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    • 7. 发明授权
    • Process for preparing halogenoalkylnitrates
    • 卤代烷基硝酸盐的制备方法
    • US07745496B2
    • 2010-06-29
    • US11667970
    • 2005-11-09
    • Romano RivoltaPeter Finlander
    • Romano RivoltaPeter Finlander
    • A61K31/02C07C291/02
    • C07C203/04
    • A process for preparing a compound of formula (I) X-(CH2)n-ONO2  (I) wherein: X is a halogen atom selected from Cl, Br, I; n is an integer from 3 to 6; said process comprising the slow addition of a compound of formula (II) X-(CH2)n-OH  (II) wherein X and n are as defined above to a nitrating agent selected from the group consisting of concentrated nitric acid/concentrated sulfuric acid (sulfonitric mixture), nitric acid alone, NaNO2 in trifluoroacetic acid, nitronium salts such as NO2BF4 and an organic solvent selected from the group consisting of CH2Cl2, CHCl3, CCl4, perfluorohexane, perfluoroheptane. The invention refers also to solutions containing: a compound of general formula (I) and a solvent selected from the group consisting of CH2Cl2, CHCl3, CCl4, perfluorohexane, perfluoroheptane, characterized in that the compound of formula (I) is present in a concentration not higher than 20% by weight.
    • 制备式(I)化合物的方法X-(CH 2)n -ONO 2(I)其中:X是选自Cl,Br,I的卤素原子; n为3〜6的整数, 所述方法包括将其中X和n如上定义的式(II)的化合物(II)X-(CH 2)n -OH(II)缓慢加入到选自浓硝酸/浓硫酸 (磺化混合物),单独的硝酸,三氟乙酸中的NaNO 2,硝酸盐如NO 2 BO 4和选自CH 2 Cl 2,CHCl 3,CCl 4,全氟己烷,全氟庚烷的有机溶剂。 本发明还涉及包含通式(I)的化合物和选自CH 2 Cl 2,CHCl 3,CCl 4,全氟己烷,全氟庚烷的溶剂的溶液,其特征在于式(I)化合物以浓度 不高于20重量%。