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    • 84. 发明授权
    • Radiation-sensitive polymers
    • 辐射敏感聚合物
    • US4767826A
    • 1988-08-30
    • US756354
    • 1985-07-18
    • Rong-Chang LiangSubhash NarangArnost Reiser
    • Rong-Chang LiangSubhash NarangArnost Reiser
    • C08G18/00C08G18/61C08G18/67C08G18/69C08G63/00C08G63/91C08G69/00C08G69/48C08G81/00G03F7/038G03F7/075
    • G03F7/0757C08G18/61C08G18/679C08G18/69G03F7/038G03F7/0384
    • This invention relates to the preparation of solvent soluble polymeric materials which become insoluble in solvents after exposure to actinic light, x-rays or electron beams.The polymers are linear block copolymers comprising two segments; a soft segment which forms a continuous phase, and a rigid, crystallizable photoreactive segment which forms a dispersed phase. The rigid segments are chosen from polyurethanes, polyesters, polyamides, and polyureas which contain a diacetylene group in their repeat units. The soft segments are low molecular weight rubbery polymers selected from groups such as polyethers, polyesters, polydienes, and polysiloxanes.The polymers produced are useful in a wide variety of applications in the field of coatings and graphic arts. More particularly, this invention relates to negative photoresists which are remarkable by their (1) high photosensitivity (2) great latitude in tailoring of film properties, (3) high thermal stability and (4) oxygen insensitivity.
    • 本发明涉及在曝光于光化学光,X射线或电子束之后变得不溶于溶剂的溶剂可溶性聚合材料的制备。 聚合物是包含两个链段的线性嵌段共聚物; 形成连续相的软链段和形成分散相的刚性可结晶的光反应性链段。 刚性区段选自聚氨酯,聚酯,聚酰胺和聚脲,它们在其重复单元中含有二乙炔基。 软链段是选自聚醚,聚酯,聚二烯和聚硅氧烷的低分子量橡胶状聚合物。 所生产的聚合物可用于涂料和印刷领域的各种应用。 更具体地说,本发明涉及负光致抗蚀剂,它们通过(1)高光敏性(2)在调整膜性能方面具有很大的自由度,(3)高热稳定性和(4)氧不敏感性而显着。