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1. 发明授权

US08120259B2 Impedance matching methods and systems performing the same 有权
标题翻译：阻抗匹配方法和系统执行相同
公开(公告)号：US08120259B2
公开(公告)日：2012-02-21
申请号：US12270431
申请日：2008-11-13
申请人： Jae-Hyun Kim , Sang-Won Lee , Yong-Gwan Lee
发明人： Jae-Hyun Kim , Sang-Won Lee , Yong-Gwan Lee
IPC分类号： H01J7/24 , H03H7/38
CPC分类号： H03H7/40
摘要： Provided are an impedance matching method and a matching system performing the same. The method includes: measuring an electrical characteristic of the power transmission line; determining a pulse mode of the power source; extracting a control parameter for impedance matching from the electrical characteristic of the power transmission line; and controlling the matching system through the control parameter, wherein the matching system is controlled differently according to the pulse mode.
摘要翻译：提供阻抗匹配方法和执行该阻抗匹配方法的匹配系统。该方法包括：测量输电线路的电气特性; 确定电源的脉冲模式; 从电力传输线的电气特性中提取阻抗匹配的控制参数; 以及通过所述控制参数来控制所述匹配系统，其中所述匹配系统根据所述脉冲模式被不同地控制。

2. 发明授权

US07088047B2 Inductively coupled plasma generator having low aspect ratio 失效
标题翻译：具有低纵横比的电感耦合等离子体发生器
公开(公告)号：US07088047B2
公开(公告)日：2006-08-08
申请号：US11043207
申请日：2005-01-26
申请人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
发明人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
IPC分类号： H01J7/24 , B44C1/22 , C23C16/00
CPC分类号： H01J37/321 , H05H1/46
摘要： An inductively coupled plasma generator having a lower aspect ratio reaction gas, comprising a chamber having a gas inlet through which a reaction gas is supplied, a vacuum pump for maintaining the inside of the chamber vacuum and a gas outlet for exhausting the reaction gas after completion of the reaction, a chuck for mounting a target material to be processed inside the chamber, and an antenna to which high-frequency power is applied, the antenna provided at the upper and lateral portions of the chamber, wherein the antenna has parallel antenna elements in which a discharge of a high frequency can be allowed and impedance is low to ensure a low electron temperature, the antenna is disposed such that a powered end of each of the antenna elements and a ground end of each of the antenna elements opposite to the powered end are symmetrical in view of the center of an imaginary circle formed by the antenna to establish rotation symmetry of plasma density profiles, the antenna elements are twisted in a helical manner, and the powered end of each of the antenna elements is positioned to be far from the chamber and the ground end of each of the antenna elements is positioned to be close to the chamber, thereby compensating for a drop in the plasma density due to ion loss occurring at the powered end.
摘要翻译：一种具有较低纵横比的反应气体的电感耦合等离子体发生器，包括具有供应反应气体的气体入口的室，用于维持室内真空的真空泵和用于在完成后排出反应气体的气体出口的反应，用于在室内安装待处理的目标材料的卡盘以及设置在室的上部和外侧部分处的高频电力的天线，其中天线具有平行的天线元件其中可以允许高频放电并且阻抗低以确保低电子温度，天线被布置成使得每个天线元件的动力端和每个天线元件的接地端与鉴于由天线形成的假想圆的中心，以建立等离子体密度分布的旋转对称性，动力端对称，天线元件ar e以螺旋方式扭绞，并且每个天线元件的动力端定位成远离腔室，并且每个天线元件的接地端被定位成靠近腔室，从而补偿了下降由于在动力端发生离子损失引起的等离子体密度。

3. 发明授权

US07079085B2 Antenna structure for inductively coupled plasma generator 失效
标题翻译：电感耦合等离子体发生器的天线结构
公开(公告)号：US07079085B2
公开(公告)日：2006-07-18
申请号：US10766665
申请日：2004-01-27
申请人： Young-Kwan Lee , Sang-Won Lee , Sae-Hoon Uhm
发明人： Young-Kwan Lee , Sang-Won Lee , Sae-Hoon Uhm
IPC分类号： H01Q21/00 , H01Q11/12 , H01J7/24
CPC分类号： H01J37/321 , H05H1/46
摘要： An antenna structure for an inductively coupled plasma generator suitable for processing large-diameter wafers or large, flat-panel display devices by making a plasma density distribution uniform and symmetrical with respect to a rotating direction inside a circular or rectangular chamber in which a wafer is processed. In the antenna structure having a powered end to which RF power is applied and a ground end connected to the ground, at least two loop antenna elements are disposed electrically in parallel with each other, the powered ends and ground ends of the respective antennas are disposed symmetrically with respect to the center of the antennas, and the antennas crossing each other such that the powered ends and ground ends thereof are disposed at a part far from a chamber and central parts thereof are disposed at a part close to the chamber.
摘要翻译：一种用于电感耦合等离子体发生器的天线结构，其适用于通过使等离子体密度分布在圆形或矩形室内相对于旋转方向均匀且对称的方式处理大直径晶片或大型平板显示装置，其中晶片为处理。在具有施加RF功率的动力端和连接到地面的接地端的天线结构中，至少两个环形天线元件彼此并联设置，各个天线的动力端和接地端被布置相对于天线的中心对称，并且天线彼此交叉，使得其动力端和接地端设置在远离室的一部分处，并且其中心部分设置在靠近室的部分。

