会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 83. 发明授权
    • Light-emitting diode
    • 发光二极管
    • US08304803B2
    • 2012-11-06
    • US13283985
    • 2011-10-28
    • Hiroyuki TanakaNobuaki NagaoTakahiro HamadaEiji Fujii
    • Hiroyuki TanakaNobuaki NagaoTakahiro HamadaEiji Fujii
    • H01L21/00
    • H01L33/42H01L33/32
    • A light-emitting diode includes an n-type nitride semiconductor layer, a multiple quantum well, a p-type nitride semiconductor layer, a window electrode layer, a p-side electrode, and an n-side electrode, which are stacked in this order. The window electrode layer comprises an n-type single-crystalline ITO transparent film and an n-type single-crystalline ZnO transparent film. The p-type nitride semiconductor layer is in contact with the n-type single-crystalline ITO transparent film, the n-type single-crystalline ITO transparent film is in contact with the n-type single-crystalline ZnO transparent film, and the p-side electrode is in connected with the n-type single-crystalline ZnO transparent film. The n-type single-crystalline ITO transparent film contains Ga, a molar ratio of Ga/(In+Ga) being not less than 0.08 and not more than 0.5. Thickness of the n-type single-crystalline ITO transparent film is not less than 1.1 nm and not more than 55 nm.
    • 发光二极管包括堆叠在其中的n型氮化物半导体层,多量子阱,p型氮化物半导体层,窗口电极层,p侧电极和n侧电极 订购。 窗口电极层包括n型单晶ITO透明膜和n型单晶ZnO透明膜。 p型氮化物半导体层与n型单晶ITO透明膜接触,n型单晶ITO透明膜与n型单晶ZnO透明膜接触,p型 侧电极与n型单晶ZnO透明膜连接。 n型单晶ITO透明膜含有Ga,Ga /(In + Ga)的摩尔比不小于0.08且不大于0.5。 n型单晶ITO透明膜的厚度不小于1.1nm且不大于55nm。
    • 84. 发明申请
    • LIGHT-EMITTING DIODE
    • 发光二极管
    • US20120043524A1
    • 2012-02-23
    • US13284294
    • 2011-10-28
    • Hiroyuki TANAKANobuaki NagaoTakahiro HamadaEiji Fujii
    • Hiroyuki TANAKANobuaki NagaoTakahiro HamadaEiji Fujii
    • H01L33/06
    • H01L33/42H01L2933/0083H01L2933/0091
    • An light emitting diode includes an n-type nitride semiconductor layer, a multiple quantum well layer, a p-type nitride semiconductor layer, a window electrode layer, a p-side electrode, and an n-side electrode, which are stacked in this order. The n-side electrode is electrically connected to the n-type nitride semiconductor layer. The window electrode layer comprises an n-type single-crystalline ITO transparent film and an n-type single-crystalline ZnO transparent film. The p-type nitride semiconductor layer is in contact with the n-type single-crystalline ITO transparent film. The light-emitting diode further comprises a plurality of single-crystalline ZnO rods formed on the n-type single-crystalline ZnO transparent film. The respective lower portions of the single-crystalline ZnO rods have a shape of an inverted taper, which sharpens from the single-crystalline n-type ZnO transparent film toward the n-type nitride semiconductor layer.
    • 发光二极管包括堆叠在其中的n型氮化物半导体层,多量子阱层,p型氮化物半导体层,窗口电极层,p侧电极和n侧电极 订购。 n侧电极与n型氮化物半导体层电连接。 窗口电极层包括n型单晶ITO透明膜和n型单晶ZnO透明膜。 p型氮化物半导体层与n型单晶ITO透明膜接触。 发光二极管还包括形成在n型单晶ZnO透明膜上的多个单晶ZnO棒。 单晶ZnO棒的各自的下部具有从单晶n型ZnO透明膜朝向n型氮化物半导体层而锐化的倒锥形。
    • 88. 发明授权
    • Piezoelectric element, method for fabricating the same, inkjet head, method for fabricating the same, and inkjet recording apparatus
    • 压电元件,其制造方法,喷墨头,其制造方法和喷墨记录装置
    • US07193756B2
    • 2007-03-20
    • US10997143
    • 2004-11-24
    • Akiko MurataEiji FujiiHideo Torii
    • Akiko MurataEiji FujiiHideo Torii
    • G02B5/32B41J2/045
    • B41J2/14233B41J2/14282B41J2202/03H01L41/0815H01L41/094H01L41/0973H01L41/1876H01L41/316
    • A piezoelectric element includes a first electrode film; a piezoelectric layered film including a first piezoelectric thin film formed on the first electrode film and a second piezoelectric thin film formed on the first piezoelectric thin film; and a second electrode film formed on the second piezoelectric thin film. Each of the first and second piezoelectric thin films is an aggregate of columnar grains grown unidirectionally along the thickness direction of the piezoelectric layered film. The Pb content of the first piezoelectric thin film is smaller than the Pb content of the second piezoelectric thin film. A columnar grain of the second piezoelectric thin film has a larger average cross-sectional diameter than an average cross-sectional diameter of a columnar grain of the first piezoelectric thin film. A ratio of the thickness of the piezoelectric layered film to the average cross-sectional diameter of the second piezoelectric thin film is not less than 20 and not more than 60.
    • 压电元件包括​​第一电极膜; 压电层叠膜,包括形成在第一电极膜上的第一压电薄膜和形成在第一压电薄膜上的第二压电薄膜; 以及形成在第二压电薄膜上的第二电极膜。 第一和第二压电薄膜中的每一个是沿着压电层叠膜的厚度方向单向生长的柱状晶粒的集合体。 第一压电薄膜的Pb含量小于第二压电薄膜的Pb含量。 第二压电薄膜的柱状晶粒的平均截面直径大于第一压电薄膜的柱状晶粒的平均截面直径。 压电层叠膜的厚度与第二压电薄膜的平均截面直径的比率不小于20并且不大于60。