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    • 84. 发明授权
    • Semiconductor manufacturing method
    • 半导体制造方法
    • US08211781B2
    • 2012-07-03
    • US12615277
    • 2009-11-10
    • Tatsuma SaitoShinichi TanakaYusuke Yokobayashi
    • Tatsuma SaitoShinichi TanakaYusuke Yokobayashi
    • H01L21/461
    • H01L33/0095B23K26/0604B23K26/364B23K26/40B23K2103/172Y10S438/977
    • A manufacturing method for semiconductor devices having a metal support is provided. The method in one aspect includes growing a semiconductor film on a growth substrate; forming a metal support on a surface of said semiconductor film opposite to the growth substrate; thereafter removing said growth substrate from said semiconductor film; forming a street groove reaching said metal support in the said semiconductor film; radiating a first laser beam onto said metal support to form a first dividing groove having a substantially flat bottom in said metal support; and radiating a second laser beam onto said metal support to form a second dividing groove that penetrates through a portion of said metal support that remains where the first dividing groove is formed.
    • 提供了具有金属支撑件的半导体器件的制造方法。 一方面的方法包括在生长衬底上生长半导体膜; 在与所述生长基板相对的所述半导体膜的表面上形成金属载体; 然后从所述半导体膜去除所述生长衬底; 在所述半导体膜中形成到达所述金属支撑件的街道槽; 将第一激光束辐射到所述金属支撑件上以形成在所述金属支撑件中具有基本平坦的底部的第一分隔槽; 并且将第二激光束辐射到所述金属支撑件上以形成第二分隔槽,该第二分隔槽穿过保留在形成第一分隔槽的部分所述金属支撑件。
    • 89. 发明授权
    • Process for producing trans-1,4-cyclohexanedicarboxylic acid
    • 反式-1,4-环己烷二羧酸的制备方法
    • US07595423B2
    • 2009-09-29
    • US11924161
    • 2007-10-25
    • Koetsu EndouHirofumi NakamuraShinichi Tanaka
    • Koetsu EndouHirofumi NakamuraShinichi Tanaka
    • C07C61/00
    • C07C51/353C07C51/363C07C2601/14C07C61/09
    • A subject for the invention is to obtain trans-1,4-cyclohexanedicarboxylic acid (t-CHDA) in a high concentration by efficiently isomerizing cis-1,4-cyclohexanedicarboxylic acid (c-CHDA) by a simple method. The invention provides: (1) a process for producing t-CHDA which comprises heating crude CHDA to 180° C. or higher in an inert atmosphere and causing the t-CHDA formed by isomerization to precipitate in the molten c-CHDA while holding the crude CHDA at a temperature in the range of not lower than 180° C. and less than the melting point of t-CHDA; (2) a process for producing t-CHDA, wherein crude CHDA which is powdery or granular is heat-treated at a temperature of not lower than the melting point of c-CHDA and lower than the melting point of t-CHDA to thereby isomerize the cis isomer to the trans isomer while maintaining the powdery or granular state; (3) a process for producing t-CHDA, wherein crude CHDA is held at a temperature of not lower than the melting point of c-CHDA and lower than the melting point of t-CHDA in an inert atmosphere while maintaining flowing to thereby obtain powdery or granular t-CHDA; and (4) a process for purifying crude CHDA in which crude CHDA obtained through the step of hydrogenating TPA or the like is heated in an atmosphere of an inert gas to volatilize and remove impurities.
    • 本发明的目的是通过简单的方法有效地使顺式-1,4-环己烷二羧酸(c-CHDA)异构化,以高浓度获得反式-1,4-环己烷二羧酸(t-CHDA)。 本发明提供:(1)一种生产t-CHDA的方法,其包括在惰性气氛中将粗CHDA加热至180℃或更高,并使通过异构化形成的t-CHDA在熔融的c-CHDA中沉淀,同时保持 原料CHDA在不低于180℃且小于t-CHDA的熔点的温度范围内; (2)生产t-CHDA的方法,其中将粉末状或粒状的粗CHDA在不低于c-CHDA的熔点并低于t-CHDA的熔点的温度下进行热处理,从而异构化 顺式异构体反式异构体,同时保持粉状或颗粒状态; (3)生产t-CHDA的方法,其中将粗CHDA保持在不低于c-CHDA的熔点并低于在惰性气氛中的t-CHDA的熔点的温度,同时保持流动,从而获得 粉状或颗粒状t-CHDA; (4)一种纯化粗制CHDA的方法,其中通过氢化TPA等步骤得到的粗CHDA在惰性气体气氛中加热,挥发除去杂质。