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81. 发明申请

US20020039622A1 Method of depositing a metallic film on a substrate 审中-公开
标题翻译：在基板上沉积金属膜的方法
公开(公告)号：US20020039622A1
公开(公告)日：2002-04-04
申请号：US09968370
申请日：2001-10-01
发明人： Rajendra Solanki , Balu Pathangey
IPC分类号： C23C016/00
CPC分类号： C23C26/00 , C03C17/10 , C03C17/225 , C03C2217/259 , C03C2217/282 , C03C2218/111
摘要： The present invention relates to a method of depositing a metallic film on a substrate. This method uses a carrier gas to deposit a source metal in the presence of an aqueous reducing agent such that the rate of deposition can be controlled by controlling the flow rate of the carrier gas.
摘要翻译：本发明涉及在基板上沉积金属膜的方法。该方法使用载气在水性还原剂的存在下沉积源金属，使得可以通过控制载气的流速来控制沉积速率。

82. 发明授权

US06355301B1 Selective fiber metallization 有权
标题翻译：选择性光纤金属化
公开(公告)号：US06355301B1
公开(公告)日：2002-03-12
申请号：US09705224
申请日：2000-11-02
申请人： Michael Nevin Miller
发明人： Michael Nevin Miller
IPC分类号： B05D310
CPC分类号： G02B6/12 , C03C17/10 , C03C25/1063 , C03C2217/25 , C03C2218/111 , C03C2218/115 , C03C2218/31 , C23C18/1605 , G02B6/02395
摘要： A process for applying a metal to selected areas of non conducting substrates, including individual fibers, particularly optical fibers, comprises the steps of providing a non-conducting substrate having an uncoated portion to be treated with a sensitizer solution to provide a sensitized portion of the non-conducting substrate. Covering the sensitized portion with an activator solution provides an activated portion of the non-conducting substrate. Coating at least a section of the activated portion with a stannous salt solution forms at least one activated area and at least one deactivated area within the activated portion of the non-conducting substrate to produce a masked portion therefrom. Upon immersing the masked portion of the non-conducting substrate in an electroless plating bath, metal deposits on the activated area to provide a selectively metallized non-conducting substrate. This process provides selectively metallized articles including selectively metallized optical fibers.
摘要翻译：一种将金属施加到非导电基底（包括单根纤维，特别是光纤）的选定区域的方法包括以下步骤：提供具有未被涂覆的部分的非导电基底，以用敏化剂溶液处理，以提供致敏部分非导电衬底。用活化剂溶液覆盖致敏部分提供非导电基材的活化部分。用亚锡盐溶液涂覆活化部分的至少一部分在非导电基材的活化部分内形成至少一个活化区域和至少一个去活化区域，以从其产生掩蔽部分。当将非导电衬底的掩蔽部分浸入化学镀浴中时，金属沉积在活化区域上以提供选择性金属化的非导电衬底。该方法提供选择性金属化制品，包括选择性金属化的光纤。

83. 发明授权

US06242752B1 Photocatalyst, light source and lighting device 失效
标题翻译：光催化剂，光源和照明装置
公开(公告)号：US06242752B1
公开(公告)日：2001-06-05
申请号：US09117895
申请日：1999-04-16
申请人： Ryuji Soma , Hisashi Honda , Ariyoshi Ishizaki , Tsutomu Watanabe , Hiroshi Kamata , Akiko Saitou , Akimasa Endou
发明人： Ryuji Soma , Hisashi Honda , Ariyoshi Ishizaki , Tsutomu Watanabe , Hiroshi Kamata , Akiko Saitou , Akimasa Endou
IPC分类号： B01J1912
CPC分类号： B01J21/063 , B01J35/002 , B01J35/004 , B01J35/023 , C03C17/256 , C03C17/3417 , C03C2217/71 , C03C2218/111 , C03C2218/113 , C03C2218/365 , F21V3/04 , H01J61/35 , H01K1/32
摘要： A translucent cover (9) is so provided as to cover a high pressure sodium lamp (11) adapted to radiate at least visible light and rays of light in the wavelength range of 300 nm to 400 nm. A photocatalytic film (13) which is capable of preventing generation of interference between visible light is formed on either one of or both the inner side and outer side of the translucent cover (9). The photocatalytic film (13) contains as the principal component titania (TiO2) of which the peak wavelength for visible light transmittance is nearly the same as the peak wavelength for visible light radiated from the high pressure sodium lamp (11). Ultraviolet light radiated from the high pressure sodium lamp (11) enhances oxidation and decomposition of substances performed by the photocatalytic film (13), thereby preventing grime and contaminants from adhering to the translucent cover (9). Even if the thickness of the photocatalytic film (13) is increased in order to make the photocatalytic function more effective, visible light radiated from the high pressure sodium lamp (11) effectively passes through the photocatalytic film (13) at the peak wavelength so that decrease in the illuminating efficiency is prevented.
摘要翻译：设置半透明盖（9）以覆盖适于辐射至少在300nm至400nm的波长范围内的可见光和光线的高压钠灯（11）。能够防止在可见光之间产生干涉的光催化膜（13）形成在透光罩（9）的内侧和外侧的任一个或两侧。光催化膜（13）含有作为主要成分的二氧化钛（TiO 2），其中可见光透射率的峰值波长与从高压钠灯（11）辐射的可见光的峰值波长几乎相同。从高压钠灯（11）辐射的紫外线增强了由光催化膜（13）进行的物质的氧化和分解，从而防止污垢和污染物粘附到半透明盖（9）上。即使增加光催化膜（13）的厚度以使光催化功能更有效，从高压钠灯（11）辐射的可见光有效地以峰值波长通过光催化膜（13），使得防止了照明效率的降低。

