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    • 84. 发明申请
    • METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    • 合成石英玻璃的生产方法
    • US20110239706A1
    • 2011-10-06
    • US13078426
    • 2011-04-01
    • Chikaya TamitsujiKunio WatanabeAkio Koike
    • Chikaya TamitsujiKunio WatanabeAkio Koike
    • C03B20/00
    • C03B19/1461C03B19/1453C03B2201/12C03B2201/42
    • The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.
    • 本发明涉及氟浓度为1000质量ppm以上的合成石英玻璃的制造方法,其特征在于,包括以下工序(a)〜(c):(a)沉积并生长获得的石英玻璃微粒 通过将玻璃形成材料火焰水解成基材,从而形成多孔玻璃体; (b)在400℃以下的元素含氟(F2)的气氛下将多孔玻璃体保持在反应容器中,得到含氟多孔玻璃体; (c)将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度,得到含氟透明玻璃体,其中,在步骤(b)中,元素氟(F2)连续或间歇地 供给反应容器,反应容器内的气体从反应容器连续地或间歇地排出。
    • 85. 发明申请
    • PROCESS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    • 合成石英玻璃生产工艺
    • US20110179827A1
    • 2011-07-28
    • US13080704
    • 2011-04-06
    • Chikaya TAMITSUJIKunio WatanabeAkio Koike
    • Chikaya TAMITSUJIKunio WatanabeAkio Koike
    • C03B8/04C03B20/00
    • C03B19/1461C03B2201/12C03B2201/42C03C3/06C03C2201/12C03C2201/42
    • The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
    • 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法,其特征在于,包括:(a)沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上,从而形成多孔玻璃体; (b)将多孔玻璃体保持在填充有元素氟(F2)的反应容器或包含用惰性气体稀释的元素氟(F2)的混合气体并含有固体金属氟化物的步骤,从而获得 含氟多孔玻璃体; 和(c)将含氟多孔质玻璃体加热至透明玻璃化温度的步骤,得到含氟透明玻璃体。
    • 90. 发明授权
    • Pattern transfer method using a mask and half tone mask
    • 使用掩模和半色调蒙版的图案转印方法
    • US06902852B2
    • 2005-06-07
    • US10260532
    • 2002-10-01
    • Kunio Watanabe
    • Kunio Watanabe
    • G03F1/32G03F1/36G03F1/54G03F1/68G03F7/20H01L21/027H05K3/00G03F9/00G03C5/00
    • G03F1/32G03F1/29H05K3/0002
    • A half tone mask of the present invention is provided with a half tone film in which a thickness of the half tone film in a dense pattern area where optical proximity effect occurs differs from that in an isolated pattern area where the optical proximity effect does not occur, the thickness of the half tone film in the isolated pattern area being adjusted so that difference in size of a resist does not occur between the dense pattern area and the isolated pattern area due to the optical proximity effect, thus preventing the difference in size of the resist between the dense pattern area and the isolated pattern area, even when providing high definition patterns which causes the optical proximity effect.
    • 本发明的半色调掩模设置有半色调膜,其中发生光学邻近效应的致密图案区域中的半色调膜的厚度与在不发生光学邻近效应的隔离图案区域中的厚薄膜不同 调整隔离图案区域中的半色调膜的厚度,使得由于光学邻近效应而在致密图案区域和隔离图案区域之间不会发生抗蚀剂的尺寸差异,从而防止了尺寸差异 即使提供导致光学邻近效应的高清晰度图案,密集图案区域和隔离图案区域之间的抗蚀剂也是如此。