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1. 发明授权

US5176782A Apparatus for photochemically ashing a photoresist 失效
标题翻译：光刻胶化光刻胶的装置
公开(公告)号：US5176782A
公开(公告)日：1993-01-05
申请号：US802658
申请日：1991-12-09
申请人： Norio Ishibashi , Izumi Serizawa
发明人： Norio Ishibashi , Izumi Serizawa
IPC分类号： G03F7/42 , H01L21/00 , H01L21/027 , H01L21/30
CPC分类号： H01L21/67017 , G03F7/42
摘要： An apparatus for photochemically decomposing a photoresist is disclosed wherein processing time can be minimized by inducing a uniform photochemical oxidative decomposing reaction over the whole surface of a base board, and an ozone gas atmosphere can be utilized efficiently. The apparatus includes a rotatable circular table supporting one or more base boards and an ashing platform arranged around the periphery of the table including an ozone feeding slit and an ozone discharge slit. The apparatus also includes a plurality of ultraviolet ray lamps arranged inside a box-shaped vessel located above the ashing platform. An upper cover plate is pivotally mounted on the ashing platform and includes a transparent window plate through which the ultraviolet rays pass to irradiate the base boards. An airtight flat space is formed between the ashing platform and the upper cover to contain the ozone atmosphere.
摘要翻译：公开了一种用于光致化学分解光致抗蚀剂的装置，其中可以通过在基板的整个表面上引发均匀的光化学氧化分解反应来最小化处理时间，并且可以有效地利用臭氧气体气氛。该装置包括支撑一个或多个基板的可旋转圆台，以及布置在桌子周围的灰化平台，包括臭氧供给狭缝和臭氧排放狭缝。该装置还包括布置在位于灰化平台上方的盒状容器内的多个紫外线灯。上盖板可枢转地安装在灰化平台上，并且包括透明窗板，紫外线通过该透明窗板照射基板。在灰化平台和上盖之间形成一个气密的平坦空间以容纳臭氧气氛。

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