84. 发明授权

US5372847A Ammonia release method for depositing metal oxides 失效
标题翻译：用于沉积金属氧化物的氨释放方法
公开(公告)号：US5372847A
公开(公告)日：1994-12-13
申请号：US121483
申请日：1993-09-16
申请人： Gary L. Silver , Frank S. Martin
发明人： Gary L. Silver , Frank S. Martin
IPC分类号： C03C17/25 , B05D3/02
CPC分类号： C03C17/25 , C03C2217/229 , C03C2218/111
摘要： A method of depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates.
摘要翻译：一种在衬底上沉积金属氧化物的方法，其与衬底的电化学性质无关，并且包括形成含有金属离子的氨络合物，然后从氨络合物中除去氨，以使金属氧化物缓慢沉淀和沉积在底物。

85. 发明授权

US5073408A Method of depositing a silicon dioxide film 失效
标题翻译：沉积二氧化硅膜的方法
公开(公告)号：US5073408A
公开(公告)日：1991-12-17
申请号：US580356
申请日：1990-09-07
申请人： Takuji Goda , Hirotsugu Nagayama , Hideo Kawahara
发明人： Takuji Goda , Hirotsugu Nagayama , Hideo Kawahara
IPC分类号： C03C15/00 , C03C17/25 , C23C2/04 , C23C18/00
CPC分类号： C23C2/04 , C03C17/25 , C03C2217/213 , C03C2218/11 , C03C2218/111
摘要： A method of depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by increasing the temperature of a hydrosilicofluoric acid solution substantially saturated with silicon dioxide.
摘要翻译：通过使基板与包含二氧化硅过饱和的氢硅氟酸溶液的处理溶液接触来沉积二氧化硅膜的基板如含碱玻璃的表面的方法，该二氧化硅膜是通过提高氢硅氟化物的温度而获得的酸溶液基本上用二氧化硅饱和。

86. 发明授权

US4849252A Dipping process for the production of transparent, electrically conductive, augmented indium oxide layers 失效
标题翻译：用于生产透明，导电，增强的氧化铟层的浸渍方法
公开(公告)号：US4849252A
公开(公告)日：1989-07-18
申请号：US836206
申请日：1986-02-27
申请人： Nanning Arfsten , Reinhard Kaufmann , Doris Schubert
发明人： Nanning Arfsten , Reinhard Kaufmann , Doris Schubert
IPC分类号： H01B5/14 , C03C17/23 , C03C17/25 , C23C14/08 , C23C18/16 , C23C18/31 , G02F1/1343 , G09F9/30 , H01B13/00
CPC分类号： C03C17/25 , C03C2217/215 , C03C2217/24 , C03C2218/111
摘要： In a process for producing transparent, electrically conductive, augmented layers of indium oxide by means of a dipping process, during which the substrate to be coated is dipped into a solution containing hydrolyzable compounds of indium, whereupon the substrate is withdrawn from the solution, is dried, and tempered at temperatures of up to 500.degree. C., a dipping solution is used which, in addition to the indium compound, contains at least one additional hydrolyzable compound of an element in the 2nd, 4th or 5th main groups, in the 1st, 2nd, 4th, 5th or 8th subgroup of the periodic system of elements, or of the rare earths.
摘要翻译：在通过浸渍方法生产透明的，导电的，增加的氧化铟层的方法中，将待涂覆的基底浸入含有可水解的铟化合物的溶液中，然后从溶液中取出基材，是干燥并在高达500℃的温度下回火，使用浸渍溶液，除了铟化合物之外，在第二，第四或第五主要组中含有至少一种另外的可水解化合物的元素，在第1，第2，第4，第5或第8小组的元素或稀土的周期性系统。

