会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Method of manufacturing the pole pieces and the gap of magnetic heads in
thin layers
    • 制造极片的方法和薄层中磁头的间隙
    • US5062196A
    • 1991-11-05
    • US572553
    • 1990-08-27
    • Patrice Deroux-Dauphin
    • Patrice Deroux-Dauphin
    • G11B5/23G11B5/31
    • G11B5/3163G11B5/00821G11B5/232G11B5/3183G11B5/235Y10T29/49046
    • A method of manufacturing the pole pieces and the gap of magnetic heads in thin layers for computer, audio and video applications, starting from a silicon substrate, includes formation of an insulator layer on a silicon substrate followed by deposition of a metal layer on the insulator layer and of a masking resin layer on the metal layer. The substrate covered with the insulator layer and the metal layer is etched to form wells bordering a bar of a determined width and the left-over portion of the metal layer etched is removed. The etched substrate is thermally oxidized to develop a silicon oxide layer enabling the bar to be adjusted to obtain the desired gap. A conductive layer is deposited at the bottom of the wells followed by the electrolytic deposition of a magnetic material in the wells and the removal of the left-over portion of the insulator layer initially deposited on the substrate.
    • 从硅衬底开始,制造用于计算机,音频和视频应用的极片和磁头的间隙的方法包括在硅衬底上形成绝缘体层,然后在绝缘体上沉积金属层 层和金属层上的掩模树脂层。 蚀刻覆盖有绝缘体层和金属层的衬底,以形成与确定的宽度的条状物接合的阱,并且去除蚀刻的金属层的剩余部分。 蚀刻的衬底被热氧化以形成氧化硅层,使得可以调整棒以获得所需的间隙。 导电层沉积在孔的底部,随后在孔中电解沉积磁性材料,并去除最初沉积在衬底上的绝缘体层的剩余部分。