image generated by an image generating device (100).

10. 发明授权

US11436736B2 Pattern edge detection method 有权
公开(公告)号：US11436736B2
公开(公告)日：2022-09-06
申请号：US17040533
申请日：2019-03-04
申请人： TASMIT, INC.
发明人： Masahiro Oya
IPC分类号： G06K9/00 , G06T7/13 , G01N23/2251 , G06K9/62 , G06T7/00
摘要： The present invention relates to a pattern edge detection method applicable to a semiconductor inspection apparatus that performs a pattern inspection using pattern design data. This method includes: generating an image of a pattern; detecting an edge of the pattern on the image based on a reference pattern generated from design data for the pattern; repeating generating of an image of a pattern and detecting of an edge of the pattern on the image to produce training-data candidates including a plurality of images and corresponding pattern edges; determining training data by removing pattern edges and corresponding images from the training-data candidates, the pattern edges to be removed being pattern edges satisfying a predetermined disqualification condition; producing an edge detection model by machine learning using the training data; generating an image of other pattern; and detecting an edge of the other pattern on the image using the edge detection model.

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