87. 发明授权

US3922392A Process for coating nonporous material with a porous silicon dioxide layer 失效
标题翻译：用多孔二氧化硅层涂覆无孔材料的方法
公开(公告)号：US3922392A
公开(公告)日：1975-11-25
申请号：US36411773
申请日：1973-05-25
申请人： MERCK PATENT GMBH
发明人： KOHLSCHUTTER HANS WOLFGANG , UNGER KLAUS , SCHICK-KALB JURGEN
IPC分类号： B01J20/281 , B01J20/10 , B05D7/00 , C03C17/25 , G01N30/88
CPC分类号： B01J20/3234 , B01J20/283 , B01J20/286 , B01J20/3204 , B01J20/3293 , B01J20/3295 , B05D7/00 , B05D2201/02 , B05D2202/25 , B05D2203/35 , B05D2518/12 , C03C17/25 , C03C2217/213 , C03C2218/111
摘要： Nonporous materials are coated with a porous silicon dioxide layer by coating the nonporous material with a polymeric alkoxysiloxane and then subjecting this coating to a hydrolytic polycondensation with an aqueous basic solution. The thusobtained product is then dried.
摘要翻译：通过用聚合物烷氧基硅氧烷涂覆无孔材料，然后使该涂层与碱性水溶液进行水解缩聚，将多孔材料涂覆多孔二氧化硅层。然后将由此获得的产物干燥。

88. 发明授权

US3875321A Glassy or crystalline material for phototropic thin layers 失效
标题翻译：用于光变薄层的玻璃状或结晶性材料
公开(公告)号：US3875321A
公开(公告)日：1975-04-01
申请号：US35462873
申请日：1973-04-25
申请人： JENAER GLASWERK SCHOTT & GEN
发明人： GLIEMEROTH GEORG , MECKEL LOTHAR
IPC分类号： C03C3/32 , C03C4/06 , C03C10/00 , C03C17/02 , C03C17/22 , C03C17/23 , C09K9/00 , G03C1/725 , B29D11/00 , G03C1/52
CPC分类号： C03C17/02 , C03C3/32 , C03C4/06 , C03C17/22 , C03C2217/284 , C03C2218/111 , C03C2218/112 , C03C2218/151 , C03C2218/32 , C09K9/00 , Y10S428/913 , Y10S430/163
摘要： Reversible phototropic coatings on substrates such as glass or plastic. The coatings are of the system silver cations, copper cations, and chloride or bromide anions.
摘要翻译：基底如玻璃或塑料上的可逆光变涂料。涂层是系统银阳离子，铜阳离子和氯化物或溴化物阴离子。

89. 发明授权

US2901379A High temperature resistant vitreous material 失效
标题翻译：耐高温玻璃质材料
公开(公告)号：US2901379A
公开(公告)日：1959-08-25
申请号：US57742856
申请日：1956-04-09
申请人： OWENS CORNING FIBERGLASS CORP
发明人： SHANNON RICHARD F , MITCHELL ROBERT H
IPC分类号： C03C17/23 , C03C25/42
CPC分类号： C03C25/42 , C03C17/23 , C03C2217/229 , C03C2217/23 , C03C2218/111 , Y10T428/263 , Y10T428/2938 , Y10T428/2958

90. 发明授权

US2429420A Conductive coating for glass and method of application 失效
标题翻译：玻璃导电涂层及其应用方法
公开(公告)号：US2429420A
公开(公告)日：1947-10-21
申请号：US46083842
申请日：1942-10-05
申请人： LIBBEY OWENS FORD GLASS CO
发明人： MCMASTER HAROLD A
IPC分类号： B60S1/02 , B64D15/12 , C03C17/25 , H01B1/00 , H01Q1/12
CPC分类号： H01Q1/1271 , B60S1/026 , B64D15/12 , C03C17/25 , C03C17/253 , C03C2217/211 , C03C2218/111 , C03C2218/112 , H01B1/00 , Y10T428/261

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