4. 发明申请

US20050156530A1 Inductively coupled plasma generator having lower aspect ratio 失效
标题翻译：具有较低纵横比的电感耦合等离子体发生器
公开(公告)号：US20050156530A1
公开(公告)日：2005-07-21
申请号：US11043207
申请日：2005-01-26
申请人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
发明人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
IPC分类号： H01J7/24 , H01J37/32 , H01L21/3065 , H05H1/24 , H05H1/46
CPC分类号： H01J37/321 , H05H1/46
摘要： An inductively coupled plasma generator having a lower aspect ratio reaction gas, comprising a chamber having a gas inlet through which a reaction gas is supplied, a vacuum pump for maintaining the inside of the chamber vacuum and a gas outlet for exhausting the reaction gas after completion of the reaction, a chuck for mounting a target material to be processed inside the chamber, and an antenna to which high-frequency power is applied, the antenna provided at the upper and lateral portions of the chamber, wherein the antenna has parallel antenna elements in which a discharge of a high frequency can be allowed and impedance is low to ensure a low electron temperature, the antenna is disposed such that a powered end of each of the antenna elements and a ground end of each of the antenna elements opposite to the powered end are symmetrical in view of the center of an imaginary circle formed by the antenna to establish rotation symmetry of plasma density profiles, the antenna elements are twisted in a helical manner, and the powered end of each of the antenna elements is positioned to be far from the chamber and the ground end of each of the antenna elements is positioned to be close to the chamber, thereby compensating for a drop in the plasma density due to ion loss occurring at the powered end.
摘要翻译：一种具有较低纵横比的反应气体的电感耦合等离子体发生器，包括具有供应反应气体的气体入口的腔室，用于维持腔室真空内部的真空泵和用于在完成后排出反应气体的气体出口的反应，用于在室内安装待处理的目标材料的卡盘以及设置在室的上部和外侧部分处的高频电力的天线，其中天线具有平行的天线元件其中可以允许高频放电并且阻抗低以确保低电子温度，天线被布置成使得每个天线元件的动力端和每个天线元件的接地端与鉴于由天线形成的假想圆的中心，以建立等离子体密度分布的旋转对称性，动力端对称，天线元件ar e以螺旋方式扭曲，并且每个天线元件的动力端定位成远离腔室，并且每个天线元件的接地端被定位成靠近腔室，从而补偿了下降由于在动力端发生离子损失引起的等离子体密度。

5. 发明授权

US08053991B2 Impedance matching methods and systems performing the same 有权
标题翻译：阻抗匹配方法和系统执行相同
公开(公告)号：US08053991B2
公开(公告)日：2011-11-08
申请号：US12072991
申请日：2008-02-29
申请人： Jae-Hyun Kim , Sang-Won Lee , Yong-Gwan Lee
发明人： Jae-Hyun Kim , Sang-Won Lee , Yong-Gwan Lee
IPC分类号： H01J7/24
CPC分类号： H03H7/40
摘要： Provided are an impedance matching method and a matching system performing the same. The method includes: measuring an electrical characteristic of the power transmission line including the matching system and the load; extracting a control parameter for impedance matching from the electrical characteristic of the power transmission line; and controlling the matching system by using the control parameter. The extracting of the control parameter comprises utilizing an analytic coordinate system that quantitatively relates the electrical characteristic of the matching system to the electrical characteristic of the power transmission line.
摘要翻译：提供阻抗匹配方法和执行该阻抗匹配方法的匹配系统。该方法包括：测量包括匹配系统和负载的输电线路的电气特性; 从电力传输线的电气特性中提取阻抗匹配的控制参数; 并通过使用控制参数来控制匹配系统。提取控制参数包括利用将匹配系统的电特性定量地与输电线的电气特性相关联的分析坐标系。

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